Sign in to use this feature.

Years

Between: -

Subjects

remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline
remove_circle_outline

Journals

Article Types

Countries / Regions

Search Results (47)

Search Parameters:
Keywords = waveguide photodetector

Order results
Result details
Results per page
Select all
Export citation of selected articles as:
11 pages, 2565 KB  
Article
Germanium-on-Silicon Waveguide-Integrated Photodiode with Dual Optical Inputs for Datacenter Applications
by Itamar-Mano Priel, Shai Cohen, Liron Gantz and Yael Nemirovsky
Micromachines 2026, 17(3), 386; https://doi.org/10.3390/mi17030386 - 23 Mar 2026
Viewed by 465
Abstract
As the exponential growth in advanced compute workloads drives intra-datacenter interconnects to ever increasing bitrates, optical networking equipment has risen to the challenge by shifting from NRZ signaling to bandwidth efficient modulation methods such as PAM4. As these modulation schemes introduce an inherent [...] Read more.
As the exponential growth in advanced compute workloads drives intra-datacenter interconnects to ever increasing bitrates, optical networking equipment has risen to the challenge by shifting from NRZ signaling to bandwidth efficient modulation methods such as PAM4. As these modulation schemes introduce an inherent SNR penalty, maintaining low bit error rates (BER) forces optical links to operate at significantly higher optical powers. However, increasing the optical power leads to photodetectors reaching one of their fundamental bottlenecks caused by the space-charge effect, limiting their ability to provide a high-speed response under high-power illumination. This work presents the design, fabrication, and characterization of a waveguide-integrated photodiode with dual optical inputs (DIPD) designed to overcome this limitation. Specifically, we demonstrate that combining a dual-fed architecture with targeted cross-sectional geometric optimizations effectively distributes the photocurrent density to delay the onset of space-charge saturation. Experimental validation demonstrates a high responsivity of ≈0.91 [A/W] (for O-band wavelengths) and a large electro-optic bandwidth (EOBW) of ≈58 [GHz], all under high-power illumination and CMOS driving voltages. Full article
(This article belongs to the Section A:Physics)
Show Figures

Figure 1

13 pages, 3501 KB  
Article
AWG-Based Spectral Multiplexing for Unambiguous Range-Extended FMCW LiDAR
by Sangwon Park, Sang Min Park, Seongmun Jeong, Gyeongmin Kweon, Chang-Seok Kim and Hwidon Lee
Sensors 2026, 26(5), 1435; https://doi.org/10.3390/s26051435 - 25 Feb 2026
Viewed by 482
Abstract
Frequency-modulated continuous-wave (FMCW) light detection and ranging (LiDAR) based on coherent ranging is a technology capable of high-resolution distance measurement while remaining robust against ambient light interference. However, extending the measurable range remains challenging due to (i) the coherence length limitation of the [...] Read more.
Frequency-modulated continuous-wave (FMCW) light detection and ranging (LiDAR) based on coherent ranging is a technology capable of high-resolution distance measurement while remaining robust against ambient light interference. However, extending the measurable range remains challenging due to (i) the coherence length limitation of the laser and (ii) distance ambiguity caused by frequency ambiguity in coherent detection. To overcome these limitations, we propose an unambiguous range-extended FMCW LiDAR enabled by arrayed waveguide grating (AWG)-based spectral multiplexing. By spectrally demultiplexing the reference arm into four wavelength channels with sequentially designed optical path delays, multiple independent interference signals are obtained simultaneously without increasing the number of photodetectors or optical couplers. A channel-pair-based distance decoding algorithm is further introduced to resolve distance ambiguity by classifying detection outcomes across adjacent channels and selectively applying predefined operations. The proposed FMCW LiDAR system effectively extends the measurable range to approximately five times that of a conventional FMCW LiDAR. Experimental results demonstrate high measurement accuracy and successful reconstruction of three-dimensional distance maps, validating the system’s potential for extended-range FMCW LiDAR applications. Full article
(This article belongs to the Special Issue Progress in LiDAR Technologies and Applications)
Show Figures

