Liang, H.; Chen, W.; Fu, Y.; Zhou, W.; Mo, L.; Jian, Y.; Wen, Q.; Liu, D.; He, J.
Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide. Micromachines 2025, 16, 271.
https://doi.org/10.3390/mi16030271
AMA Style
Liang H, Chen W, Fu Y, Zhou W, Mo L, Jian Y, Wen Q, Liu D, He J.
Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide. Micromachines. 2025; 16(3):271.
https://doi.org/10.3390/mi16030271
Chicago/Turabian Style
Liang, Huazhuo, Wenjie Chen, Youzhi Fu, Wenjie Zhou, Ling Mo, Yue Jian, Qi Wen, Dawei Liu, and Junfeng He.
2025. "Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide" Micromachines 16, no. 3: 271.
https://doi.org/10.3390/mi16030271
APA Style
Liang, H., Chen, W., Fu, Y., Zhou, W., Mo, L., Jian, Y., Wen, Q., Liu, D., & He, J.
(2025). Back Propagation Neural Network-Based Predictive Model for Magnetorheological–Chemical Polishing of Silicon Carbide. Micromachines, 16(3), 271.
https://doi.org/10.3390/mi16030271
