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Micromachines
Special Issues
Research Progress of Precision Polishing Technology
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Research Progress of Precision Polishing Technology

A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".

Deadline for manuscript submissions: closed (28 February 2025) | Viewed by 5380

Special Issue Editors

Prof. Dr. Mingming Lu

E-Mail Website
Guest Editor
Key Laboratory of Micro/Nano and Ultra-precision Manufacturing (Jilin Province), School of Electromechanical Engineering, Changchun University of Technology, Changchun 130012, China
Interests: theory and technology of the precision polishing of difficult-to-process materials; micro/nano manufacturing; intelligent manufacturing; equipment development; detection and data
Dr. Yan Gu

E-Mail Website
Guest Editor
Key Laboratory of Micro/Nano and Ultra-precision Manufacturing (Jilin Province), School of Electromechanical Engineering, Changchun University of Technology, Changchun 130012, China
Interests: vibration-assisted processing of difficult-to-process materials; precision piezoelectric drive; optical free-form surface polishing; laser processing; multi-energy field-assisted processing
Dr. Rongqi Wang

E-Mail Website
Guest Editor
Key Laboratory of CNC Equipment Reliability (Ministry of Education), School of Mechanical and Aerospace Engineering, Jilin University, Changchun 130022, China
Interests: ultrafast laser and ultrasonic co-assisted manufacturing of difficult-to-process materials; design and optimization of multi-DOF piezoelectrically actuated compliant mechanisms and robots; single-point diamond turning (SPDT) with fast tool servo (FTS) for optical freedom surfaces

Special Issue Information

Dear Colleagues,

Precision polishing technology has attracted much attention in recent years; it has become one of the hot spots of manufacturing and scientific research. The development of this technology not only improves the surface quality of materials and machining accuracy, but also has great significance in the fields of optoelectronics, semiconductor manufacturing, and precision optical manufacturing.

This Special Issue aims to systematically summarize and present the latest research progress of precision polishing technology, discuss its application cases in different fields, and look forward to future development directions. We welcome local as well as international scholars and experts to submit original research papers, review articles, and cutting-edge reviews. It covers, but is not limited to, the following topics:

  1. Design and optimization of high-efficiency polishing tools and equipment;
  2. Development and application of new polishing materials;
  3. Optimization and improvement of polishing processes;
  4. Removal mechanisms and damage mechanisms of polishing materials;
  5. Evolution mechanism of surface morphology in precision polishing processes;
  6. Multi-energy field-assisted polishing (such as electric field, magnetic field, laser, etc.);
  7. Development and application of environmentally friendly polishing liquid and treatment technology;
  8. Application of precision polishing technology in optoelectronics, semiconductor manufacturing, precision optical manufacturing, and other fields;
  9. Application of machine learning and artificial intelligence in precision polishing technology;
  10. Construction and application of a process database (such as polishing processes, parameter selection, surface treatment method, etc.).

We look forward to receiving your submissions!

Prof. Dr. Mingming Lu
Dr. Yan Gu
Dr. Rongqi Wang
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Micromachines is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2100 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • precision polishing technology
  • advanced manufacturing
  • equipment research and development
  • process optimization and improvement
  • application of new polishing materials
  • theoretical analysis

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Further information on MDPI's Special Issue policies can be found here.

Published Papers (2 papers)

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17 pages, 12655 KiB  
Article
Design, Testing, and Experimental Validation of a Rotary Vibration-Assisted Polishing Device (RVAPD) for Enhanced Machining and Surface Quality
by Silin Liu, Yan Gu, Jieqiong Lin, Zisu Xu, Tianyu Gao, Xinyang Liu, Xiaoming Zhang and Bingjin Yu
Micromachines 2024, 15(10), 1242; https://doi.org/10.3390/mi15101242 - 9 Oct 2024
Viewed by 3639
Abstract
A rotary vibration-assisted polishing device (RVAPD) is designed to enhance polishing force by converting PZT’s linear motion into the rotary motion of a central platform via a flexible mechanism, improving material surface quality. The RVAPD is optimized, simulated, and tested to meet high-frequency [...] Read more.
A rotary vibration-assisted polishing device (RVAPD) is designed to enhance polishing force by converting PZT’s linear motion into the rotary motion of a central platform via a flexible mechanism, improving material surface quality. The RVAPD is optimized, simulated, and tested to meet high-frequency and large-amplitude non-resonant vibration polishing requirements. Its structure, designed using theoretical models and finite element software, offers a wide range of polishing parameters. Performance parameters are validated through open-loop tests, confirming effectiveness in polishing experiments. The lever mechanism and Hoeckens connection enhance vibration parameters and motion efficiency, reducing surface flaws in SiC and improving uniformity. Adjusting the RVAPD structure and using the proposed method significantly improve SiC surface quality. Full article
(This article belongs to the Special Issue Research Progress of Precision Polishing Technology)
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12 pages, 7479 KiB  
Article
A Rapid Fabrication Method of Large-Area MLAs with Variable Curvature for Retroreflectors Based on Thermal Reflow
by Yiqiu Yong, Si Chen, Hao Chen, Haixiong Ge and Zongbin Hao
Micromachines 2024, 15(7), 816; https://doi.org/10.3390/mi15070816 - 25 Jun 2024
Cited by 1 | Viewed by 1097
Abstract
Retroreflectors are an important optical component, but current retroreflector structures and manufacturing processes are relatively complex. This paper proposes a rapid, low-cost, large-area method for fabricating retroreflectors based on microlens arrays. Tunable microlens arrays with adjustable curvature, fill factor, and sizes were prepared [...] Read more.
Retroreflectors are an important optical component, but current retroreflector structures and manufacturing processes are relatively complex. This paper proposes a rapid, low-cost, large-area method for fabricating retroreflectors based on microlens arrays. Tunable microlens arrays with adjustable curvature, fill factor, and sizes were prepared using photolithography and thermal reflow techniques. Subsequently, a two-step nanoimprinting process was used to create a flexible reverse mold and transfer the structure onto the desired substrate. The microlens arrays, with a diameter of 30 μm, a period of 33 μm, a curvature radius ranging from 15.5 to 18.8 μm, and a fill factor ranging from 75.1% to 88.8%, were fabricated this way. In addition, the method also fabricated microlens arrays with diameters ranging from 10 to 80 μm. Retroreflectors were made by sputtering a layer of silver on the MLAs as a reflecting layer, and tests showed that the microlens-based retroreflector exhibited superior retroreflective performance with a wide-angle response of ±75°. Microlens-based retroreflectors have the advantages of simple operation and controllable profiles. The fabrication method in this paper is suitable for large-scale production, providing a new approach to retroreflector design. Full article
(This article belongs to the Special Issue Research Progress of Precision Polishing Technology)
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