Figure 1

7 pages, 3245 KB  
Article
Tapered Cladding Design for Monolithic Waveguide–Photodetector Coupling in Si-Based Integrated Photonics
by Alfredo A. Gonzalez-Fernandez, Jorge A. Vazquez-Hernandez, Felix Aguilar-Valdez and Neil Moffat
Nanomaterials 2025, 15(22), 1731; https://doi.org/10.3390/nano15221731 - 17 Nov 2025
Viewed by 834
Abstract
Silicon photonics offers a powerful route to leverage existing microelectronics infrastructure to enhance performance and enable new applications in data processing and sensing. Among the available material platforms, silicon nitride (Si3N4) provides significant advantages due to its wide optical [...] Read more.
Silicon photonics offers a powerful route to leverage existing microelectronics infrastructure to enhance performance and enable new applications in data processing and sensing. Among the available material platforms, silicon nitride (Si3N4) provides significant advantages due to its wide optical transmission window. A key challenge, however, remains the monolithic integration of passive nitride-based photonic components with active electronic devices directly on silicon wafers. In this work, we propose and demonstrate a tapered bottom-cladding design that enables efficient coupling of visible light from Si3N4/SiO2 core–cladding waveguides into planar p–n junction photodiodes fabricated on the silicon surface. Si3N4/SiO2 waveguides were fabricated using fully CMOS-compatible processes and materials. Controlled reactive ion etching (RIE) of SiO2 allowed the formation of vertically tapered claddings, and finite-difference time-domain (FDTD) simulations were carried out to analyze coupling efficiency across wavelengths from 509 nm to 740 nm. Simulations showed transmission efficiencies above 90% for taper angles below 30°, with near-total coupling at 10°. Experimental fabrication achieved angles as low as 8°. Responsivity simulations yielded values up to 311 mA W−1 for photodiodes without internal gain. These results demonstrate the feasibility of fabricating monolithic Si-based waveguide–photodetector systems using simple, CMOS-compatible methods, opening a scalable path for integrated photonic–electronic devices operating in the visible range. Full article
Show Figures

Figure 1

29 pages, 7280 KB  
Review
Recent Advanced Photodetectors Coupling Optical Structure
by Yangye Lin and Shuo Zhang
Photonics 2025, 12(11), 1096; https://doi.org/10.3390/photonics12111096 - 7 Nov 2025
Cited by 1 | Viewed by 4092
Abstract
Photodetectors are critical components in a wide range of applications, including military, communications, medical, and aerospace fields. With ongoing advancements in optoelectronics, the strategy of integrating multiple optical structures with photodetectors has led to substantial improvements in detection performance. This review summarizes recent [...] Read more.
Photodetectors are critical components in a wide range of applications, including military, communications, medical, and aerospace fields. With ongoing advancements in optoelectronics, the strategy of integrating multiple optical structures with photodetectors has led to substantial improvements in detection performance. This review summarizes recent research progress in optically coupled photodetectors, providing a systematic analysis of the operational mechanisms and performance characteristics of five key coupling configurations: optical waveguides, surface plasmon resonance structures, microcavities, gratings, and integrated metasurfaces. Furthermore, the main limitations of current coupling technologies and challenges facing the development of future coupled devices are discussed. Recent studies indicate that heterogeneous integration, multi-physical field coupling, and automated fabrication processes are paving the way for high-performance photodetectors with enhanced bandwidth, sensitivity, functional integration, and spectral control capabilities. Full article
(This article belongs to the Special Issue Organic Photodetectors, Displays, and Upconverters)
Show Figures

