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Journal: CrystalsVolume: 12Number: 174
Article: Application of the Alexander–Haasen Model for Thermally Stimulated Dislocation Generation in FZ Silicon Crystals
  • Authors:
  • Andrejs Sabanskis1,*,
  • Kaspars Dadzis2 and
  • Robert Menzel2
  • et al.
Link: https://www.mdpi.com/2073-4352/12/2/174

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