Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates
Abstract
:1. Introduction
2. Materials and Methods
3. Results
3.1. Microtructure and Elemental Composition
3.2. Phase Composition
3.3. Mechanical Properties
4. Discussion
4.1. Mechanical Behavior of Laminates after Annealing at 700 °C for 10 min
4.2. Mechanical Behavior of Laminates after Annealing at 800 °C for 10 min
5. Conclusions
Supplementary Materials
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
- Pattanaik, P.; Ojha, M. Review on Challenges in MEMS Technology. Mater. Today Proc. 2021; in press. [Google Scholar] [CrossRef]
- Huang, Y.; Sai Sarathi Vasan, A.; Doraiswami, R.; Osterman, M.; Pecht, M. MEMS Reliability Review. IEEE Trans. Device Mater. Reliab. 2012, 12, 482–493. [Google Scholar] [CrossRef]
- Nasim, M.; Li, Y.; Wen, M.; Wen, C. A Review of High-Strength Nanolaminates and Evaluation of Their Properties. J. Mater. Sci. Technol. 2020, 50, 215–244. [Google Scholar] [CrossRef]
- Zhang, R.F.; Zhang, S.H.; Guo, Y.Q.; Fu, Z.H.; Legut, D.; Germann, T.C.; Veprek, S. First-Principles Design of Strong Solids: Approaches and Applications. Phys. Rep. 2019, 826, 1–49. [Google Scholar] [CrossRef]
- Xu, J.; Kamiko, M.; Zhou, Y.; Yamamoto, R.; Li, G.; Gu, M. Superhardness Effects of Heterostructure NbN/TaN Nanostructured Multilayers. J. Appl. Phys. 2001, 89, 3674–3678. [Google Scholar] [CrossRef]
- Lee, H.C.; Kim, K.; Han, S.Y.; Choi, S.K.; Lee, E.; Jo, M.; Yoo, M.S.; Cho, K. Highly Conductive Flexible Metal–Ceramic Nanolaminate Electrode for High-Performance Soft Electronics. ACS Appl. Mater. Interfaces 2019, 11, 2211–2217. [Google Scholar] [CrossRef] [PubMed]
- Tamm, A.; Kahro, T.; Piirsoo, H.-M.; Jõgiaas, T. Atomic-Layer-Deposition-Made Very Thin Layer of Al2O3, Improves the Young’s Modulus of Graphene. Appl. Sci. 2022, 12, 2491. [Google Scholar] [CrossRef]
- Sha, Z.-D.; Branicio, P.S.; Lee, H.P.; Tay, T.E. Strong and Ductile Nanolaminate Composites Combining Metallic Glasses and Nanoglasses. Int. J. Plast. 2017, 90, 231–241. [Google Scholar] [CrossRef]
- Homola, T.; Buršíková, V.; Ivanova, T.V.; Souček, P.; Maydannik, P.S.; Cameron, D.C.; Lackner, J.M. Mechanical Properties of Atomic Layer Deposited Al2O3/ZnO Nanolaminates. Surf. Coat. Technol. 2015, 284, 198–205. [Google Scholar] [CrossRef]
- Jõgiaas, T.; Zabels, R.; Tarre, A.; Tamm, A. Hardness and Modulus of Elasticity of Atomic Layer Deposited Al2O3-ZrO2 Nanolaminates and Mixtures. Mater. Chem. Phys. 2020, 240, 122270. [Google Scholar] [CrossRef]
- Piirsoo, H.-M.; Jõgiaas, T.; Mändar, H.; Ritslaid, P.; Kukli, K.; Tamm, A. Microstructure and Mechanical Properties of Atomic Layer Deposited Alumina Doped Zirconia. AIP Adv. 2021, 11, 055316. [Google Scholar] [CrossRef]