Figure 1

9 pages, 1739 KB  
Article
High-Responsivity Waveguide UTC Photodetector with 90 GHz Bandwidth for High-Speed Optical Communication
by Yu Zheng, Qin Han, Han Ye, Shuai Wang, Yimiao Chu, Liyan Geng and Junming An
Photonics 2025, 12(9), 891; https://doi.org/10.3390/photonics12090891 - 5 Sep 2025
Viewed by 1403
Abstract
A directly coupled waveguide uni-traveling carrier photodetector (UTC-PD) with high responsivity and broad bandwidth is demonstrated. The device’s epitaxial structure was carefully optimized via optical simulations to enhance quantum efficiency. Furthermore, the fabrication process was refined to introduce a vertically defined mushroom-shaped mesa [...] Read more.
A directly coupled waveguide uni-traveling carrier photodetector (UTC-PD) with high responsivity and broad bandwidth is demonstrated. The device’s epitaxial structure was carefully optimized via optical simulations to enhance quantum efficiency. Furthermore, the fabrication process was refined to introduce a vertically defined mushroom-shaped mesa structure, which effectively maintains high responsivity while facilitating further improvement in bandwidth performance. As a result, the fabricated device, without the use of an anti-reflection coating, simultaneously achieves a responsivity of 0.49 A/W and a 3 dB bandwidth of 90 GHz. Full article
(This article belongs to the Section Optical Communication and Network)
Show Figures

Figure 1

10 pages, 2570 KB  
Article
Demonstration of Monolithic Integration of InAs Quantum Dot Microdisk Light Emitters and Photodetectors Directly Grown on On-Axis Silicon (001)
by Shuaicheng Liu, Hao Liu, Jihong Ye, Hao Zhai, Weihong Xiong, Yisu Yang, Jun Wang, Qi Wang, Yongqing Huang and Xiaomin Ren
Micromachines 2025, 16(8), 897; https://doi.org/10.3390/mi16080897 - 31 Jul 2025
Cited by 3 | Viewed by 1482
Abstract
Silicon-based microcavity quantum dot lasers are attractive candidates for on-chip light sources in photonic integrated circuits due to their small size, low power consumption, and compatibility with silicon photonic platforms. However, integrating components like quantum dot lasers and photodetectors on a single chip [...] Read more.
Silicon-based microcavity quantum dot lasers are attractive candidates for on-chip light sources in photonic integrated circuits due to their small size, low power consumption, and compatibility with silicon photonic platforms. However, integrating components like quantum dot lasers and photodetectors on a single chip remains challenging due to material compatibility issues and mode field mismatch problems. In this work, we have demonstrated monolithic integration of an InAs quantum dot microdisk light emitter, waveguide, and photodetector on a silicon platform using a shared epitaxial structure. The photodetector successfully monitored variations in light emitter output power, experimentally proving the feasibility of this integrated scheme. This work represents a key step toward multifunctional integrated photonic systems. Future efforts will focus on enhancing the light emitter output power, improving waveguide efficiency, and scaling up the integration density for advanced applications in optical communication. Full article
(This article belongs to the Special Issue Silicon-Based Photonic Technology and Devices)
Show Figures

Figure 1

10 pages, 2636 KB  
Article
Low Temperature Characteristics of Ge-on-Si Waveguide Photodetectors: A Combined Simulation and Experimental Study
by Jingchuan Liu, Zhenyu Li, Xiaofei Liu, Wentao Yan, Xingyan Zhao, Shaonan Zheng, Yang Qiu, Qize Zhong, Yuan Dong and Ting Hu
Micromachines 2025, 16(5), 542; https://doi.org/10.3390/mi16050542 - 30 Apr 2025
Viewed by 1918
Abstract
Benefiting from the progress of the germanium (Ge) epitaxy process on silicon (Si) substrates, waveguide-integrated Ge-on-Si photodetectors (PDs) have demonstrated decent performances in short-wave infrared (SWIR) detection. By lowering the operating temperature, theses PDs can meet the stringent signal-to-noise requirements for high-sensitivity detection. [...] Read more.
Benefiting from the progress of the germanium (Ge) epitaxy process on silicon (Si) substrates, waveguide-integrated Ge-on-Si photodetectors (PDs) have demonstrated decent performances in short-wave infrared (SWIR) detection. By lowering the operating temperature, theses PDs can meet the stringent signal-to-noise requirements for high-sensitivity detection. We systematically investigated the dark current characteristics and optical response in the 1500–1600 nm wavelength range of the waveguide-integrated Ge-on-Si PDs operated at low temperatures (200 K to 300 K). Under a −3 V bias, the PD exhibits a room-temperature dark current of 4.62 nA and a responsivity of 0.87 A/W at 1550 nm. When the temperature was reduced to 200 K, the dark current decreased to 93.69 pA, and the responsivity dropped to 0.34 A/W. Using finite-difference time-domain (FDTD) and technology computer-aided design (TCAD) simulations, we extracted the absorption coefficients of epitaxial Ge on Si at low temperatures. At room temperature, the absorption coefficient at the wavelength of 1550 nm was approximately 1100 cm−1, while at 200 K, the absorption coefficient decreased to 248 cm−1. The outcomes of this work pave the way for the high-performance low-temperature Si photonic systems in the future. Full article
(This article belongs to the Special Issue Research Progress of Silicon-Based Photodetectors)
Show Figures

