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Search Results (281)

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Keywords = radio frequency magnetron sputtering

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11 pages, 2536 KiB  
Article
Electrical Performance of ZTO Thin-Film Transistors and Inverters
by Jieyang Wang, Liang Guo, Xuefeng Chu, Fan Yang, Hansong Gao, Chao Wang, Yaodan Chi and Xiaotian Yang
Micromachines 2025, 16(7), 751; https://doi.org/10.3390/mi16070751 - 25 Jun 2025
Viewed by 337
Abstract
In this study, zinc–tin oxide (ZTO) thin films were prepared via radio-frequency magnetron sputtering to examine the influence of annealing temperature on the performance of thin-film transistors (TFTs) and their resistive-load inverters. The findings reveal that annealing modulates the concentration and spatial distribution [...] Read more.
In this study, zinc–tin oxide (ZTO) thin films were prepared via radio-frequency magnetron sputtering to examine the influence of annealing temperature on the performance of thin-film transistors (TFTs) and their resistive-load inverters. The findings reveal that annealing modulates the concentration and spatial distribution of oxygen vacancies (VO), which directly affect carrier density and interface trap density, ultimately determining the electrical behavior of inverters. At the optimal annealing temperature of 600 °C, the VO concentration was effectively moderated, resulting in a TFT with a mobility of 12.39 cm2 V−1 s−1, a threshold voltage of 6.13 V, an on/off current ratio of 1.09 × 108, and a voltage gain of 11.77 in the corresponding inverter. However, when the VO concentration deviated from this optimal range, whether in excess or deficiency, the gain was reduced and power consumption increased. This VO engineering strategy enables the simultaneous optimization of both TFT and inverter performance without relying on rare elements, offering a promising pathway toward the development of low-cost, large-area, flexible, and transparent electronic devices. Full article
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15 pages, 7651 KiB  
Article
Induction of Strong Magneto-Optical Effect and High Compatibility with Si of BiFeO3 Thin Film by Sr and Ti Co-Doping
by Nanxi Lin, Hong Zhang, Yunye Shi, Chenjun Xu, Zhuoqian Xie and Yunjin Chen
Materials 2025, 18(13), 2953; https://doi.org/10.3390/ma18132953 - 22 Jun 2025
Viewed by 303
Abstract
The poor magnetic and magneto-optical properties of BiFeO3, along with its significant lattice mismatch with silicon, have limited its application in silicon-based integrated magneto-optical devices. In this study, co-doping with Sr2+ and Ti4+ ions effectively transformed the trigonal structure [...] Read more.
The poor magnetic and magneto-optical properties of BiFeO3, along with its significant lattice mismatch with silicon, have limited its application in silicon-based integrated magneto-optical devices. In this study, co-doping with Sr2+ and Ti4+ ions effectively transformed the trigonal structure of BiFeO3 into a cubic phase, thereby reducing the lattice mismatch with silicon to 2.8%. High-quality, highly oriented, silicon-based cubic Sr,Ti:BiFeO3 thin films were successfully fabricated using radio frequency magnetron sputtering. Due to the induced lattice distortion, the characteristic periodic spiral spin antiferromagnetic structure of BiFeO3 was suppressed, resulting in a significant enhancement of the saturation magnetization of cubic Bi0.5Sr0.5Fe0.5Ti0.5O3 (48.0 emu/cm3), compared to that of pristine BiFeO3 (5.0 emu/cm3). Furthermore, the incorporation of Sr2+ and Ti4+ ions eliminated the birefringence effect inherent in trigonal BiFeO3, thereby inducing a pronounced magneto-optical effect in the cubic Sr,Ti:BiFeO3 thin film. The magnetic circular dichroic ellipticity (ψF) of Bi0.5Sr0.5Fe0.5Ti0.5O3 reached an impressive 2300 degrees/cm. Full article
(This article belongs to the Section Optical and Photonic Materials)
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18 pages, 2436 KiB  
Article
Photoelectrochemical and Photocatalytic Properties of SnS/TiO2 Heterostructure Thin Films Prepared by Magnetron Sputtering Method
by Yaoxin Ding, Jiahao Leng, Mingyang Zhang and Jie Shen
Inorganics 2025, 13(7), 208; https://doi.org/10.3390/inorganics13070208 - 20 Jun 2025
Viewed by 357
Abstract
Tin(II) sulfide(SnS)/titanium(IV) oxide (TiO2) heterostructure thin films were prepared by radio-frequency magnetron sputtering to investigate the enhancement effect of the formed heterojunction on the photocatalytic performance. By adjusting the sputtering time to vary the thickness of the SnS layer, the crystallinity [...] Read more.
