Deposition and Properties of Sputtering Coatings
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Surface Characterization, Deposition and Modification".
Deadline for manuscript submissions: closed (15 July 2022) | Viewed by 569
Special Issue Editor
Interests: optimization of manufacturing coating processes based on physical vapor deposition technology for energy storage applications; Li-ion battery performance evaluation and design of high-power lithium-ion microbatteries
Special Issue Information
Dear Colleagues,
Among the different physical vapor deposition techniques, sputtering has positioned itself as one of the most used techniques for the deposition of metallic and oxide thin films in a wide range of industrial applications. The advances in studies to understand the physical nature of sputtering deposition process will allow the emergence of novel materials with the potential to overcome the current technological challenges of the semiconductor, aircraft, renewable energy, optical, and biomedical industries. To this end, we are launching this new Special Issue of Coatings that will collect original research articles and review papers. Contributions should emphasize the fundamentals and applications of the sputtering coating deposition process.
Prof. Dr. Fabian Ambriz Vargas
Guest Editor
Manuscript Submission Information
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Keywords
- advanced thin films
- advanced characterization techniques for sputtered coatings
- growth mechanism of sputtered thin films
- plasmas physics of the sputtering deposition process
- functional coatings and thin films for electronic devices
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