- Ylivaara, O.M.E.; Kilpi, L.; Liu, X.; Sintonen, S.; Ali, S.; Laitinen, M.; Julin, J.; Haimi, E.; Sajavaara, T.; Lipsanen, H.; et al. Aluminum Oxide/Titanium Dioxide Nanolaminates Grown by Atomic Layer Deposition: Growth and Mechanical Properties. J. Vac. Sci. Technol. A Vac. Surf. Film. 2017, 35, 01B105. [Google Scholar] [CrossRef]
- Jõgiaas, T.; Tarre, A.; Mändar, H.; Kozlova, J.; Tamm, A. Nanoindentation of Chromium Oxide Possessing Superior Hardness among Atomic-Layer-Deposited Oxides. Nanomaterials 2022, 12, 82. [Google Scholar] [CrossRef] [PubMed]
- Zhang, L.; Jiang, H.C.; Liu, C.; Dong, J.W.; Chow, P. Annealing of Al2O3 Thin Films Prepared by Atomic Layer Deposition. J. Phys. D Appl. Phys. 2007, 40, 3707–3713. [Google Scholar] [CrossRef]
- Cao, D.; Cheng, X.; Zheng, L.; Wang, Z.; Xu, D.; Xia, C.; Shen, L.; Wang, Q.; Yu, Y.; Shen, D. Effects of Rapid Thermal Annealing on the Properties of HfO2/La2O3 Nanolaminate Films Deposited by Plasma Enhanced Atomic Layer Deposition. J. Vac. Sci. Technol. A 2015, 33, 01A116. [Google Scholar] [CrossRef]
- Wang, R.; Yan, T.; Li, C.; Ren, W.; Niu, G.; Jiang, Z.-D.; Wang, C.; Liu, M.; Ye, Z.-G.; Zhang, Y. Interfacial and Microstructural Changes of the Al2O3/ZnO Multilayer Films Induced by in-Situ Growth and Post-Annealing Temperatures. Mater. Chem. Phys. 2022, 287, 126272. [Google Scholar] [CrossRef]
- Krautheim, G.; Hecht, T.; Jakschik, S.; Schröder, U.; Zahn, W. Mechanical Stress in ALD-Al2O3 Films. Appl. Surf. Sci. 2005, 252, 200–204. [Google Scholar] [CrossRef]
- Ylivaara, O.M.E.; Liu, X.; Kilpi, L.; Lyytinen, J.; Schneider, D.; Laitinen, M.; Julin, J.; Ali, S.; Sintonen, S.; Berdova, M.; et al. Aluminum Oxide from Trimethylaluminum and Water by Atomic Layer Deposition: The Temperature Dependence of Residual Stress, Elastic Modulus, Hardness and Adhesion. Thin Solid Films 2014, 552, 124–135. [Google Scholar] [CrossRef]
- Vermang, B.; Goverde, H.; Simons, V.; De Wolf, I.; Meersschaut, J.; Tanaka, S.; John, J.; Poortmans, J.; Mertens, R. A Study of Blister Formation in ALD Al2O3 Grown on Silicon. In Proceedings of the 2012 38th IEEE Photovoltaic Specialists Conference, Austin, TX, USA, 3–8 June 2012; pp. 1135–1138. [Google Scholar]
- Kukli, K.; Kemell, M.; Vehkamäki, M.; Heikkilä, M.J.; Mizohata, K.; Kalam, K.; Ritala, M.; Leskelä, M.; Kundrata, I.; Fröhlich, K. Atomic Layer Deposition and Properties of Mixed Ta2O5 and ZrO2 Films. AIP Adv. 2017, 7, 025001. [Google Scholar] [CrossRef]
- Yong Shin, K.; SangHeeKo, P.; Sun Jin, Y.; Jung Sook, K. Effect of Rapid Thermal Annealing on the Structure and the Electrical Properties of Atomic-Layer-Deposited Ta2O5 Films. J. Korean Phys. Soc. 2000, 37, 975. [Google Scholar] [CrossRef]
- Min, K.-H.; Sinclair, R.; Park, I.-S.; Kim, S.-T.; Chung, U.-I. Crystallization Behaviour of ALD-Ta2O5 Thin Films: The Application of in-Situ TEM. Philos. Mag. 2005, 85, 2049–2063. [Google Scholar] [CrossRef]