Tin(II) sulfide(SnS)/titanium(IV) oxide (TiO2) heterostructure thin films were prepared by radio-frequency magnetron sputtering to investigate the enhancement effect of the formed heterojunction on the photocatalytic performance. By adjusting the sputtering time to vary the thickness of the SnS layer, the crystallinity and light-absorption properties of the light-absorbing layer and the quality of the heterojunction interface were effectively controlled, thereby optimizing the fabrication process of the heterojunction. It was found that when the SnS layer thickness was 244 nm and the TiO2 layer thickness was 225 nm, the heterostructure film exhibited optimal photoelectrochemical performance, generating the highest photocurrent of 3.03 µA/cm2 under visible light, which was 13.8 times that of a pure TiO2 film and 2.4 times that of a pure SnS film of the same thickness. Additionally, it demonstrated the highest degradation efficiency for methylene blue dye. The improved photoelectrochemical performance of the SnS/TiO2 heterostructure film can be primarily attributed to the following: (1) the incorporation of narrow-bandgap SnS effectively broadens the light-absorption range, improving visible-light harvesting; (2) the staggered band alignment between SnS and TiO2 forms a type-II heterojunction, significantly enhancing the charge carrier separation and transport efficiency. The present work demonstrated the feasibility of magnetron sputtering for constructing high-quality SnS/TiO2 heterostructures, providing insights into the design and fabrication of photocatalytic heterojunctions. Full article
(This article belongs to the Special Issue Advanced Inorganic Semiconductor Materials, 3rd Edition)
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12 pages, 1849 KiB  
Article
Study on Photoelectric Properties of Graphene/Molybdenum Disulfide Heterojunction
by Hui Ren, Xing Wei and Jibin Fan
Nanomaterials 2025, 15(11), 787; https://doi.org/10.3390/nano15110787 - 23 May 2025
Viewed by 387
Abstract
The zero-bandgap of graphene means that it can achieve a full spectral range response for graphene-based photodetectors. But the zero bandgap of graphene also brings relatively large dark current. To improve this issue and achieve low-cost graphene-based photodetectors, radio frequency (RF) magnetron-sputtered molybdenum [...] Read more.
The zero-bandgap of graphene means that it can achieve a full spectral range response for graphene-based photodetectors. But the zero bandgap of graphene also brings relatively large dark current. To improve this issue and achieve low-cost graphene-based photodetectors, radio frequency (RF) magnetron-sputtered molybdenum disulfide constructed with graphene to form heterojunction was investigated. The results indicated that graphene/molybdenum disulfide heterojunction could provide a Schottky barrier height value of 0.739 eV, which was higher than that of the graphene/Si photodetector. It is beneficial to suppress the generation of the dark current. Different sputtering conditions were also studied. Testing results indicated that for the optimized process, the responsivity, detectivity, and quantum efficiency of graphene/molybdenum disulfide heterojunction photodetectors could reach up to 126 mA/W, 1.21 × 1011 Jones, and 34%, respectively. In addition, graphene/molybdenum disulfide heterojunction on flexible PET substrate showed good stability, indicating that graphene/molybdenum disulfide heterojunction also has a good potential application in the field of flexible electronics. Full article
(This article belongs to the Section 2D and Carbon Nanomaterials)
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13 pages, 2943 KiB  
Article
Magnetron-Sputtered and Rapid-Thermally Annealed NiO:Cu Thin Films on 3D Porous Substrates for Supercapacitor Electrodes
by Seongha Oh, Young-Kil Jun and Nam-Hoon Kim
Energies 2025, 18(11), 2704; https://doi.org/10.3390/en18112704 - 23 May 2025
Viewed by 481
Abstract
The performance of NiO-based supercapacitor electrodes for energy storage systems was enhanced by doping Cu into NiO thin films (200 nm) using radio-frequency magnetron co-sputtering on 3D porous Ni foam substrates, followed by rapid thermal annealing. The Hall effect measurements demonstrated enhanced electrical [...] Read more.