Figure 1

18 pages, 8684 KB  
Article
Harnessing Nanoplasmonics: Design Optimization for Enhanced Optoelectronic Performance in Nanocrystalline Silicon Devices
by Mohsen Mahmoudysepehr and Siva Sivoththaman
Micromachines 2025, 16(5), 540; https://doi.org/10.3390/mi16050540 - 30 Apr 2025
Cited by 1 | Viewed by 1100
Abstract
Nanoplasmonic structures have emerged as a promising approach to address light trapping limitations in thin-film optoelectronic devices. This study investigates the integration of metallic nanoparticle arrays onto nanocrystalline silicon (nc-Si:H) thin films to enhance optical absorption through plasmonic effects. Using finite-difference time-domain (FDTD) [...] Read more.
Nanoplasmonic structures have emerged as a promising approach to address light trapping limitations in thin-film optoelectronic devices. This study investigates the integration of metallic nanoparticle arrays onto nanocrystalline silicon (nc-Si:H) thin films to enhance optical absorption through plasmonic effects. Using finite-difference time-domain (FDTD) simulations, we systematically optimize key design parameters, including nanoparticle geometry, spacing, metal type (Ag and Al), dielectric spacer material, and absorber layer thickness. The results show that localized surface plasmon resonances (LSPRs) significantly amplify near-field intensities, improve forward scattering, and facilitate coupling into waveguide modes within the active layer. These effects lead to a measurable increase in integrated quantum efficiency, with absorption improvements reaching up to 30% compared to bare nc-Si:H films. The findings establish a reliable design framework for engineering nanoplasmonic architectures that can be applied to enhance performance in photovoltaic devices, photodetectors, and other optoelectronic systems. Full article
(This article belongs to the Special Issue Nanostructured Optoelectronic and Nanophotonic Devices)
Show Figures

Figure 1

14 pages, 2852 KB  
Article
1.3 Micron Photodetectors Enabled by the SPARK Effect
by Teresa Crisci, Luigi Moretti, Mariano Gioffrè, Babak Hashemi, Mohamed Mammeri, Francesco Giuseppe Della Corte and Maurizio Casalino
Micromachines 2025, 16(4), 440; https://doi.org/10.3390/mi16040440 - 8 Apr 2025
Viewed by 1125
Abstract
In this work, we present a graphene-based photodetector operating at a wavelength of 1310 nm. The device leverages the SPARK effect, which has previously been investigated only at 1550 nm. It features a hybrid waveguide structure comprising hydrogenated amorphous silicon, graphene, and crystalline [...] Read more.
In this work, we present a graphene-based photodetector operating at a wavelength of 1310 nm. The device leverages the SPARK effect, which has previously been investigated only at 1550 nm. It features a hybrid waveguide structure comprising hydrogenated amorphous silicon, graphene, and crystalline silicon. Upon optical illumination, defect states release charge carriers into the graphene layer, modulating the thermionic current across the graphene/crystalline silicon Schottky junction. The photodetector demonstrates a peak responsivity of 0.3 A/W at 1310 nm, corresponding to a noise-equivalent power of 0.4 pW/Hz1/2. The experimental results provide deeper insights into the SPARK effect by enabling the determination of the efficiency × lifetime product of carriers at 1310 nm and its comparison with values previously reported at 1550 nm. The wavelength dependence of this product is analyzed and discussed. Additionally, the response times of the device are measured and evaluated. The silicon-based fabrication approach employed is versatile and does not rely on sub-micron lithography techniques. Notably, reducing the incident optical power enhances the responsivity, making this photodetector highly suitable for power monitoring applications in integrated photonic circuits. Full article
(This article belongs to the Special Issue Advanced Photodetectors: Materials, Design and Applications)
Show Figures

