Wei, P.; Li, Y.; Li, T.; Sheng, N.; Li, E.; Sun, Y.
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty. Appl. Sci. 2019, 9, 2151.
https://doi.org/10.3390/app9102151
AMA Style
Wei P, Li Y, Li T, Sheng N, Li E, Sun Y.
Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty. Applied Sciences. 2019; 9(10):2151.
https://doi.org/10.3390/app9102151
Chicago/Turabian Style
Wei, Pengzhi, Yanqiu Li, Tie Li, Naiyuan Sheng, Enze Li, and Yiyu Sun.
2019. "Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty" Applied Sciences 9, no. 10: 2151.
https://doi.org/10.3390/app9102151
APA Style
Wei, P., Li, Y., Li, T., Sheng, N., Li, E., & Sun, Y.
(2019). Multi-Objective Defocus Robust Source and Mask Optimization Using Sensitive Penalty. Applied Sciences, 9(10), 2151.
https://doi.org/10.3390/app9102151