The performance of NiO-based supercapacitor electrodes for energy storage systems was enhanced by doping Cu into NiO thin films (200 nm) using radio-frequency magnetron co-sputtering on 3D porous Ni foam substrates, followed by rapid thermal annealing. The Hall effect measurements demonstrated enhanced electrical conductivity, with resistivity values of 1.244 × 10−4 Ω·cm. The 3D porous NiO:Cu electrodes significantly increased the specific capacitance and achieved a value of 1809.2 Fg−1, with the NiO:Cu (10 at% Cu) thin films at a scan rate of 5 mVs−1, which is a 2.67-fold increase compared with the undoped NiO films on a glass substrate. The 3D porous NiO:Cu electrodes significantly improved the electrochemical properties of the NiO-based electrode, which resulted in a higher specific capacitance for enhancing the energy storage performance during grid stabilization. Full article
(This article belongs to the Section D2: Electrochem: Batteries, Fuel Cells, Capacitors)
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12 pages, 6811 KiB  
Article
The Fabrication and Characterization of Surface-Acoustic-Wave and Resistive Types of Ozone Sensors Based on Zinc Oxide: A Comparative Study
by Sheng-Hua Yan and Chia-Yen Lee
Sensors 2025, 25(9), 2723; https://doi.org/10.3390/s25092723 - 25 Apr 2025
Viewed by 2496
Abstract
Micro-Electro-Mechanical System (MEMS) technology is employed to fabricate surface acoustic wave (SAW)-type and resistive-type ozone sensors on quartz glass (SiO2) substrates. The fabrication process commences by using a photolithography technique to define interdigitated electrodes (IDEs) on the substrates. Electron-beam evaporation (EBE) [...] Read more.
Micro-Electro-Mechanical System (MEMS) technology is employed to fabricate surface acoustic wave (SAW)-type and resistive-type ozone sensors on quartz glass (SiO2) substrates. The fabrication process commences by using a photolithography technique to define interdigitated electrodes (IDEs) on the substrates. Electron-beam evaporation (EBE) followed by radio frequency (RF) magnetron sputtering is then used to deposit platinum (Pt) and chromium (Cr) electrode layers as well as a zinc oxide (ZnO) sensing layer, respectively. Finally, annealing is performed to improve the crystallinity and sensing performance of the ZnO films. The experimental results reveal that the ZnO thin films provide an excellent ozone-concentration sensing capability in both sensors. The SAW-type sensor demonstrates a peak sensitivity at a frequency of 200 kHz, with a rapid response time of just 35 s. Thus, it is suitable for applications requiring a quick response and high sensitivity, such as real-time monitoring and high-precision environmental detection. The resistive-type sensor shows optimal sensitivity at a relatively low operating temperature of 180 °C, but has a longer response time of approximately 103 s. Therefore, it is better suited for low-cost and large-scale applications such as industrial-gas-concentration monitoring. Full article
(This article belongs to the Special Issue Advanced Sensors for Gas Monitoring)
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17 pages, 6225 KiB  
Article
RF Sputtering of Gold Nanoparticles in Liquid and Direct Transfer to Nafion Membrane for PEM Water Electrolysis
by Chandrakanth Reddy Chandraiahgari, Gloria Gottardi, Giorgio Speranza, Beatrice Muzzi, Domenico Dalessandro, Andrea Pedrielli, Victor Micheli, Ruben Bartali, Nadhira Bensaada Laidani and Matteo Testi
Membranes 2025, 15(4), 115; https://doi.org/10.3390/membranes15040115 - 7 Apr 2025
Viewed by 1062
Abstract
Sputtering onto liquids is rapidly gaining attention for the green and controlled dry synthesis of ultrapure catalysts nanomaterials. In this study, we present a clean and single-step method for the synthesis of gold nanoparticles directly in polyethylene glycol (PEG) liquid using radio frequency [...] Read more.
