Process Variability—Technological Challenge and Design Issue for Nanoscale Devices
Lorenz, J.; Bär, E.; Barraud, S.; Brown, A.R.; Evanschitzky, P.; Klüpfel, F.; Wang, L. Process Variability—Technological Challenge and Design Issue for Nanoscale Devices. Micromachines 2019, 10, 6. https://doi.org/10.3390/mi10010006
Lorenz J, Bär E, Barraud S, Brown AR, Evanschitzky P, Klüpfel F, Wang L. Process Variability—Technological Challenge and Design Issue for Nanoscale Devices. Micromachines. 2019; 10(1):6. https://doi.org/10.3390/mi10010006
Chicago/Turabian StyleLorenz, Jürgen, Eberhard Bär, Sylvain Barraud, Andrew R. Brown, Peter Evanschitzky, Fabian Klüpfel, and Liping Wang. 2019. "Process Variability—Technological Challenge and Design Issue for Nanoscale Devices" Micromachines 10, no. 1: 6. https://doi.org/10.3390/mi10010006