Straightforward Immobilization of Phosphonic Acids and Phosphoric Acid Esters on Mesoporous Silica and Their Application in an Asymmetric Aldol Reaction
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Weinberger, C.; Heckel, T.; Schnippering, P.; Schmitz, M.; Guo, A.; Keil, W.; Marsmann, H.C.; Schmidt, C.; Tiemann, M.; Wilhelm, R. Straightforward Immobilization of Phosphonic Acids and Phosphoric Acid Esters on Mesoporous Silica and Their Application in an Asymmetric Aldol Reaction. Nanomaterials 2019, 9, 249. https://doi.org/10.3390/nano9020249
Weinberger C, Heckel T, Schnippering P, Schmitz M, Guo A, Keil W, Marsmann HC, Schmidt C, Tiemann M, Wilhelm R. Straightforward Immobilization of Phosphonic Acids and Phosphoric Acid Esters on Mesoporous Silica and Their Application in an Asymmetric Aldol Reaction. Nanomaterials. 2019; 9(2):249. https://doi.org/10.3390/nano9020249
Chicago/Turabian StyleWeinberger, Christian, Tatjana Heckel, Patrick Schnippering, Markus Schmitz, Anpeng Guo, Waldemar Keil, Heinrich C. Marsmann, Claudia Schmidt, Michael Tiemann, and René Wilhelm. 2019. "Straightforward Immobilization of Phosphonic Acids and Phosphoric Acid Esters on Mesoporous Silica and Their Application in an Asymmetric Aldol Reaction" Nanomaterials 9, no. 2: 249. https://doi.org/10.3390/nano9020249