Micro-Nano Optics and High-End Measurement Instruments: 2nd Edition

A special issue of Photonics (ISSN 2304-6732).

Deadline for manuscript submissions: closed (30 November 2024) | Viewed by 2672

Special Issue Editors


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Guest Editor
Harbin Institute of Technology,Xidazhi Street,150001,Harbin,Heilongjiang Province, China
Interests: diffraction optics; optical measurement; laser interferometer; transparent conductive films; metasurfaces; graphene; physical optics; EMI shielding of optical materials
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Guest Editor
Beijing Information Science and Technology University, Haidian District, Beijing 100192, China
Interests: optical fiber sensor; infrared detector; silicon photonics device; photonics computing; metasurface

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Guest Editor
College of Control Science and Engineering, China University of Petroleum (East China), Qingdao 266580, China
Interests: micro- and nano- manufacturing; micro-nano optics; surface enhanced raman spectroscopy; microfluidics

Special Issue Information

Dear Colleagues,

In the continuation of the successful “Micro-nano Optics and High-End Measurement Instruments: 2nd Edition” Special Issue, we are pleased to invite you to embark on a new chapter of exploration.

Micro-nano optics is an important field of optical science that mainly studies the transmission, manipulation, and application of light at small sizes. Due to the nature of local electromagnetic interactions of light waves in micro- and nano- structures, micro-nano optical devices can create new optical functions and exotic optical phenomena. Over the past decade, micro-nano optics has attracted more and more attention. It has played a great role in many fields, such as optical communication, optical interconnection, optical storage, optical regulation, and optical calculation.

The idea of micro-nano optics is also widely used in other electromagnetic bands, such as terahertz and microwave bands. In particular, many micro-nano devices realize different functions in multiple electromagnetic bands. Metamaterials, meta-surfaces, and nano-photonic devices are typical representatives in this field.

The structure, designing, and fabrication are key issues in the development of micro-nano optics. The manufacturing and characterization of micro-nano optical devices need the support of high-end measuring instruments. At the same time, the development of micro-nano optical devices also provides key components for high-end measuring instruments. Micro-nano optics and high-end measuring instruments support each other and are closely connected.

This Special Issue aims to present state-of-the-art research articles focused on the design, manufacturing, and application of micro-nano optical devices, as well as the development and application of high-end measurement instruments related to micro-nano optics.

In this Special Issue, original research articles and reviews are welcome. Research areas may include (but are not limited to) the following:

  • Nanotechnology and nanostructures in optics;
  • Metamaterials and meta-surfaces in optics or microwave;
  • Nanophotonics;
  • Micro- and nano- measurement technology;
  • Micro- and nano- manufacturing technology;
  • Laser measurement technology and instruments;
  • Optical technology and instruments for precision and ultra-precision measurement;
  • 3D-nano structure measurement;
  • High-end measurement instruments related to micro-nano optics;
  • Integrated infrared detector;
  • Microfluidics;
  • Raman spectroscopy.

Closely related to this Special Issue, we cordially invite you to participate the following international symposium which will be held in Qingdao, China,8–10 August 2024.

The 3rd International High-Level Forum on High-End Measurement Instruments & 13th International Symposium on Precision Engineering Measurements and Instrumentation

Website: http://www.ispemi-icmi.org.cn/

We look forward to receiving your contributions and participation.

