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Open AccessArticle

A Semi-Analytical Extraction Method for Interface and Bulk Density of States in Metal Oxide Thin-Film Transistors

1
State Key Laboratory of Luminescent Materials and Devices, South China University of Technology, Guangzhou 510640, China
2
Guangzhou New Vision Opto-Electronic Technology Co., Ltd., Guangzhou 510530, China
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Author to whom correspondence should be addressed.
Materials 2018, 11(3), 416; https://doi.org/10.3390/ma11030416
Received: 24 January 2018 / Revised: 25 February 2018 / Accepted: 8 March 2018 / Published: 11 March 2018
A semi-analytical extraction method of interface and bulk density of states (DOS) is proposed by using the low-frequency capacitance–voltage characteristics and current–voltage characteristics of indium zinc oxide thin-film transistors (IZO TFTs). In this work, an exponential potential distribution along the depth direction of the active layer is assumed and confirmed by numerical solution of Poisson’s equation followed by device simulation. The interface DOS is obtained as a superposition of constant deep states and exponential tail states. Moreover, it is shown that the bulk DOS may be represented by the superposition of exponential deep states and exponential tail states. The extracted values of bulk DOS and interface DOS are further verified by comparing the measured transfer and output characteristics of IZO TFTs with the simulation results by a 2D device simulator ATLAS (Silvaco). As a result, the proposed extraction method may be useful for diagnosing and characterising metal oxide TFTs since it is fast to extract interface and bulk density of states (DOS) simultaneously. View Full-Text
Keywords: capacitance–voltage (C–V) characteristics; current–voltage (I–V) characteristics; density of states (DOS); metal oxide thin-film transistors (TFTs) capacitance–voltage (C–V) characteristics; current–voltage (I–V) characteristics; density of states (DOS); metal oxide thin-film transistors (TFTs)
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Chen, W.; Wu, W.; Zhou, L.; Xu, M.; Wang, L.; Ning, H.; Peng, J. A Semi-Analytical Extraction Method for Interface and Bulk Density of States in Metal Oxide Thin-Film Transistors. Materials 2018, 11, 416.

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