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MaterialsMaterials
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  • Open Access

13 November 2019

Pattern Pick and Place Method for Twisted Bi- and Multi-Layer Graphene

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1
SKKU Advanced Institute of Nanotechnology (SAINT) and School of Advanced Materials Science and Engineering Sungkyunkwan University (SSKU), 2066, Seobu-Ro, Jangan-Gu, Suwon-Si, Gyeonggi-Do 16419, Korea
2
Department of Energy Systems Research and Department of Materials Science and Engineering Ajou University, 2016, World cup-Ro, Yeongtong-Gu, Suwon-Si, Gyeonggi-Do 16499, Korea
*
Author to whom correspondence should be addressed.
These authors contributed equally to this work.
This article belongs to the Special Issue Recent Progress in Graphene and 2D Materials

Abstract

Twisted bi-layer graphene (tBLG) has attracted much attention because of its unique band structure and properties. The properties of tBLG vary with small differences in the interlayer twist angle, but it is difficult to accurately adjust the interlayer twist angle of tBLG with the conventional fabrication method. In this study, we introduce a facile tBLG fabrication method that directly picks up a single-crystalline graphene layer from a growth substrate and places it on another graphene layer with a pre-designed twist angle. Using this approach, we stacked single-crystalline graphene layers with controlled twist angles and thus fabricated tBLG and twisted multi-layer graphene (tMLG). The structural, optical and electrical properties depending on the twist angle and number of layers, were investigated using transmission electron microscopy (TEM), micro–Raman spectroscopy, and gate-dependent sheet resistance measurements. The obtained results show that the pick and place approach enables the direct dry transfer of the top graphene layer on the as-grown graphene to fabricate uniform tBLG and tMLG with minimal interlayer contamination and pre-defined twist angles.

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