- Henke, T.; Knaut, M.; Geidel, M.; Winkler, F.; Albert, M.; Bartha, J.W. Atomic Layer Deposition of Tantalum Oxide Thin Films Using the Precursor Tert-Butylimido-Tris-Ethylmethylamido-Tantalum and Water: Process Characteristics and Film Properties. Thin Solid Films 2017, 627, 94–105. [Google Scholar] [CrossRef]
- Shcherbina, O.B.; Palatnikov, M.N.; Efremov, V.V. Mechanical Properties of Nb2O5 and Ta2O5 Prepared by Different Procedures. Inorg. Mater. 2012, 48, 433–438. [Google Scholar] [CrossRef]
- Hollerweger, R.; Holec, D.; Paulitsch, J.; Bartosik, M.; Daniel, R.; Rachbauer, R.; Polcik, P.; Keckes, J.; Krywka, C.; Euchner, H.; et al. Complementary Ab Initio and X-Ray Nanodiffraction Studies of Ta2O5. Acta Mater. 2015, 83, 276–284. [Google Scholar] [CrossRef] [PubMed]
- Çetinörgü-Goldenberg, E.; Klemberg-Sapieha, J.-E.; Martinu, L. Effect of Postdeposition Annealing on the Structure, Composition, and the Mechanical and Optical Characteristics of Niobium and Tantalum Oxide Films. Appl. Opt. AO 2012, 51, 6498–6507. [Google Scholar] [CrossRef]
- Larsen, B.; Ausbeck, C.; Bennet, T.F.; DeSalvo, G.; DeSalvo, R.; LeBohec, T.; Linker, S.; Mondin, M.; Neilson, J. Crystallization in Zirconia Film Nano-Layered with Silica. Nanomaterials 2021, 11, 3444. [Google Scholar] [CrossRef]
- Ghazaryan, L.; Handa, S.; Schmitt, P.; Beladiya, V.; Roddatis, V.; Tünnermann, A.; Szeghalmi, A. Structural, Optical, and Mechanical Properties of TiO2 Nanolaminates. Nanotechnology 2020, 32, 095709. [Google Scholar] [CrossRef]
- López-Medina, J.; Vazquez-Arce, J.; Pizá-Ruiz, P.; Nedev, N.; Farías, M.H.; Tiznado, H. HfO2:Y2O3 Ultrathin Nanolaminate Structures Grown by ALD: Bilayer Thickness and Annealing Temperature Effects on Optical Properties. Ceram. Int. 2022, 48, 17564–17575. [Google Scholar] [CrossRef]
- Tamm, A.; Kukli, K.; Niinistö, J.; Lu, J.; Ritala, M.; Leskelä, M. Properties of HfO2 and HfO2: Y Films Grown by Atomic Layer Deposition in an Advanced Monocyclopentadienyl-Based Process. IOP Conf. Ser. Mater. Sci. Eng. 2010, 8, 012022. [Google Scholar] [CrossRef]
- Cui, Y.; Huang, P.; Wang, F.; Lu, T.J.; Xu, K.W. The Hardness and Related Deformation Mechanisms in Nanoscale Crystalline–Amorphous Multilayers. Thin Solid Films 2015, 584, 270–276. [Google Scholar] [CrossRef]
- Zhang, J.Y.; Liu, Y.; Chen, J.; Chen, Y.; Liu, G.; Zhang, X.; Sun, J. Mechanical Properties of Crystalline Cu/Zr and Crystal–Amorphous Cu/Cu–Zr Multilayers. Mater. Sci. Eng. A 2012, 552, 392–398. [Google Scholar] [CrossRef]
- Abboud, M.; Özerinç, S. Size-Independent Strength of Amorphous–HCP Crystalline Metallic Nanolayers. J. Mater. Res. 2019, 34, 2275–2284. [Google Scholar] [CrossRef]
- Yue, T.; Wang, Y.Q.; Zhang, J.Y.; Wu, K.; Li, G.; Kuang, J.; Liu, G.; Sun, J. Unraveling the Discrepancies in Size Dependence of Hardness and Thermal Stability in Crystalline/Amorphous Nanostructured Multilayers: Cu/Cu–Ti vs. Cu/HfO2. Nanoscale 2018, 10, 14331–14341. [Google Scholar] [CrossRef]
