Next Article in Journal
Transparent Conductive p-Type Cuprous Oxide Films in Vis-NIR Region Prepared by Ion-Beam Assisted DC Reactive Sputtering
Previous Article in Journal
Non-Invasive On-Site Raman Study of Pigments and Glassy Matrix of 17th–18th Century Painted Enamelled Chinese Metal Wares: Comparison with French Enamelling Technology
Open AccessArticle

Highly Conductive Zinc Oxide Based Transparent Conductive Oxide Films Prepared Using RF Plasma Sputtering Under Reducing Atmosphere

1
Centre for Advanced Materials, School of Engineering, London South Bank University, 103 Borough Road, London SE1 0AA, UK
2
Experimental Techniques Centre, Brunel University London, Kingston Lane, Uxbridge UB8 3PH, UK
*
Authors to whom correspondence should be addressed.
Coatings 2020, 10(5), 472; https://doi.org/10.3390/coatings10050472
Received: 11 April 2020 / Revised: 7 May 2020 / Accepted: 11 May 2020 / Published: 13 May 2020
(This article belongs to the Section Thin Films)
The spectral properties and colour functions of a radio frequency (RF)-based sputtering plasma source was monitored during consecutive sputter deposition of zinc doped indium oxide (IZO) thin films under argon and argon/hydrogen mix. The effect of target exposure to the hydrogen gas on charge density/mobility and spectral transmittance of the deposited films was investigated. We demonstrate that consecutive exposure to the hydrogen gas during the deposition process progressively affects the properties of thin films with a certain degree of continuous improvement in electrical conductivity while demonstrating that reverting to only argon from argon/ hydrogen mix follows a complex pathway, which has not been reported previously in such detail to our knowledge. We then demonstrate that this effect can be used to prepare highly conductive zinc oxide thin films without indium presence and as such eliminating the need for the expensive indium addition. We shall demonstrate that complexity observed in emission spectra can be simply identified by monitoring the colour of the plasma through its colour functions, making this technique a simple real-time monitoring method for the deposition process. View Full-Text
Keywords: sputtering; ZnO; IZO; TCO; plasma; conducting oxides; transparent; hydrogen sputtering; ZnO; IZO; TCO; plasma; conducting oxides; transparent; hydrogen
Show Figures

Figure 1

MDPI and ACS Style

Salimian, A.; Hasnath, A.; Anguilano, L.; Onwukwe, U.; Aminishahsavarani, A.; Sachez, C.; Upadhyaya, H. Highly Conductive Zinc Oxide Based Transparent Conductive Oxide Films Prepared Using RF Plasma Sputtering Under Reducing Atmosphere. Coatings 2020, 10, 472.

Show more citation formats Show less citations formats
Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Article Access Map by Country/Region

1
Search more from Scilit
 
Search
Back to TopTop