Advanced Thin Films of High-Entropy Alloys

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: 31 December 2025 | Viewed by 1125

Special Issue Editors


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Guest Editor
School of Mechanical Engineering, Wuhan Polytechnic University, Wuhan 430023, China
Interests: powder metallurgy; ceramic materials; coatings; additive manufacturing; energy materials
Special Issues, Collections and Topics in MDPI journals
School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, China
Interests: structural ceramics; dielectric/piezoelectric ceramics; thin film materials
Special Issues, Collections and Topics in MDPI journals

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Guest Editor Assistant
School of Mechanical Engineering, Wuhan Polytechnic University, Wuhan 430023, China
Interests: high-entropy alloy; ferroelectric thin film; coating

Special Issue Information

Dear Colleagues,

High-entropy alloys (HEAs) have emerged as a revolutionary class of materials in recent decades. Their unique multi-principal-element composition, typically consisting of five or more elements in equimolar or near-equimolar ratios, endows them with exceptional properties such as high strength, good ductility, excellent corrosion resistance, and high-temperature stability. These properties make HEAs attractive candidates for a wide range of applications, ranging from aerospace components to energy-related devices.

Thin films of high-entropy alloys have further expanded the scope of their applications. The reduced dimensionality in thin-film form not only enables the study of fundamental material properties at the nanoscale but also offers opportunities for integration into micro- and nano-electronic devices, sensors, chemical industry, biology, medicine, food processing, new energy sources, and coatings for wear and corrosion protection. The ability to precisely control the composition, structure, and morphology of high-entropy alloy thin films is crucial for tailoring their properties to meet the requirements of specific applications.

We invite you to submit manuscripts for publication in this Special Issue: Advanced Thin Films of High-Entropy Alloys. This Special Issue will present the latest developments in this field.

In this Special Issue, original research articles and reviews are welcome. Research areas may include (but not limited to) the following:

  • Fabrication methods and optimization of thin films;
  • Fundamental principles of thin films;
  • Functional properties and applications of thin films;
  • Multifunctional high-entropy alloy thin films;
  • Integration with micro- and nano-electronic devices;
  • Three-dimensional integration and additive manufacturing of high-entropy alloy thin films.

We look forward to receiving your contributions.

Dr. Junsheng Yang
Dr. Hua Tan
Guest Editors

Dr. Wenkai Jiang
Guest Editor Assistant

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2600 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • advanced thin film
  • high-entropy alloy
  • fabrication method of thin films
  • applications of thin film
  • micro- and nano-electronic devices
  • functionalization of thin films
  • characterization of thin films
  • functional coatings
  • gradient thin films
  • novel thin-film electrode

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Published Papers (2 papers)

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Research

18 pages, 4269 KB  
Article
Preparation of FeCoNiMoCu High-Entropy Alloy Thin Film Electrode and Its Water Splitting Performance
by Weisen Huang, Junsheng Yang, Wenkai Jiang and Hua Tan
Coatings 2025, 15(12), 1409; https://doi.org/10.3390/coatings15121409 - 2 Dec 2025
Viewed by 238
Abstract
High-entropy alloy (HEA) thin films have attracted considerable attention owing to their multi-element synergistic effects, high stability, tunable electronic structure, and low-cost potential. In this study, an FeCoNiMoCu HEA thin-film electrode was successfully fabricated via coating and vacuum sintering techniques, using equiatomic Fe, [...] Read more.
High-entropy alloy (HEA) thin films have attracted considerable attention owing to their multi-element synergistic effects, high stability, tunable electronic structure, and low-cost potential. In this study, an FeCoNiMoCu HEA thin-film electrode was successfully fabricated via coating and vacuum sintering techniques, using equiatomic Fe, Co, Ni, Mo, and Cu powders as precursors. The crystal structure, surface morphology, elemental composition/distribution, and chemical states of the FeCoNiMoCu HEA thin-film electrode were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDS), and X-ray photoelectron spectroscopy (XPS), respectively. The hydrogen evolution reaction (HER) performance of the electrode was evaluated in four different electrolyte systems. Additionally, the influence of electrolyte temperature on HER activity was investigated, with the corresponding activation energy (Ea) calculated for each tested system. Results demonstrate that the FeCoNiMoCu HEA thin-film electrode exhibits outstanding HER performance across multiple electrolyte systems. Compared with conventional HER catalysts, this FeCoNiMoCu thin-film electrode achieves a balance between high catalytic activity and broad electrolyte compatibility, filling the research gap in HEA thin-film catalysts with superior performance in various complex electrolyte environments and providing a new reference for the development of low-cost, high-stability HER catalysts for practical applications. Full article
(This article belongs to the Special Issue Advanced Thin Films of High-Entropy Alloys)
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10 pages, 2670 KB  
Article
High-Temperature-Resistant High-Entropy Oxide Protective Coatings for Piezoelectric Thin Films
by Huayong Hu, Jie Liu, Liqing Chao, Xiangdong Ma, Jun Zhang, Yanbing Zhang and Bing Yang
Coatings 2025, 15(8), 861; https://doi.org/10.3390/coatings15080861 - 22 Jul 2025
Viewed by 638
Abstract
By introducing oxygen doping, the structure of an AlCrNbSiTiN coating was optimized, and its high-temperature oxidation resistance was improved. As the oxygen content incorporated increases, the coating changes from an FCC structure to an amorphous or spinel structure. Meanwhile, stress relaxation occurred, and [...] Read more.
By introducing oxygen doping, the structure of an AlCrNbSiTiN coating was optimized, and its high-temperature oxidation resistance was improved. As the oxygen content incorporated increases, the coating changes from an FCC structure to an amorphous or spinel structure. Meanwhile, stress relaxation occurred, and the hardness of the coating dropped to 12 gpa. Oxygen-doped coatings exhibit excellent oxidation resistance; this is especially the case for oxidized coatings, whose structure remains stable up to 900 °C in an oxidizing environment. Full article
(This article belongs to the Special Issue Advanced Thin Films of High-Entropy Alloys)
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