Reider, A.M.; Kronthaler, A.; Zappa, F.; Menzel, A.; Laimer, F.; Scheier, P.
Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature. Surfaces 2025, 8, 36.
https://doi.org/10.3390/surfaces8020036
AMA Style
Reider AM, Kronthaler A, Zappa F, Menzel A, Laimer F, Scheier P.
Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature. Surfaces. 2025; 8(2):36.
https://doi.org/10.3390/surfaces8020036
Chicago/Turabian Style
Reider, Anna Maria, Ariane Kronthaler, Fabio Zappa, Alexander Menzel, Felix Laimer, and Paul Scheier.
2025. "Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature" Surfaces 8, no. 2: 36.
https://doi.org/10.3390/surfaces8020036
APA Style
Reider, A. M., Kronthaler, A., Zappa, F., Menzel, A., Laimer, F., & Scheier, P.
(2025). Comparison of Continuous and Pulsed Low-Power DC Sputtered Ti Thin Films Deposited at Room Temperature. Surfaces, 8(2), 36.
https://doi.org/10.3390/surfaces8020036