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Advances in Thin Film Technology and Laser Processing

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".

Deadline for manuscript submissions: closed (20 August 2023) | Viewed by 1580

Special Issue Editor


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National Institute for Laser, Plasma and Radiation Physics, 409 Atomistilor Street, 077125 Bucharest, Romania
Interests: fractal physics; laser–matter interaction; plasma diagnostics; drug delivery; polymer dynamics
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Special Issue Information

Dear Colleagues,

In recent years, there has been a paradigm shift in regard to the industrialization of certain technologies. With advancements in AI (artificial intelligence) developments, significant efforts have been devoted to the fourth industrial revolution (or Industry 4.0). The computerized control of any production step requires an elevated level of technological maturity and expert knowledge on the fundamental aspects behind the technology, with the thin-film industry being one of many key industries impacted by this revolution.

This Special Issue’s objectives include attracting contributions reporting on the production and characterization of high-quality thin films, as well as their processing through the use of a wide range of techniques. The goal is to highlight technologically mature techniques and innovations in thin-film properties highlighted with surface analysis techniques and in situ and in operando investigations.

Insights into fundamental mechanisms of thin-film growth and parametric control over chemical and physical properties are a key aspect of coating technology when considering scaling-up and aiding the technological transfer towards the industry. Spanning from fundamental aspects regarding thin-film manufacturing techniques or thin-film processing to the development and testing of nano- or mesoscale systems with control over the chemical and physical properties of thin films, topics of interest also include the biocompatibility and bioactivity of functionalized surfaces, deposition technologies, substrate surface preparation techniques, and the development of thin-film-based devices and large-area technologies.

This Special Issue aims to stimulate and promote novel and exciting results from latest developments in thin-film technology, with the involvement of leading experts in the field, as well as promising young researchers.

Dr. Stefan-Andrei Irimiciuc
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Materials is an international peer-reviewed open access semimonthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • thin-film technology
  • pulsed laser deposition
  • laser processing
  • laser–matter interaction
  • functionalized surfaces
  • nanoscale architectures

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Published Papers (1 paper)

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Research

17 pages, 8376 KiB  
Article
Scanning with Laser Beam over the TiO2 Nanotubes Covered with Thin Chromium Layers towards the Activation of the Material under the Visible Light
by Katarzyna Grochowska, Łukasz Haryński, Jakub Karczewski, Kacper Jurak and Katarzyna Siuzdak
Materials 2023, 16(7), 2572; https://doi.org/10.3390/ma16072572 - 23 Mar 2023
Cited by 1 | Viewed by 1240
Abstract
This work presents pulsed UV laser treatment (355 nm, 2 Hz) of TiO2 nanotubes decorated with chromium oxides. The modification was performed in a system equipped with a beam homogenizer, and during the irradiation, the samples were mounted onto the moving motorized [...] Read more.
This work presents pulsed UV laser treatment (355 nm, 2 Hz) of TiO2 nanotubes decorated with chromium oxides. The modification was performed in a system equipped with a beam homogenizer, and during the irradiation, the samples were mounted onto the moving motorized table. In such a system, both precisely selected areas and any large area of the sample can be modified. Photoelectrochemical tests revealed photoresponse of laser-treated samples up to 1.37- and 18-fold under the illumination with ultraviolet-visible and visible light, respectively, in comparison to bare titania. Optimal beam energy fluence regarding sample photoresponse has been established. Scanning electron microscopy images, X-ray diffraction patterns, along with Raman and X-ray photoelectron spectra, suggest that the enhanced photoresponse results from changes solely induced in the layer of chromium oxides. It is believed that the results of the present work will contribute to a wider interest in laser modification of semiconductors exhibiting improved photoelectrochemical activity. Full article
(This article belongs to the Special Issue Advances in Thin Film Technology and Laser Processing)
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