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Coatings 2019, 9(2), 102; https://doi.org/10.3390/coatings9020102

Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma

1
Materials and Energy Measurement Center, Korea Research Institute of Standards and Science (KRISS), Daejeon 34113, Korea
2
Department of Chemical Engineering, Hanyang University, Seoul 04763, Korea
*
Author to whom correspondence should be addressed.
These authors contributed equally to this study.
Received: 26 December 2018 / Revised: 25 January 2019 / Accepted: 1 February 2019 / Published: 7 February 2019
(This article belongs to the Special Issue Surface Plasma Treatments)
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Abstract

Yttrium oxide (Y2O3) and yttrium oxyfluoride (YO0.6F2.1) protective coatings were prepared by an atmospheric plasma spraying technique. The coatings were exposed to a NF3 plasma. After the NF3 plasma treatment, the mass loss of the coatings showed that the etching rate of YO0.6F2.1 was larger than that of the Y2O3. X-ray photoelectron spectroscopy revealed that YO0.5F1.9 was present in the Y2O3 coating, whereas YO0.4F2.2 was present in the YO0.6F2.1 coating. Transmission electron microscope analysis conducted on contamination particles generated during the plasma etching showed that both coatings were mainly composed of YFx. The contamination particles estimated by in-situ particle monitoring sensor revealed that the YO0.6F2.1 compared with the Y2O3 coatings produced 65% fewer contamination particles. View Full-Text
Keywords: yttrium oxide (Y2O3); yttrium oxyfluoride (YOF); yttrium fluoride (YF3); atmospheric plasma spraying (APS); contamination particle; plasma etching; NF3 plasma yttrium oxide (Y2O3); yttrium oxyfluoride (YOF); yttrium fluoride (YF3); atmospheric plasma spraying (APS); contamination particle; plasma etching; NF3 plasma
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Song, J.-B.; Kim, J.-T.; Oh, S.-G.; Yun, J.-Y. Contamination Particles and Plasma Etching Behavior of Atmospheric Plasma Sprayed Y2O3 and YF3 Coatings under NF3 Plasma. Coatings 2019, 9, 102.

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