Sputtering onto liquids is rapidly gaining attention for the green and controlled dry synthesis of ultrapure catalysts nanomaterials. In this study, we present a clean and single-step method for the synthesis of gold nanoparticles directly in polyethylene glycol (PEG) liquid using radio frequency (RF) magnetron sputtering and by subsequently transferring them to Nafion ionomer, fabricating a catalyst-coated membrane (CCM), an essential component of the proton exchange membrane water electrolyzer (PEMWE). The samples were systematically characterized at different stages of process development. The innovative transfer process resulted in a monodispersed homogeneous distribution of catalyst particles inside CCM while retaining their nascent nanoscale topography. The chemical analysis confirmed the complete removal of the trapped PEG through the process optimization. The electrochemical catalytic activity of the optimized CCM was verified, and the hydrogen evolution reaction (HER) in acidic media appeared outstanding, a vital step in water electrolysis toward H2 production. Therefore, this first study highlights the advantages of RF sputtering in liquid for nanoparticle synthesis and its direct application in preparing CCM, paving the way for the development of innovative membrane preparation techniques for water electrolysis. Full article
(This article belongs to the Section Membrane Applications for Energy)
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19 pages, 7143 KiB  
Article
Substrate Bias-Driven Structural and Mechanical Evolution of AlCrN and AlCrSiN Coatings via Reactive Magnetron Sputtering
by Du-Cheng Tsai, Rong-Hsin Huang, Zue-Chin Chang, Erh-Chiang Chen, Yen-Lin Huang and Fuh-Sheng Shieu
Materials 2025, 18(7), 1671; https://doi.org/10.3390/ma18071671 - 5 Apr 2025
Viewed by 528
Abstract
AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited [...] Read more.
AlCrN and AlCrSiN coatings were deposited via reactive magnetron sputtering. This study investigates the effects of radio frequency (RF) substrate bias, ranging from 0 V to 200 V, on the chemical composition, microstructure, and mechanical properties of the coatings. All crystalline coatings exhibited a single wurtzite-type hexagonal close-packed (hcp) structure. At a 0 V substrate bias, the AlCrN coating consisted of porous V-shaped columnar crystallites, while the AlCrSiN coating exhibited a porous, fiber-like amorphous structure. As the substrate bias increased, crystal growth was promoted, void density decreased, and the surface morphology transitioned from a textured to a more rounded appearance. Additionally, the preferred orientation shifted toward the (101) direction. However, at excessively high substrate bias, re-nucleation occurred, leading to grain refinement and increased film densification, which in turn caused a further shift in the preferred orientation toward the (002) plane. Due to its multi-element composition and the low solubility of Si in nitrides, AlCrSiN coatings tend to exhibit an amorphous growth tendency during sputtering. As a result, their microstructure is more sensitive to substrate bias. This sensitivity results in the formation of a highly dense structure with an optimal crystallite size at a substrate bias of 100 V, leading to a hardness of 22.6 GPa—surpassing that of the AlCrN coating. Full article
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16 pages, 13439 KiB  
Article
Three-Dimensional-Printed Biomimetic Structural Ceramics with Excellent Tribological Properties
by Zhaozhi Wang, Yajie Liu, Biao Jiang, Zhiheng Xin and Zhibin Jiao
Materials 2025, 18(6), 1376; https://doi.org/10.3390/ma18061376 - 20 Mar 2025
Cited by 3 | Viewed by 566
Abstract
Inspired by the ventral scale structure of the oriental sand boa, this study successfully fabricated multiscale bioinspired alumina (Al2O3) ceramics by combining the excellent mechanical properties, high-temperature resistance, and high hardness of ceramic composites with direct ink writing (DIW) [...] Read more.
