Advanced EUV and X-Ray Optics

Dear Colleagues,                

More than a century after the discovery of X-ray radiation by Wilhelm Conrad Röntgen in 1895, short wavelength radiation in the extreme ultraviolet to soft X-ray region (~30 eV–1 keV photon energy) of the electromagnetic spectrum has been developed into an inevitable and unique probe for fundamental research in physics, chemistry, astronomy and life sciences, as well as a driver of technological development, e.g., in advanced microscopy and lithography systems.

Elemental and chemical specificity, nanoscopic spatial resolution and the ability to generate ultrashort electromagnetic pulses in the attosecond (10^-18 s) time domain are unique features in this spectral domain, of which exploitation calls for the development of advanced optics.

Grazing incidence or multilayer reflectors, polarizers, diffractive optics, filters and beam splitters, waveguides and combination of such elements have been developed to ever higher standards over the last three decades and today it can be stated that soft X-ray optical elements and optics systems fulfil the most stringent requirements on surface/interface quality, as well as wavefront accuracy, both on sub-nanometer scales.

The very recent activities in the generation of ultra-intense highly brilliant soft X-ray radiation by Free Electron Lasers, attosecond-pulsed radiation by High Harmonic Generation, as well as the development of EUV microscopy and lithography systems aiming towards 1 nm spatial resolution, now calls for new ideas in optics development towards larger radiation hardness and ultimately precise control over spectral amplitude and phase.

This Special Issue of the journal Applied Sciences “Advanced EUV and X-Ray Optics” calls for research articles covering such new ideas and recent advances in the design, development, fabrication and application of EUV and/or soft X-ray optical elements and systems with unprecedented parameters.

Prof. Dr. Ulf Kleineberg
Dr. Alexander Guggenmos
Guest Editors

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