Prof. Dr. Zhengang Lu
Prof. Dr. Lianqing Zhu
Prof. Dr. Rongke Gao
Guest Editors

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Keywords

  • nanotechnology and nanostructures in optics
  • metamaterials in optics or microwave
  • micro- and nano- measurement technology
  • laser measurement
  • 3D-nano structure measurement
  • high-end measurement instruments
  • optical interferometry measurement
  • nanophotonics
  • microfluidics
  • Raman spectroscopy

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Published Papers (2 papers)

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21 pages, 7174 KiB  
Article
Laser-Tracing Multi-Station Measurements in a Non-Uniform-Temperature Field
by Hongfang Chen, Ao Zhang, Mengyang Sun, Changcheng Li, Huan Wu, Ziqi Liang and Zhaoyao Shi
Photonics 2024, 11(8), 727; https://doi.org/10.3390/photonics11080727 - 4 Aug 2024
Viewed by 783
Abstract
Due to the increasing requirements for the improvement of the accuracy of large coordinate-measuring machines (CMMs), the laser-tracing multi-station measurement technology, as one of the advanced precision measurement technologies, is worth studying in depth in terms of its practical application for the compensation [...] Read more.
Due to the increasing requirements for the improvement of the accuracy of large coordinate-measuring machines (CMMs), the laser-tracing multi-station measurement technology, as one of the advanced precision measurement technologies, is worth studying in depth in terms of its practical application for the compensation of errors in large CMMs. Since it is difficult to maintain a constant temperature of about 20 °C in the actual workshop under the influence of solar radiation and convective heat transfer, there is a gradient in the spatial temperature distribution, and the overall temperature changes with the influence of external factors with synchronous hysteresis, it is difficult for the actual calibration environment to meet the standard environmental requirements. Therefore, the influence of temperature and other environmental factors on the accuracy of laser ranging and large-scale CMM calibration should not be ignored. In this paper, on the basis of analyzing the temperature distribution and change rule of large CMM measurement space under different working conditions, the radial basis function (RBF) neural network algorithm was used to build a non-uniform-temperature field model, and based on this model and the measurement principle of the laser-tracking instrument, the method of laser tracking and interferometric ranging accuracy enhancement was put forward under a non-uniform-temperature field. Finally, based on the multi-station technique of laser tracing, an accurate solution for the volumetric error of large CMMs under the condition of non −20 °C ambient temperature was realized. Simulation results proved that compared with the traditional temperature-compensation method, the proposed method improved the measurement accuracy of the volumetric error of a large-scale CMM using laser-tracing multi-station technology in a non-uniform-temperature field by 33.5%. This study provides a new approach for improving the accuracy of laser-tracer multi-station measurement systems. Full article
(This article belongs to the Special Issue Micro-Nano Optics and High-End Measurement Instruments: 2nd Edition)
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13 pages, 3182 KiB  
Article
Improved Structured Light Centerline Extraction Algorithm Based on Unilateral Tracing
by Yu Huang, Wenjing Kang and Zhengang Lu
Photonics 2024, 11(8), 723; https://doi.org/10.3390/photonics11080723 - 1 Aug 2024
Viewed by 1136
Abstract
The measurement precision of a line-structured light measurement system is directly affected by the accuracy of extracting the center points of the laser stripes. When the measured object’s surface has significant undulations and severe reflections, existing algorithms are prone to issues such as [...] Read more.
The measurement precision of a line-structured light measurement system is directly affected by the accuracy of extracting the center points of the laser stripes. When the measured object’s surface has significant undulations and severe reflections, existing algorithms are prone to issues such as significant susceptibility to noise and the extraction of false center points. To address these issues, an improved unilateral tracing-based structured light centerline extraction algorithm is proposed. The algorithm first performs unilateral and bidirectional tracing on the upper boundary of the preprocessed laser stripes, then uses the grayscale centroid method to extract the initial coordinates of the center points, and finally corrects them by calculating the stripe’s normal direction using the Hessian matrix. Experimental results show that the proposed algorithm can still extract the stripe center points well under strong interference, with the RMSE reduced by 37% compared to the Steger method and the running speed increased by almost 4 times compared to the grayscale centroid method. The algorithm’s strong robustness, high accuracy, and efficiency provide a viable solution for real-time measurement of line-structured light and high-precision three-dimensional reconstruction. Full article
(This article belongs to the Special Issue Micro-Nano Optics and High-End Measurement Instruments: 2nd Edition)
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