Inspired by the ventral scale structure of the oriental sand boa, this study successfully fabricated multiscale bioinspired alumina (Al2O3) ceramics by combining the excellent mechanical properties, high-temperature resistance, and high hardness of ceramic composites with direct ink writing (DIW) 3D printing technology and femtosecond laser processing. A MoS2 thin film was then deposited on the ceramic surface via radio frequency magnetron sputtering (PVD) to systematically investigate the impact of bioinspired structures on the tribological properties of ceramic composites under both dry and lubricated conditions. Experimental results demonstrated that bioinspired structures at different scales exhibited significant friction-reducing and wear-resistant characteristics compared to blank structures. Specifically, under room-temperature conditions, the friction coefficients of bioinspired ceramic composites with solid lubricants and oil lubrication were 0.3 and 0.148, respectively, indicating excellent tribological performance. These findings confirm the synergistic lubrication effect between bioinspired structures, two-dimensional solid lubricants, and lubricating oil, which significantly enhanced the friction-reducing and wear-resistant properties of ceramic components. Therefore, the synergistic design of multiscale bioinspired structures and solid lubricants provides an innovative strategy for the advanced application of ceramic components. Full article
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12 pages, 4676 KiB  
Article
Enhancement of (100) Orientation and Dielectricity in PZT Thin Films Prepared by Radio Frequency Magnetron Sputtering Method
by Xing Wang and Helin Zou
Coatings 2025, 15(3), 336; https://doi.org/10.3390/coatings15030336 - 14 Mar 2025
Viewed by 695
Abstract
PZT thin films with a sol–gel-derived seed layer of Pb1.2(Zr0.3, Ti0.7)O3 were deposited on Pt/Ti/SiO2/Si substrates via the magnetron sputtering process. The purpose of this present study was to investigate the influence of sputtering [...] Read more.
PZT thin films with a sol–gel-derived seed layer of Pb1.2(Zr0.3, Ti0.7)O3 were deposited on Pt/Ti/SiO2/Si substrates via the magnetron sputtering process. The purpose of this present study was to investigate the influence of sputtering process parameters and heat treatment parameters on the crystal orientation, microstructure, and dielectric behaviors of PZT films. X-ray diffraction (XRD) analysis shows that the (100) orientation degree of the PZT films first increases and then decreases with the increase in oxygen partial pressure during sputtering. The PZT film annealed at a temperature of 550 °C exhibits a pure (100) perovskite phase. There are no significant changes in crystal orientation and the (100) orientation degree with increasing annealing time. An improved surface density, more uniform grains, and clear grain boundaries were detected by scanning electron microscope (SEM) characterization as the annealing time increased to 30 min. Optimal dielectricity was obtained in the film deposited on an O2/Ar composition of 10/90 with a sputtering pressure of 2 Pa and annealed at 600 °C for 30 min, which presents a permittivity of 852 and a loss factor of 0.026 at a frequency of 1 kHz and a remanent polarization of 18.5 μC/cm2. Full article
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12 pages, 2003 KiB  
Review
Sputtered LiNbO3 Thin Films for Application in Integrated Photonics: A Review
by Igor Kuznetsov, Anton Perin, Angelina Gulyaeva and Vladimir Krutov
Crystals 2025, 15(3), 270; https://doi.org/10.3390/cryst15030270 - 14 Mar 2025
Viewed by 1626
Abstract
LiNbO3 plays a significant role in modern integrated photonics because of its unique properties. One of the challenges in modern integrated photonics is reducing chip production cost. Today, the most widespread yet expensive method to fabricate thin films of LiNbO3 is [...] Read more.
LiNbO3 plays a significant role in modern integrated photonics because of its unique properties. One of the challenges in modern integrated photonics is reducing chip production cost. Today, the most widespread yet expensive method to fabricate thin films of LiNbO3 is the smart cut method. The high production cost of smart-cut chips is caused by the use of expensive equipment for helium implantation. A prospective method to reduce the cost of photonic integrated circuits is to use sputtered thin films of lithium niobite, since sputtering technology does not require helium implantation equipment. The purpose of this review is to assess the feasibility of applying sputtered LiNbO3 thin films in integrated photonics. This work compares sputtered LiNbO3 thin films and those fabricated by widespread methods, including the smart cut method, liquid-phase epitaxy, chemical vapor deposition, pulsed laser deposition, and molecular-beam epitaxy. Full article
(This article belongs to the Section Inorganic Crystalline Materials)
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14 pages, 5149 KiB  
Article
Low-Friction Coatings Grown on Cemented Carbides by Modulating the Sputtering Process Parameters of TiN Targets
by Hu Qiao, Minghui Liu, Ying Xiang, Xiling Xu, Ze Wang, Wenxuan Wu and Youqing Wang
Coatings 2025, 15(3), 329; https://doi.org/10.3390/coatings15030329 - 13 Mar 2025
Cited by 1 | Viewed by 762
Abstract
TiN thin films are widely used as protective and decorative coatings for tools in industry. Previous studies have focused on the deposition of TiN coatings on substrates by reactive magnetron sputtering, whereas the use of TiN targets avoids problems such as ‘nitrogen contamination’ [...] Read more.