Figure 1

12 pages, 2636 KB  
Article
MoTe2 Photodetector for Integrated Lithium Niobate Photonics
by Qiaonan Dong, Xinxing Sun, Lang Gao, Yong Zheng, Rongbo Wu and Ya Cheng
Nanomaterials 2025, 15(1), 72; https://doi.org/10.3390/nano15010072 - 5 Jan 2025
Cited by 11 | Viewed by 2767
Abstract
The integration of a photodetector that converts optical signals into electrical signals is essential for scalable integrated lithium niobate photonics. Two-dimensional materials provide a potential high-efficiency on-chip detection capability. Here, we demonstrate an efficient on-chip photodetector based on a few layers of MoTe [...] Read more.
The integration of a photodetector that converts optical signals into electrical signals is essential for scalable integrated lithium niobate photonics. Two-dimensional materials provide a potential high-efficiency on-chip detection capability. Here, we demonstrate an efficient on-chip photodetector based on a few layers of MoTe2 on a thin film lithium niobate waveguide and integrate it with a microresonator operating in an optical telecommunication band. The lithium-niobate-on-insulator waveguides and micro-ring resonator are fabricated using the femtosecond laser photolithography-assisted chemical–mechanical etching method. The lithium niobate waveguide-integrated MoTe2 presents an absorption coefficient of 72% and a transmission loss of 0.27 dB µm−1 at 1550 nm. The on-chip photodetector exhibits a responsivity of 1 mA W−1 at a bias voltage of 20 V, a low dark current of 1.6 nA, and a photo–dark current ratio of 108 W−1. Due to effective waveguide coupling and interaction with MoTe2, the generated photocurrent is approximately 160 times higher than that of free-space light irradiation. Furthermore, we demonstrate a wavelength-selective photonic device by integrating the photodetector and micro-ring resonator with a quality factor of 104 on the same chip, suggesting potential applications in the field of on-chip spectrometers and biosensors. Full article
(This article belongs to the Section Nanofabrication and Nanomanufacturing)
Show Figures

Figure 1

30 pages, 13607 KB  
Article
Grating Coupler Design for Low-Cost Fabrication in Amorphous Silicon Photonic Integrated Circuits
by Daniel Almeida, Paulo Lourenço, Alessandro Fantoni, João Costa and Manuela Vieira
Photonics 2024, 11(9), 783; https://doi.org/10.3390/photonics11090783 - 23 Aug 2024
Cited by 5 | Viewed by 6549
Abstract
Photonic circuits find applications in biomedicine, manufacturing, quantum computing and communications. Photonic waveguides are crucial components, typically having cross-section orders of magnitude inferior when compared with other photonic components (e.g., optical fibers, light sources and photodetectors). Several light-coupling methods exist, consisting of either [...] Read more.
Photonic circuits find applications in biomedicine, manufacturing, quantum computing and communications. Photonic waveguides are crucial components, typically having cross-section orders of magnitude inferior when compared with other photonic components (e.g., optical fibers, light sources and photodetectors). Several light-coupling methods exist, consisting of either on-plane (e.g., adiabatic and end-fire coupling) or off-plane methods (e.g., grating and vertical couplers). The grating coupler is a versatile light-transference technique which can be tested at wafer level, not requiring specific fiber terminations or additional optical components, like lenses, polarizers or prisms. This study focuses on fully-etched grating couplers without a bottom reflector, made from hydrogenated amorphous silicon (a-Si:H), deposited over a silica substrate. Different coupler designs were tested, and of these we highlight two: the superimposition of two lithographic masks with different periods and an offset between them to create a random distribution and a technique based on the quadratic refractive-index variation along the device’s length. Results were obtained by 2D-FDTD simulation. The designed grating couplers achieve coupling efficiencies for the TE-like mode over −8 dB (mask overlap) and −3 dB (quadratic variation), at a wavelength of 1550 nm. The coupling scheme considers a 220 nm a-Si:H waveguide and an SMF-28 optical fiber. Full article
(This article belongs to the Special Issue Progress in Integrated Photonics and Future Prospects)
Show Figures

