Next Article in Journal
Prediction of Dermoscopy Patterns for Recognition of both Melanocytic and Non-Melanocytic Skin Lesions
Next Article in Special Issue
Intelligent Intrusion Detection of Grey Hole and Rushing Attacks in Self-Driving Vehicular Networks
Previous Article in Journal / Special Issue
Continuity-Aware Scheduling Algorithm for Scalable Video Streaming
Article Menu

Export Article

Open AccessArticle
Computers 2016, 5(2), 12;

Optimization of Nano-Process Deposition Parameters Based on Gravitational Search Algorithm

Faculty of Computer and Mathematical Sciences, Universiti Teknologi MARA (Terengganu), 23000 Dungun, Malaysia
NANO-ElecTronic Centre, Faculty of Electrical Engineering, Universiti Teknologi MARA, 40450 Shah Alam, Malaysia
Author to whom correspondence should be addressed.
Academic Editor: Laith Al-Jobouri
Received: 9 March 2016 / Revised: 18 May 2016 / Accepted: 31 May 2016 / Published: 8 June 2016
Full-Text   |   PDF [1573 KB, uploaded 8 June 2016]   |  


This research is focusing on the radio frequency (RF) magnetron sputtering process, a physical vapor deposition technique which is widely used in thin film production. This process requires the optimized combination of deposition parameters in order to obtain the desirable thin film. The conventional method in the optimization of the deposition parameters had been reported to be costly and time consuming due to its trial and error nature. Thus, gravitational search algorithm (GSA) technique had been proposed to solve this nano-process parameters optimization problem. In this research, the optimized parameter combination was expected to produce the desirable electrical and optical properties of the thin film. The performance of GSA in this research was compared with that of Particle Swarm Optimization (PSO), Genetic Algorithm (GA), Artificial Immune System (AIS) and Ant Colony Optimization (ACO). Based on the overall results, the GSA optimized parameter combination had generated the best electrical and an acceptable optical properties of thin film compared to the others. This computational experiment is expected to overcome the problem of having to conduct repetitive laboratory experiments in obtaining the most optimized parameter combination. Based on this initial experiment, the adaptation of GSA into this problem could offer a more efficient and productive way of depositing quality thin film in the fabrication process. View Full-Text
Keywords: gravitational search algorithm; optimization; magnetron sputtering process; deposition parameters gravitational search algorithm; optimization; magnetron sputtering process; deposition parameters

Figure 1

This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

Share & Cite This Article

MDPI and ACS Style

Mohd Sabri, N.; Md Sin, N.D.; Puteh, M.; Mahmood, M.R. Optimization of Nano-Process Deposition Parameters Based on Gravitational Search Algorithm. Computers 2016, 5, 12.

Show more citation formats Show less citations formats

Note that from the first issue of 2016, MDPI journals use article numbers instead of page numbers. See further details here.

Related Articles

Article Metrics

Article Access Statistics



[Return to top]
Computers EISSN 2073-431X Published by MDPI AG, Basel, Switzerland RSS E-Mail Table of Contents Alert
Back to Top