Next-Level Surface Metrology—Advances in Sensors, Data Analysis and Simulation

Dear Colleagues,

Advancements in surface processing lead to novel and interesting problems in the research and development of processes accompanying metrology. In a variety of fields, such as novel sensing approaches, intelligent data-processing techniques, and model-based manufacturing schemes, progress in research drives novel applications in industry. Large achievements are to be expected by leveraging the potential of the combined, closed-loop operation of surface processing and (optical) metrology.

The aim of this Special Issue is to open discussion and technical routes for further developments in this topic across the disciplines of physicists, laser engineers, data-processing experts, and system theorists. Submissions can demonstrate novel metrology and sensing techniques for surface analysis, develop and evaluate novel data analysis approaches to enhance metrology or allow gains by sensor fusion, and be research on model-based, generalized surface processing approaches.

Please submit your manuscripts related, but not limited, to the following areas:

• Low-coherence interferometric metrology techniques (incl. OCT and others).
• Microscopy and coherent techniques (e.g., speckle interferometry).
• High-dynamic-range, low-SNR, and high-resolution techniques.
• Advanced imaging techniques (hyperspectral imaging, scattering techniques, appearance imaging, etc.).
• Computational imaging technologies (ghost imaging, compressed sensing, etc.).
• From lab to sensor (technologies for sensor fusion, autonomous calibration, and sensing as well as multi-domain sensing).
• Optical metrology-related data-processing approaches (AI, sparse data, fingerprint techniques, and others).
• Novel approaches to photonic surface processing and functionalization (sub-diffraction limit, random pattern processing, direct laser interference patterning, holographic lithography, photonic jet, etc.).
• Modeling and generalization of surface processing approaches, surface functionality, and its metrology.
• Closed-loop system description, design, calibration, and/or evaluation (combination of metrology and surface processing tools) in the context of photonic surface processing and characterization.

Prof. Dr. Steve Vanlanduit
Prof. Dr. Stuart T. Smith
Dr. Christopher Taudt
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Metrology is an international peer-reviewed open access quarterly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.