Figure 1

10 pages, 12449 KB  
Article
The Impact of the Amorphous-to-Crystalline Transition on the Upconversion Luminescence in Er3+-Doped Ga2O3 Thin Films
by Yuanlin Liang, Haisheng Chen, Dianmeng Dong, Jiaxing Guo, Xiaona Du, Taiyu Bian, Fan Zhang, Zhenping Wu and Yang Zhang
Energies 2024, 17(6), 1397; https://doi.org/10.3390/en17061397 - 14 Mar 2024
Cited by 4 | Viewed by 2494
Abstract
Gallium oxide (Ga2O3) is an emerging wide bandgap semiconductor promising a wide range of important applications. However, mass production of high-quality crystalline Ga2O3 still suffers from limitations associated with poor reproducibility and low efficiency. Low-temperature-grown amorphous [...] Read more.
Gallium oxide (Ga2O3) is an emerging wide bandgap semiconductor promising a wide range of important applications. However, mass production of high-quality crystalline Ga2O3 still suffers from limitations associated with poor reproducibility and low efficiency. Low-temperature-grown amorphous Ga2O3 demonstrates comparable performance with its crystalline counterparts. Lanthanide Er3+-doped Ga2O3 (Ga2O3: Er) possesses great potential for developing light-emitting devices, photodetectors, solid-state lasers, and optical waveguides. The host circumstance can exert a crystal field around the lanthanide dopants and strongly influence their photoluminescence properties. Here, we present a systematical study of the impact of amorphous-to-crystalline transition on the upconversion photoluminescence in Ga2O3: Er thin films. Through controlling the growth temperature of Ga2O3: Er films, the upconversion luminescence of crystalline Ga2O3: Er thin film is strongly enhanced over 100 times that of the amorphous Ga2O3: Er thin film. Moreover, the variation of photoluminescence reflects the amorphous-to-crystalline transformation of the Ga2O3: Er thin films. These results will aid further designs of favorable optoelectronic devices integrated with lanthanide-doped Ga2O3 thin films. Full article
(This article belongs to the Section F3: Power Electronics)
Show Figures

Figure 1

23 pages, 6446 KB  
Review
On-Chip Lasers for Silicon Photonics
by Jiangwen Zhang, Aadithya G. Shankar and Xihua Wang
Photonics 2024, 11(3), 212; https://doi.org/10.3390/photonics11030212 - 27 Feb 2024
Cited by 9 | Viewed by 12020
Abstract
With the growing trend in the information industry, silicon photonics technology has been explored in both academia and industry and utilized for high-bandwidth data transmission. Thanks to the benefits of silicon, such as high refractive index contrast with its oxides, low loss, substantial [...] Read more.
With the growing trend in the information industry, silicon photonics technology has been explored in both academia and industry and utilized for high-bandwidth data transmission. Thanks to the benefits of silicon, such as high refractive index contrast with its oxides, low loss, substantial thermal–optical effect, and compatibility with CMOS, a range of passive and active photonic devices have been demonstrated, including waveguides, modulators, photodetectors, and lasers. The most challenging aspect remains to be the on-chip laser source, whose performance is constrained by the indirect bandgap of silicon. This review paper highlights the advancements made in the field of integrated laser sources on the silicon photonics platform. These on-chip lasers are classified according to their gain media, including V semiconductors, III–V semiconductors, two-dimensional materials, and colloidal quantum dots. The methods of integrating these lasers onto silicon are also detailed in this review. Full article
(This article belongs to the Special Issue Novel Advances in Integrated Optics)
Show Figures

