Next Article in Journal
Optimizing the Caloric Properties of Cu-Doped Ni–Mn–Ga Alloys
Previous Article in Journal
Areal Surface Roughness Optimization of Maraging Steel Parts Produced by Hybrid Additive Manufacturing
Open AccessArticle

Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties

1
College of Chemistry and Materials Engineering, Anhui Science and Technology University, Fengyang 233100, China
2
College of Electrical and Electronic Engineering, Anhui Science and Technology University, Fengyang 233100, China
3
Key Laboratory of Materials Physics, Institute of Solid State Physics, University of Chinese Academy of Sciences, Hefei 230031, China
*
Author to whom correspondence should be addressed.
Materials 2020, 13(2), 417; https://doi.org/10.3390/ma13020417
Received: 18 November 2019 / Revised: 9 January 2020 / Accepted: 14 January 2020 / Published: 16 January 2020
Thickness is a very important parameter with which to control the microstructures, along with physical properties in transition-metal nitride thin films. In work presented here, CrN films with different thicknesses (from 26 to 130 nm) were grown by chemical solution deposition. The films are pure phase and polycrystalline. Thickness dependence of microstructures and electrical transport behavior were studied. With the increase of films thickness, grain size and nitrogen content are increased, while resistivity, zero-field sensitivity and magnetoresistance are decreased. In the temperature range of 5–350 K, all samples exhibited semiconductor-like properties with dρ/dT < 0. For the range above and below the Néel temperature, the resistivity can be fitted by the thermal activation model and the two-dimensional weak localization (2D-WL) model, respectively. The ultra-low magnetoresistance at a low temperature under high magnetic fields with a large zero-field sensitivity was observed in the CrN thin films. The zero-field sensitivity can be effectively tuned to 10−2 K−1 at 5 K with a magnetoresistance of less than 1% at 2 K under 14 T by reasonably controlling the thickness. View Full-Text
Keywords: chromium nitride; thin films; thickness-dependent; electrical transport properties; chemical solution deposition chromium nitride; thin films; thickness-dependent; electrical transport properties; chemical solution deposition
Show Figures

Graphical abstract

MDPI and ACS Style

Hui, Z.; Zuo, X.; Ye, L.; Wang, X.; Zhu, X. Solution Processable CrN Thin Films: Thickness-Dependent Electrical Transport Properties. Materials 2020, 13, 417.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Back to TopTop