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Micromachines 2016, 7(3), 40;

Fabrication and Measurement of a Suspended Nanochannel Microbridge Resonator Monolithically Integrated with CMOS Readout Circuitry

Department of Electronic Engineering, Universitat Autònoma de Barcelona (UAB), Cerdanyola del Vallès 08193, Spain
Author to whom correspondence should be addressed.
Academic Editor: Ching-Liang Dai
Received: 23 December 2015 / Revised: 23 February 2016 / Accepted: 25 February 2016 / Published: 2 March 2016
(This article belongs to the Special Issue CMOS-MEMS Sensors and Devices)
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We present the fabrication and characterization of a suspended microbridge resonator with an embedded nanochannel. The suspended microbridge resonator is electrostatically actuated, capacitively sensed, and monolithically integrated with complementary metal-oxide-semiconductor (CMOS) readout circuitry. The device is fabricated using the back end of line (BEOL) layers of the AMS 0.35 μm commercial CMOS technology, interconnecting two metal layers with a contact layer. The fabricated device has a 6 fL capacity and has one of the smallest embedded channels so far. It is able to attain a mass sensitivity of 25 ag/Hz using a fully integrable electrical transduction. View Full-Text
Keywords: nanochannel; suspended channel; resonators; CMOS-NEMS; NEMS nanochannel; suspended channel; resonators; CMOS-NEMS; NEMS

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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).

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Vidal-Álvarez, G.; Marigó, E.; Torres, F.; Barniol, N. Fabrication and Measurement of a Suspended Nanochannel Microbridge Resonator Monolithically Integrated with CMOS Readout Circuitry. Micromachines 2016, 7, 40.

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