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Open AccessArticle

Electrodeposition of Nanoparticles and Continuous Film of CdSe on n-Si (100)

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Dipartimento di Chimica, Università degli Studi di Firenze, via della Lastruccia 3, 50019 Sesto Fiorentino, Italy
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CNR-ICCOM, Istituto di Chimica dei Composti OrganoMetallici, via Madonna del Piano 10, 50019 Sesto Fiorentino (FI), Italy
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CNR-IPCF, Istituto per i Processi Chimico-Fisici, V.le F. Stagno D’Alcontres 37, 98158 Messina, Italy
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Dipartimento di Fisica ed Astronomia, Università di Catania, Via Santa Sofia 64, 95123 Catania, Italy
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Author to whom correspondence should be addressed.
Nanomaterials 2019, 9(10), 1504; https://doi.org/10.3390/nano9101504
Received: 27 September 2019 / Revised: 16 October 2019 / Accepted: 17 October 2019 / Published: 22 October 2019
(This article belongs to the Special Issue Nanomaterials Based on IV-Group Semiconductors)
CdSe electrodeposition on n-Si (100) substrate was investigated in sulfuric acid solution. The behaviour and the deposition of the precursors (Cd and Se) were studied separately at first. Then, we explored both the alternated deposition, one layer by one, as well as the simultaneous co-deposition of the two elements to form the CdSe semiconductor. Varying the deposition conditions, we were able to obtain nanoparticles, or a thin film, on the surface of the electrode. The samples were then characterised microscopically and spectroscopically with SEM, XRD and XPS. Finally, we evaluated the induced photoemission of the deposit for the application in optoelectronics. View Full-Text
Keywords: CdSe; cadmium; selenide; silicon; electrodeposition; emitting diode; optoelectronics; nanoparticles; thin film CdSe; cadmium; selenide; silicon; electrodeposition; emitting diode; optoelectronics; nanoparticles; thin film
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MDPI and ACS Style

Giurlani, W.; Dell’Aquila, V.; Vizza, M.; Calisi, N.; Lavacchi, A.; Irrera, A.; Lo Faro, M.J.; Leonardi, A.A.; Morganti, D.; Innocenti, M. Electrodeposition of Nanoparticles and Continuous Film of CdSe on n-Si (100). Nanomaterials 2019, 9, 1504.

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