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Advanced Crystals: Integrating Doping Strategies, Interface Control, and Numerical Simulations

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Electronic Materials".

Deadline for manuscript submissions: 20 April 2026 | Viewed by 376

Special Issue Editors

State Key Laboratory of Crystal Material, Shandong University, Jinan, China
Interests: crystal growth; wide-bandgap semiconductor; GaN crystal; AlN crystal; perovskite crystal
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Guest Editor Assistant
Institute of Novel Semiconductors, State Key Lab of Crystal Materials, Shandong University, Jinan 250100, China
Interests: energy storage; crystal growth; wide bandgap semiconductor; gallium nitride (gan); Aluminium nitride (AlN)

Special Issue Information

Dear Colleagues,

This Special Issue focuses on the advanced study of crystalline materials, emphasizing the integration of doping, interface control, and numerical simulation in growth processes. Advanced crystalline materials, such as Gallium Nitride (GaN), are prominent wide-bandgap semiconductors distinguished by their high breakdown voltage and enhanced electron mobility. These materials possess remarkable optical and electrical properties, making them ideal for use in an array of applications including lasers and high-voltage, high-frequency power electronic devices. Their potential applications span solid-state lighting, data storage, image display, ultraviolet detection, utilization in new-energy vehicles, and integration into communication technologies.

We invite submissions that explore the intricate physical and chemical phenomena involved in both vapor- and liquid-phase growth of advanced crystalline materials. We encourage theoretical and experimental studies that delve into the interplay among doping, interface engineering, and numerical simulations during the growth processes.

Furthermore, characterization techniques for assessing crystal quality and properties will also be highlighted. By synthesizing theoretical and experimental approaches, this Special Issue aims to advance the understanding of crystal growth and develop strategies for producing high-quality crystalline materials essential for next-generation technologies. We welcome original research articles and comprehensive reviews that align with these themes.

Dr. Lei Zhang
Guest Editor

Dr. Songyang Lv
Guest Editor Assistant

Manuscript Submission Information

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Keywords

  • crystal growth
  • vapor phase growth
  • liquid phase growth
  • doping
  • crystalline surfaces
  • crystalline interface
  • crystallization mechanisms
  • characterization techniques of crystal
  • numerical simulation of crystal

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Published Papers (1 paper)

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Research

15 pages, 2428 KB  
Article
Simulation Study on the Effect of Growth Pressure on Growth Rate of GaN
by Tian Qin, Huidong Yu, Qingbin Liu, Qiubo Li, Zhongxin Wang, Shouzhi Wang, Lihuan Wang, Guodong Wang, Jiaoxian Yu, Zhanguo Qi, Zhengtang Yang and Lei Zhang
Materials 2025, 18(21), 4941; https://doi.org/10.3390/ma18214941 - 29 Oct 2025
Viewed by 293
Abstract
During the preparation of gallium nitride (GaN) single crystals by Hydride Vapor Phase Epitaxy (HVPE), variations in growth pressure within the reaction chamber can easily lead to a mismatch between vapor transport dynamics and surface reaction processes, thereby affecting crystal growth rate and [...] Read more.
During the preparation of gallium nitride (GaN) single crystals by Hydride Vapor Phase Epitaxy (HVPE), variations in growth pressure within the reaction chamber can easily lead to a mismatch between vapor transport dynamics and surface reaction processes, thereby affecting crystal growth rate and uniformity. To address this issue, this study established a multi-physics coupled simulation model based on the HVPE equipment structure. By integrating reaction gas flow, heat transfer, chemical reactions, and mass transport mechanisms, systematic finite element analysis was employed to simulate the flow field distribution, thermal field stability, and precursor concentration field evolution within the reaction chamber under different growth pressures (91–141 kPa). The simulation results indicate that, on one hand, the growth rate exhibits a nearly linear increase trend with rising pressure. At lower pressures (<100 kPa), vapor transport is limited, leading to a significant decrease in growth rate, while at higher pressures (>110 kPa), growth uniformity deteriorates. Optimizing the pressure parameter can enhance both the growth rate and thickness uniformity of GaN single crystals, providing a basis for process control in the preparation of high-performance GaN devices. Full article
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