Application of the Alexander–Haasen Model for Thermally Stimulated Dislocation Generation in FZ Silicon Crystals
Sabanskis, A.; Dadzis, K.; Menzel, R.; Virbulis, J. Application of the Alexander–Haasen Model for Thermally Stimulated Dislocation Generation in FZ Silicon Crystals. Crystals 2022, 12, 174. https://doi.org/10.3390/cryst12020174
Sabanskis A, Dadzis K, Menzel R, Virbulis J. Application of the Alexander–Haasen Model for Thermally Stimulated Dislocation Generation in FZ Silicon Crystals. Crystals. 2022; 12(2):174. https://doi.org/10.3390/cryst12020174
Chicago/Turabian StyleSabanskis, Andrejs, Kaspars Dadzis, Robert Menzel, and Jānis Virbulis. 2022. "Application of the Alexander–Haasen Model for Thermally Stimulated Dislocation Generation in FZ Silicon Crystals" Crystals 12, no. 2: 174. https://doi.org/10.3390/cryst12020174