- Jõgiaas, T.; Kull, M.; Seemen, H.; Ritslaid, P.; Kukli, K.; Tamm, A. Optical and Mechanical Properties of Nanolaminates of Zirconium and Hafnium Oxides Grown by Atomic Layer Deposition. J. Vac. Sci. Technol. A 2020, 38, 022406. [Google Scholar] [CrossRef]
- Tamm, A.; Piirsoo, H.-M.; Jõgiaas, T.; Tarre, A.; Link, J.; Stern, R.; Kukli, K. Mechanical and Magnetic Properties of Double Layered Nanostructures of Tin and Zirconium Oxides Grown by Atomic Layer Deposition. Nanomaterials 2021, 11, 1633. [Google Scholar] [CrossRef]
- Jõgiaas, T.; Zabels, R.; Tamm, A.; Merisalu, M.; Hussainova, I.; Heikkilä, M.; Mändar, H.; Kukli, K.; Ritala, M.; Leskelä, M. Mechanical Properties of Aluminum, Zirconium, Hafnium and Tantalum Oxides and Their Nanolaminates Grown by Atomic Layer Deposition. Surf. Coat. Technol. 2015, 282, 36–42. [Google Scholar] [CrossRef]
- Piirsoo, H.-M.; Jõgiaas, T.; Ritslaid, P.; Kukli, K.; Tamm, A. Influence to Hardness of Alternating Sequence of Atomic Layer Deposited Harder Alumina and Softer Tantala Nanolaminates. Coatings 2022, 12, 404. [Google Scholar] [CrossRef]
- Oliver, W.C.; Pharr, G.M. Measurement of Hardness and Elastic Modulus by Instrumented Indentation: Advances in Understanding and Refinements to Methodology. J. Mater. Res. 2004, 19, 3–20. [Google Scholar] [CrossRef]
- Huang, Y.-C.; Chang, S.-Y.; Chang, C.-H. Effect of Residual Stresses on Mechanical Properties and Interface Adhesion Strength of SiN Thin Films. Thin Solid Films 2009, 517, 4857–4861. [Google Scholar] [CrossRef]
Oxide | Metal Precursor Pulse Time | Purge Pulse Time | Oxygen Source Pulse Time | Purge Pulse Time | Growth Rate [38] |
---|---|---|---|---|---|
Al2O3 | Al(CH3)3 at 22 ± 1 °C 2 s | N2 2 s | H2O at 22 ± 1 °C 2 s | N2 5 s | 0.11 nm/cycle |
Ta2O5 | Ta(OCH2CH3)5 at 95 ± 5 °C 2 s | N2 2 s | H2O at 22 ± 1 °C 2 s | N2 5 s | 0.07 nm/cycle |
Temperature | Sample | 001 | 1 11 1 |
---|---|---|---|
700 °C | Ta2O5/Si | 31 | 42 |
Ta2O5/Al2O3/Ta2O5/Si | 84 | 27 | |
800 °C | Ta2O5/Si | 33 | 40 |
Al2O3/Ta2O5/Si | 16 | 37 | |
Ta2O5/Al2O3/Si | 31 | 32 | |
Al2O3/Ta2O5/Al2O3/Si | 5 | 23 | |
Ta2O5/Al2O3/Ta2O5/Si | 21 | 18 | |
PDF 00-025-0922 | 85 | 75 |
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Piirsoo, H.-M.; Jõgiaas, T.; Kukli, K.; Tamm, A. Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates. Materials 2023, 16, 3207. https://doi.org/10.3390/ma16083207
Piirsoo H-M, Jõgiaas T, Kukli K, Tamm A. Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates. Materials. 2023; 16(8):3207. https://doi.org/10.3390/ma16083207
Chicago/Turabian StylePiirsoo, Helle-Mai, Taivo Jõgiaas, Kaupo Kukli, and Aile Tamm. 2023. "Influence of Annealing on Mechanical Behavior of Alumina-Tantala Nanolaminates" Materials 16, no. 8: 3207. https://doi.org/10.3390/ma16083207