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Open AccessArticle

A Novel Route to Manufacture 2D Layer MoS2 and g-C3N4 by Atmospheric Plasma with Enhanced Visible-Light-Driven Photocatalysis

National Engineering Research Center of Industry Crystallization Technology, School of Chemical Engineering and Technology, Tianjin University, Tianjin 300072, China
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Nanomaterials 2019, 9(8), 1139; https://doi.org/10.3390/nano9081139
Received: 12 July 2019 / Revised: 29 July 2019 / Accepted: 6 August 2019 / Published: 8 August 2019
(This article belongs to the Special Issue Plasma for Energy and Catalytic Nanomaterials)
An atmospheric plasma treatment strategy was developed to prepare two-dimensional (2D) molybdenum disulfide (MoS2) and graphitic carbon nitride (g-C3N4) nanosheets from (NH4)2MoS4 and bulk g-C3N4, respectively. The moderate temperature of plasma is beneficial for exfoliating bulk materials to thinner nanosheets. The thicknesses of as-prepared MoS2 and g-C3N4 nanosheets are 2–3 nm and 1.2 nm, respectively. They exhibited excellent photocatalytic activity on account of the nanosheet structure, larger surface area, more flexible photophysical properties, and longer charge carrier average lifetime. Under visible light irradiation, the hydrogen production rates of MoS2 and g-C3N4 by plasma were 3.3 and 1.5 times higher than the corresponding bulk materials, respectively. And g-C3N4 by plasma exhibited 2.5 and 1.3 times degradation rates on bulk that for methyl orange and rhodamine B, respectively. The mechanism of plasma preparation was proposed on account of microstructure characterization and online mass spectroscopy, which indicated that gas etching, gas expansion, and the repulsive force of electron play the key roles in the plasma exfoliation. Plasma as an environmentally benign approach provides a general platform for fabricating ultrathin nanosheet materials with prospective applications as photocatalysts for pollutant degradation and water splitting. View Full-Text
Keywords: dielectric barrier discharge plasma; MoS2 nanosheets; g-C3N4 nanosheets; photodegradation; water splitting; gas etching; repulsive force dielectric barrier discharge plasma; MoS2 nanosheets; g-C3N4 nanosheets; photodegradation; water splitting; gas etching; repulsive force
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MDPI and ACS Style

Zhang, B.; Wang, Z.; Peng, X.; Wang, Z.; Zhou, L.; Yin, Q. A Novel Route to Manufacture 2D Layer MoS2 and g-C3N4 by Atmospheric Plasma with Enhanced Visible-Light-Driven Photocatalysis. Nanomaterials 2019, 9, 1139.

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