Kim, S.J.; Mohan, J.; Kim, H.S.; Hwang, S.M.; Kim, N.; Jung, Y.C.; Sahota, A.; Kim, K.; Yu, H.-Y.; Cha, P.-R.;
et al. A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films. Materials 2020, 13, 2968.
https://doi.org/10.3390/ma13132968
AMA Style
Kim SJ, Mohan J, Kim HS, Hwang SM, Kim N, Jung YC, Sahota A, Kim K, Yu H-Y, Cha P-R,
et al. A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films. Materials. 2020; 13(13):2968.
https://doi.org/10.3390/ma13132968
Chicago/Turabian Style
Kim, Si Joon, Jaidah Mohan, Harrison Sejoon Kim, Su Min Hwang, Namhun Kim, Yong Chan Jung, Akshay Sahota, Kihyun Kim, Hyun-Yong Yu, Pil-Ryung Cha,
and et al. 2020. "A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films" Materials 13, no. 13: 2968.
https://doi.org/10.3390/ma13132968
APA Style
Kim, S. J., Mohan, J., Kim, H. S., Hwang, S. M., Kim, N., Jung, Y. C., Sahota, A., Kim, K., Yu, H.-Y., Cha, P.-R., Young, C. D., Choi, R., Ahn, J., & Kim, J.
(2020). A Comprehensive Study on the Effect of TiN Top and Bottom Electrodes on Atomic Layer Deposited Ferroelectric Hf0.5Zr0.5O2 Thin Films. Materials, 13(13), 2968.
https://doi.org/10.3390/ma13132968