Figure 1

11 pages, 6146 KB  
Communication
Waveguide-Integrated Ge/Si Avalanche Photodiode with Vertical Multiplication Region for 1310 nm Detection
by Linkai Yi, Daoqun Liu, Daimo Li, Peng Zhang, Bo Tang, Bin Li, Wenwu Wang, Yan Yang and Zhihua Li
Photonics 2023, 10(7), 750; https://doi.org/10.3390/photonics10070750 - 29 Jun 2023
Cited by 10 | Viewed by 4324
Abstract
Ge/Si separate absorption, charge, and multiplication avalanche photodiodes (SACM APDs) coupled with waveguides have shown significant potential as high-sensitivity, low-noise, and high-speed photodetectors for optical communications. In this study, we present a waveguide-integrated Ge/Si SACM APD fabricated on an eight-inch silicon photonics platform. [...] Read more.
Ge/Si separate absorption, charge, and multiplication avalanche photodiodes (SACM APDs) coupled with waveguides have shown significant potential as high-sensitivity, low-noise, and high-speed photodetectors for optical communications. In this study, we present a waveguide-integrated Ge/Si SACM APD fabricated on an eight-inch silicon photonics platform. The device exhibits a primary responsivity of 0.68 A/W at the unit gain voltage of 6 V for the O-band (1310 nm) wavelength, with a 10 μm-long and 1 μm-wide Ge layer. Additionally, the device demonstrates a 3 dB bandwidth of 25.7 GHz, with an input optical power of −16.8 dBm. The largest gain bandwidth product (GBP) is 247 GHz at a gain of 9.64 and a bias voltage of 15.7 V. The eye diagram is open at the bias voltage of 16 V, with a capacity to receive 28 Gbps of data. This APD shows potential for application in high-speed data transmission systems. Full article
Show Figures

Figure 1

12 pages, 8178 KB  
Communication
Research on Germanium Photodetector with Multi-Mode Waveguide Input
by Longsheng Wu, Dongsheng Lv, Nengyang Zhao, Ruxue Wang and Aimin Wu
Photonics 2023, 10(4), 455; https://doi.org/10.3390/photonics10040455 - 14 Apr 2023
Cited by 4 | Viewed by 5701
Abstract
In this work, a vertical N-I-P germanium (Ge) photodetector (PD) with a multi-mode waveguide input is presented. The fabricated devices exhibit a low dark current of 10 nA at bias of −1 V, and a high responsivity of exceeding 0.75 A/W over the [...] Read more.
In this work, a vertical N-I-P germanium (Ge) photodetector (PD) with a multi-mode waveguide input is presented. The fabricated devices exhibit a low dark current of 10 nA at bias of −1 V, and a high responsivity of exceeding 0.75 A/W over the wavelength range from 1270 to 1350 nm. High-frequency characteristics measurements show that the photodetector has a 3 dB opto-electrical (OE) bandwidth of 23 GHz under −3 V bias, which can be further improved by optimization of the photodetector configuration. A 50 Gb/s clear eye diagram with a non-return-to-zero (NRZ) modulation format is demonstrated. By using a single-mode excitation source, which is used to simulate light coming from the wavelength division multiplexing (WDM) devices, and sweeping its position, it is shown that the multi-mode input photodetector can be utilized in a WDM receiver to achieve both high responsivity and a flat-top passband. Full article
(This article belongs to the Section Optical Communication and Network)
Show Figures

Figure 1

Back to TopTop