Advances in EUV Optics: Science and Technology
A special issue of Photonics (ISSN 2304-6732). This special issue belongs to the section "Lasers, Light Sources and Sensors".
Deadline for manuscript submissions: 31 March 2026
Special Issue Editors
Interests: XUV spectroscopy; thin films; synchrotron radiation; EUV lithography
Interests: multilayer optical coatings and applications
Special Issue Information
Dear Colleagues,
Extreme Ultraviolet (EUV) optics form the cornerstone of cutting-edge technologies, from next-generation EUV lithography to advanced light source beamline applications such as synchrotron radiation and free electron lasers. As the demand for higher-resolution imaging and smaller-scale patterning intensifies, innovations in EUV science—spanning materials design, metrology, and system integration—are critical. This Special Issue aims to showcase breakthroughs in EUV optical systems, including materials design, manufacturing technology, precision metrology, and computational modeling, which collectively address the challenges of EUV optical innovation. For instance, recent advances in multilayer mirrors with barrier layers have significantly enhanced irradiation resistance and thermal stability, while new infrared suppression models improve EUV source efficiency. Similarly, innovations in phase-shift masks and multilayer stacks are enabling higher-numerical-aperture lithography.
This Special Issue will highlight interdisciplinary research bridging fundamental science and industrial applications, including mirror polishing, novel thin-film configurations, synchrotron/FEL beamline optimization, innovative EUV lithography advancement, and laboratory EUV light source realization. We invite contributions that explore these themes, emphasizing scalability, stability, and precision in EUV optics. This rationale underscores the interdisciplinary nature of EUV optics and aligns with the current trends, encouraging submissions that address both theoretical and practical challenges in the field.
Dr. Meiyi Wu
Dr. Runze Qi
Guest Editors
Manuscript Submission Information
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Keywords
- EUV optics
- lithography
- mirror polishing
- metrology
- grating
- thin films
- multilayers
- optical performance
- synchrotron radiation
- free electron lasers
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