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Advances in Coatings Prepared by Deposition: Microstructure, Properties and Applications

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".

Deadline for manuscript submissions: closed (20 June 2023) | Viewed by 4783

Special Issue Editors


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Guest Editor
Department of Physics and Astronomy “Ettore Majorana”, University of Catania, 95123 Catania, Italy
Interests: deposition techniques; thin films; advanced materials; characterization techniques; nanostructures; electrocatalysts; water splitting
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E-Mail Website
Guest Editor
Department of Physics and Astronomy “Ettore Majorana”, University of Catania, Via Santa Sofia 64, 95123 Catania, Italy
Interests: nanofabrication; nano-electrochemical sensors; electroanalysis; X-ray photoelectron spectroscopy
Special Issues, Collections and Topics in MDPI journals

Special Issue Information

Dear Colleagues,

Advancements in deposition techniques are pivotal for the development of coatings with enormous potential for technologically relevant applications, such as photo/electrocatalysis, sensors, microelectronics, photonics, solar cells, etc.

The ability to tune the properties of coatings by properly regulating their microstructure, morphology and composition, adopting an advanced fabrication route is a crucial factor to improve their performances for the targeted application.

The Special Issue “Advances in Coatings Prepared by Deposition: Microstructure, Properties and Applications” aims to welcome original research papers and reviews focusing on advanced coatings realized through a wide variety of fabrication routes, including either physical (e.g., sputtering, ion implantation, pulsed layer deposition, etc.) or chemical (chemical vapour deposition, sol–gel, chemical bath deposition, hydrothermal, etc.) methods.

The Special Issue aims to cover a wide range of topics, from the growth of coatings to the investigation of their properties through advanced characterization techniques, to demonstrate their deployment in various applications.

Potential topics include, but are not limited to:

  • The fabrication and characterization of nanostructured coatings;
  • The optimization of the deposition process in view of specific applications;
  • Electrocatalysts for applications towards oxygen and/or hydrogen evolution reactions;
  • Coatings for applications in sensors;
  • Coatings for applications in microelectronics;
  • Coatings for applications in solar cells.

Dr. Sergio Battiato
Dr. Antonino Scandurra
Guest Editors

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Keywords

  • deposition processes
  • application of advanced coatings
  • electrocatalysis
  • photocatalysis
  • sensors
  • solar cells
  • microelectronics

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Published Papers (3 papers)

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Research

26 pages, 11506 KiB  
Article
Silver Vapor Supersonic Jets: Expansion Dynamics, Cluster Formation, and Film Deposition
by Alexander V. Bulgakov, Nikolay Y. Bykov, Alexey I. Safonov, Yuri G. Shukhov and Sergey V. Starinskiy
Materials 2023, 16(13), 4876; https://doi.org/10.3390/ma16134876 - 7 Jul 2023
Cited by 2 | Viewed by 1224
Abstract
Supersonic jets of metal vapors with carrier gas are promising for producing nanostructured metal films at relatively low source temperatures and high deposition rates. However, the effects of the carrier gas on the jet composition and expansion dynamics, as well as on film [...] Read more.
Supersonic jets of metal vapors with carrier gas are promising for producing nanostructured metal films at relatively low source temperatures and high deposition rates. However, the effects of the carrier gas on the jet composition and expansion dynamics, as well as on film properties, remain virtually unexplored. In this work, the free-jet expansion of a mixture of silver vapor with helium in a rarefied regime at an initial temperature of 1373 K is investigated through mass spectrometry and direct-simulation Monte Carlo methods. Introducing the carrier gas into the source is found to result in a transition from a collisionless to a collision-dominated expansion regime and dramatic changes in the Ag jet, which becomes denser, faster, and more forward-directed. The changes are shown to be favorable for the formation of small Ag clusters and film deposition. At a fairly high helium flow, silver Ag2 dimers are observed in the jet, both in the experiment and the simulations, with a mole fraction reaching 0.1%. The terminal velocities of silver atoms and dimers are nearly identical, indicating that the clusters are likely formed due to the condensation of silver vapor in the expanding jet. A high potential of supersonic Ag-He jets for the deposition of nanostructured silver films is demonstrated. The deposited jet Ag2 dimers appear to serve as nucleation centers and, thus, allow for controlling the size of the produced surface nanostructures. Full article
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13 pages, 5445 KiB  
Article
Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition
by Ranjan Kumar Ghadai, Kamaraj Logesh, Robert Čep, Jasgurpreet Singh Chohan and Kanak Kalita
Materials 2023, 16(13), 4611; https://doi.org/10.3390/ma16134611 - 26 Jun 2023
Cited by 4 | Viewed by 1791
Abstract
Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of [...] Read more.
Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of TiN coating. Thin films grown over Si substrate were further characterised to evaluate the morphological properties, surface roughness and mechanical properties using a scanning electrode microscope (SEM), atomic force microscopy (AFM) and nanoindentation, respectively. EDS equipped with SEM showed the presence of Ti and N elements in considerable amounts. TiN morphology obtained from the SEM test showed small-sized particles on the surface along with cracks and pores. AFM results revealed that by increasing the deposition time, the surface roughness of the coating also increased. The nanomechanical properties such as nanohardness (H) and Young’s modulus (E), etc., evaluated using the nanoindentation technique showed that higher deposition time led to an increase in H and E. Overall, it was observed that deposition time plays a vital role in the TiN coating deposition using the CVD technique. Full article
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16 pages, 9623 KiB  
Article
Synergistic Effects of 2-Butyne-1,4-Diol and Chloride Ions on the Microstructure and Residual Stress of Electrodeposited Nickel
by Ming Sun, Chao Zhang, Ruhan Ya, Hongyu He, Zhipeng Li and Wenhuai Tian
Materials 2023, 16(9), 3598; https://doi.org/10.3390/ma16093598 - 8 May 2023
Viewed by 1487
Abstract
To assess the individual and synergistic effects of 2-butyne-1,4-diol (BD) and chloride ions on the microstructure and residual stress of electrodeposited nickel, various nickel layers were prepared from sulfamate baths comprising varying concentrations of BD and chloride ions by applying direct-current electrodeposition. And [...] Read more.
To assess the individual and synergistic effects of 2-butyne-1,4-diol (BD) and chloride ions on the microstructure and residual stress of electrodeposited nickel, various nickel layers were prepared from sulfamate baths comprising varying concentrations of BD and chloride ions by applying direct-current electrodeposition. And their surface morphologies, microstructure, and residual stress were tested using SEM, XRD, EBSD, TEM, and AFM. While the nickel layers composed of pyramid morphology were prepared from additive-free baths, the surface flattened gradually as the BD concentration of the baths was increased, and the acicular grains in the deposits were replaced with <100> oriented columnar grains or <111> oriented nanograins; additionally, the residual tensile stress of the deposits increased. The addition of chloride ions to the baths containing BD significantly increased the residual stress in the nickel layers, although it only slightly promoted surface flattening and columnar grain coarsening. The effects of BD and chloride ions on the growth mode and residual stress of nickel deposits were explained via analysis of surface morphologies and microstructure. And the results indicate that the reduction of chloride ion concentration is a feasible way to reduce the residual stress of the nickel deposits when BD is included in the baths. Full article
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