TiN thin films are widely used as protective and decorative coatings for tools in industry. Previous studies have focused on the deposition of TiN coatings on substrates by reactive magnetron sputtering, whereas the use of TiN targets avoids problems such as ‘nitrogen contamination’ and ‘target poisoning’. TiN coatings were grown on silicon wafers and cemented carbide substrates by varying the parameters of the magnetron sputtering plasma source, operating Ar pressure and deposition temperature. The experimental results show the better mechanical properties of ceramic materials deposited using radio frequency (RF) magnetron sputtering. During RF magnetron sputtering, the hardness of the coating increased significantly to 17 Gpa when the deposition working pressure was reduced from 1.5 Pa to 0.5 Pa. The coefficient of friction tends to decrease as the deposition temperature increases, and at 400 °C the coefficient of friction between the deposited film and the friction pair made of Al2O3 material is only 0.36. The nano-scratch experimental tests concluded that the TiN coatings deposited at 300 °C conditions had the best adhesion to the substrate at an Ar pressure of 0.5 Pa under an RF source. Full article
(This article belongs to the Special Issue Ceramic and Glass Material Coatings)
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19 pages, 6699 KiB  
Article
Influence of Electron Beam Irradiation and RPMI Immersion on the Development of Magnesium-Doped Hydroxyapatite/Chitosan Composite Bioactive Layers for Biomedical Applications
by Andreea Groza, Maria E. Hurjui, Sasa A. Yehia-Alexe, Cornel Staicu, Coralia Bleotu, Simona L. Iconaru, Carmen S. Ciobanu, Liliana Ghegoiu and Daniela Predoi
Polymers 2025, 17(4), 533; https://doi.org/10.3390/polym17040533 - 18 Feb 2025
Viewed by 759
Abstract
Magnesium-doped hydroxyapatite/chitosan composite coatings produced by the radio-frequency magnetron sputtering technique were exposed to 5 MeV electron beams of 8 and 30 Gy radiation doses in a linear electron accelerator. The surfaces of unirradiated layers are smooth, while the irradiated ones exhibit nano-structures [...] Read more.
Magnesium-doped hydroxyapatite/chitosan composite coatings produced by the radio-frequency magnetron sputtering technique were exposed to 5 MeV electron beams of 8 and 30 Gy radiation doses in a linear electron accelerator. The surfaces of unirradiated layers are smooth, while the irradiated ones exhibit nano-structures with sizes that increase from 60 nm at a 8 Gy dose to 200 nm at a 30 Gy dose. Young’s modulus and the stiffness of the layers decrease from 58.9 GPa and 10 µN/nm to 5 GPa and 2.2 µN/nm, respectively, when the radiation doses are increased from 0 to 30 Gy. These data suggest the diminishing of the contribution of the chitosan to the elasticity of the magnesium-doped hydroxyapatite/chitosan composite layers after electron beam irradiation. The biological capabilities of the coatings were assessed before and after their immersion in RPMI-1640 cell culture medium for 7 and 14 days, respectively, and further cultured with a MG63 cell line (ATCC CRL1427) in Dulbecco’s Modified Eagle Medium supplemented with fetal bovine serum, penicillin–streptomycin, and L-glutamine. Thus, 1 µm spherical structures were developed on the surfaces of the layers exposed to a 30 Gy radiation dose and immersed for 14 days in the RPMI-1640 biological medium. The molecular structures of all the RPMI-1640 immersed samples were modified by the growth of a carbonated hydroxyapatite layer characterized by a B-type substitution, as Fourier Transform Infrared Spectroscopy revealed. The biological assay proved the increased biocompatibility of the layers kept in RPMI-1640 medium and enhanced MG63 cell attachment and proliferation. Atomic force microscopy analysis indicated the elongated fibroblastic cell morphology of MG63 cells with minor alteration at 30 Gy irradiation doses as a result of layer biocompatibility modifications. Full article
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29 pages, 70250 KiB  
Article
Exploring the Effects of Dulbecco’s Modified Eagle’s Medium on Irradiated Layers of Magnesium-Doped Hydroxyapatite in a Chitosan Matrix for Biomedical Applications
by Coralia Bleotu, Simona Liliana Iconaru, Carmen Steluta Ciobanu, Andreea Groza and Daniela Predoi
Coatings 2025, 15(2), 209; https://doi.org/10.3390/coatings15020209 - 9 Feb 2025
Cited by 2 | Viewed by 1255
Abstract
In this paper, we present the development of magnesium-doped hydroxyapatite in chitosan matrix (MHA_Ch) powder by an adapted coprecipitation method. The MHA_Ch powder was then deposited as thin layers by radio frequency magnetron sputtering. The MHA_Ch layers were exposed to various irradiation doses [...] Read more.
