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Open AccessArticle

Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography

1
AMBER Centre & CRANN, Trinity College Dublin, College Green, Dublin, Ireland
2
Laboratoire des Technologies de la Microelectronique (CNRS), 38054 Grenoble, France
3
Department of Materials Science Engineering, University of Ioannina, University Campus-Dourouti, 45110 Ioannina, Greece
*
Authors to whom correspondence should be addressed.
Nanomaterials 2018, 8(1), 32; https://doi.org/10.3390/nano8010032
Received: 8 December 2017 / Revised: 28 December 2017 / Accepted: 2 January 2018 / Published: 9 January 2018
The self-assembly of a lamellar-forming polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) diblock copolymer (DBCP) was studied herein for surface nanopatterning. The DBCP was synthesized by sequential living anionic polymerization of styrene and hexamethylcyclotrisiloxane (D3). The number average molecular weight (Mn), polydispersity index (Mw/Mn) and PS volume fraction (φps) of the DBCP were MnPS = 23.0 kg mol−1, MnPDMS = 15.0 kg mol−1, Mw/Mn = 1.06 and φps = 0.6. Thin films of the DBCP were cast and solvent annealed on topographically patterned polyhedral oligomeric silsesquioxane (POSS) substrates. The lamellae repeat distance or pitch (λL) and the width of the PDMS features (dL) are ~35 nm and ~17 nm, respectively, as determined by SEM. The chemistry of the POSS substrates was tuned, and the effects on the self-assembly of the DBCP noted. The PDMS nanopatterns were used as etching mask in order to transfer the DBCP pattern to underlying silicon substrate by a complex plasma etch process yielding sub-15 nm silicon features. View Full-Text
Keywords: directed self-assembly; lamellar diblock copolymer; polyhedral oligomeric silsesquioxane (POSS); nanoimprint lithography; pattern transfer directed self-assembly; lamellar diblock copolymer; polyhedral oligomeric silsesquioxane (POSS); nanoimprint lithography; pattern transfer
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Borah, D.; Cummins, C.; Rasappa, S.; Senthamaraikannan, R.; Salaun, M.; Zelsmann, M.; Liontos, G.; Ntetsikas, K.; Avgeropoulos, A.; Morris, M.A. Nanopatterning via Self-Assembly of a Lamellar-Forming Polystyrene-block-Poly(dimethylsiloxane) Diblock Copolymer on Topographical Substrates Fabricated by Nanoimprint Lithography. Nanomaterials 2018, 8, 32.

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