Microscale Processing with Non-thermal Plasma Discharges and Its Application

Dear Colleagues,

This Special Issue showcases cutting-edge examples of surface processing for use in applications within the fields of energy, biomedicine, and microelectronics. Non-equilibrium plasmas constitute very effective media of transport and delivery, having many purposes, such as coating deposition, surface etching/texturing, or functionalization. The scope here goes beyond the typical cases in the thin-film industry and aims to collect the latest know-how on the topics of (1) chemical modification for catalysis, biosensing, and microfluidics applications, and (2) surface engineering to manufacture or modify materials, including nano- and biomaterials. This engingeering is always using light and radicals generated by specially dedicated microplasma sources. Other issues related to the modeling and optimization tools of the processes mentioned, such as machine learning and artificial intelligence, will also be considered.

The presented plasma techniques target processes in the domains of atoms, molecules, cells, and organic tissues. This Special Issue thereby welcomes contributions on plasma processes that seek to generate functional interfaces from the nano- to macroscale. Such a multiscale approach may enable the development of a multidisciplinary line of work aligned with some of the most relevant challenges in electronics, biology, and environmental engineering.

Dr. Carles Corbella
Dr. Sabine Portal
Dr. Li Lin
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

• atmospheric microplasma jets
• atomic layer deposition/etching (ALD/ALE)
• biochemical sensors
• low-temperature plasmas
• microfluidic plasmas
• micro/nanolithography
• physics of microdischarges
• plasma medicine
• plasma nanosynthesis
• single-atom catalysts