In this paper, we present the development of magnesium-doped hydroxyapatite in chitosan matrix (MHA_Ch) powder by an adapted coprecipitation method. The MHA_Ch powder was then deposited as thin layers by radio frequency magnetron sputtering. The MHA_Ch layers were exposed to various irradiation doses and immersed in Dulbecco’s Modified Eagle’s Medium (DMEM) for various time intervals. We report, for the first time, the effects of DMEM on irradiated layers of magnesium-doped hydroxyapatite in a chitosan matrix. The surface morphology of the layers before and after irradiation and immersion in DMEM was evaluated by SEM, AFM, and MM studies. Additionally, data about the functional groups present in the layers and the changes induced by exposure of the layers to irradiation and DMEM were obtained by FTIR studies. In vitro biological assays were conducted using an MG63 cell line (ATCC CRL1427). Our results suggest that the magnesium-doped hydroxyapatite in chitosan matrix layers may be suitable candidates for applications in the biomedical domain. Full article
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18 pages, 13259 KiB  
Article
Impact of Ni Doping on the Microstructure and Mechanical Properties of TiB2 Films
by Ying Wang, Xu Wang, Hailong Shang, Xiaotong Liu, Yu Qi, Xiaoben Qi and Ning Zhong
Nanomaterials 2025, 15(3), 229; https://doi.org/10.3390/nano15030229 - 31 Jan 2025
Cited by 1 | Viewed by 952
Abstract
The TiB2 film exhibits exceptional hardness and chemical stability due to its unique crystal structure and robust covalent bonds, but it also demonstrates high brittleness and poor toughness, which restricts its practical applications in engineering. By appropriately incorporating metal dopants, the toughness [...] Read more.
The TiB2 film exhibits exceptional hardness and chemical stability due to its unique crystal structure and robust covalent bonds, but it also demonstrates high brittleness and poor toughness, which restricts its practical applications in engineering. By appropriately incorporating metal dopants, the toughness of the ceramic matrix can be enhanced without compromising its inherent hardness. In this study, TiB2 films with different nickel contents (0–32.22 at.%) were fabricated through radio frequency magnetron sputtering. The microstructure, chemical composition, phase structure, and mechanical properties were analyzed using scanning electron microscopy, transmission electron microscopy, X-ray diffraction, X-ray photoelectron spectroscopy and nanoindentation tester. The pure TiB2 film exhibited (0001) and (0002) peaks; however, the addition of nickel resulted in broadening of the (0001) peak and disappearance of the (0002) peak, and no crystalline nickel or other nickel-containing phases could be identified. It was found that the incorporation of nickel refines the grain structure of titanium diboride, with nickel present in an amorphous form at the boundaries of titanium diboride, thereby forming a wrapped structure. The enrichment of nickel at the grain boundary becomes more pronounced as the nickel content is further increased, which hinders the growth of TiB2 grains, resulting in the thinning of columnar crystals and formation of nanocrystalline in the film, and the coating hardness remains above 20 GPa, when the nickel content is less than 10.83 at.%. With the increase in nickel content, titanium diboride exhibited a tendency to form an amorphous structure, while nickel became increasingly enriched at the boundaries, and the coating hardness and elastic modulus decreased. The wrapped microstructure could absorb the energy generated by compressive shear stress through plastic deformation, which should be beneficial to improve the toughness of the coatings. The addition of nickel enhanced the adhesion between the film and substrate while reducing the friction coefficient of the film. Specifically, when the nickel content reached 4.26 at.%, a notable enhancement in both nanohardness and toughness was observed for nanocomposite films. Full article
(This article belongs to the Special Issue Design and Applications of Heterogeneous Nanostructured Materials)
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