Photosensitive glasses for radiation-induced 3D microstructuring, due to their optical transparency and thermal, mechanical, and chemical resistance, enable the use of new strategies for numerous microscale applications, ranging from optics to biomed...
Silicon carbide (SiC) is widely utilized in semiconductors, microelectronics, optoelectronics, and other advanced technologies. However, its inherent characteristics, such as its hardness, brittleness, and high chemical stability, limit the processin...
Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close-...
As semiconductor chips have been integrated to enhance their performance, a low-dielectric-constant material, SiCOH, with a relative dielectric constant k ≤ 3.5 has been widely used as an intermetal dielectric (IMD) material in multilevel intercon...
Along with the soaring demands for all-solid-state thin-film lithium-ion batteries, the problem of their energy density rise becomes very acute. The solution to this problem can be found in development of 3D batteries. The present work deals with the...
The emergence of multidrug-resistant bacteria represents a growing threat to public health, and it calls for the development of alternative antibacterial approaches not based on antibiotics. Here, we propose vertically aligned carbon nanotubes (VA-CN...
This article presents the results of a computer simulation of whispering gallery modes in the structure of a silicon disk resonator with a wedge-shaped profile made on a silicon-on-isolator base (SOI). The rationale for the choice of silicon as a mat...
Mixers based on superconductor–insulator–superconductor (SIS) tunnel junctions are the best input devices at frequencies from 0.1 to 1.2 THz. This is explained by both the extremely high nonlinearity of such elements and their extremely l...
This work summarizes the results of our previous studies related to investigations of reactive ion etching kinetics and mechanisms for widely used silicon-based materials (SiC, SiO2, and SixNy) as well as for the silicon itself in multi-component flu...
Basswood samples were exposed to oxygen glow-discharge plasmas for 30 min, and etching of radial and tangential longitudinal surfaces was measured. It was hypothesized that there would be a positive correlation between etching and plasma energy, and...
Traditional mechanical processing of zirconium leads to an unfavorable transformation, from a metastable tetragonal phase to a monoclinic phase (t→m), which weakens the structure of the material and subsequently leads to damage to the prosthetic...
Silicon nitride (Si3N4) etching using CF4/O2 mixed with N2 has become very popular in 3D NAND flash structures. However, studies on Si3N4 dry etching based on optical emission spectroscopy (OES) are lacking; in particular, no study has reported the u...
This study explores the impact of varying discharge gas compositions on the etching performance of silicon carbide (SiC) in a heptafluoroisopropyl methyl ether (HFE-347mmy)/O2/Ar plasma. SiC is increasingly favored for high-temperature and high-power...
This study investigates the suitability of Piezoelectric Direct Discharge Plasma as a tool for wetting behaviour modification of PEEK and dentin, and compares the results of this method with low-pressure plasma treatment and phosphoric acid etching....
In order to further understand the excitation process of inductively coupled plasma (ICP) and improve the etching efficiency of silicon carbide (SiC), the effect of temperature and atmospheric pressure on plasma etching of silicon carbide was investi...
Parylene C is a widely used polymer material in microfabrication because of its excellent properties such as chemical inertness, biocompatibility and flexibility. It has been commonly adopted as a structural material for a variety of microfluidics an...
In this study, the technology for producing ridge waveguides with a minimal roughness of the sidewalls and material surface in a near-waveguide region was developed with the purpose of fabricating miniature photonic integrated circuits on a LiNbO3 su...
Continuous diamond films with low dislocation density were obtained by two-step epitaxial lateral overgrowth (ELO). Grooves were fabricated by inductively coupled plasma etching. Mo/Pd stripes sputtered in the grooves were used to inhibit the propaga...
The internal coatings of chambers exposed to plasma over a long period of time are subject to chemical and physical damage. Contamination particles that are produced by plasma damage to coatings are a major contribution to poor process reliability. I...
Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant pola...
Vertically aligned 3D gallium nitride (GaN) nanowire arrays with sub-50 nm feature sizes were fabricated using a nanosphere lift-off lithography (NSLL) technique combined with hybrid top-down etching steps (i.e., inductively coupled plasma dry reacti...
Previously, we found that modification of the membrane surface from polyvinyltrimethylsilane (PVTMS) by treatment with low-temperature plasma induced by low pressure DC discharge leads to a significant increase in gas separation characteristics. To u...
The exceptional material properties of Lithium Niobate (LiNbO3) make it an excellent material platform for a wide range of RF, MEMS, phononic and photonic applications; however, nano-micro scale device concepts require high fidelity processing of LN...
In this work, we discuss the effects of component ratios on plasma characteristics, chemistry of active species, and silicon etching kinetics in CF4 + O2, CHF3 + O2, and C4F8 + O2 gas mixtures. It was shown that the addition of O2 changes electrons-...
High-voltage direct-current composite insulators are faced with various challenges during operation, such as creeping discharge, umbrella skirt damage, abnormal heating and insulator breakage. Among them, the aging of the interface between the core r...
Silica glass is frequently used as a device material for micro/nano fluidic devices due to its excellent properties, such as transparency and chemical resistance. Wet etching by hydrofluoric acid and dry etching by neutral loop discharge (NLD) plasma...
Taking advantage of good hermeticity, tiny parasitic capacitance, batch mode fabrication, and compatibility with multiple bonding techniques, the glass-silicon composite substrate manufactured by the glass reflow process has great potential to achiev...
In this study, a boron-doped diamond nanowire array (BDD-NWA)-based electrode is prepared by using a microwave plasma chemical vapor deposition system and treated with inductively coupled plasma reactive ion etching. The BDD-NWA electrode is used for...
The increasing demand for precision optical components invokes the requirement of advanced fabrication techniques with high efficiency. Atmospheric pressure plasma processing (APPP), based on chemical etching, has a high material removal rate and a G...
Silicon nitride (SiNx) thin films using 1,3-di-isopropylamino-2,4-dimethylcyclosilazane (CSN-2) and N2 plasma were investigated. The growth rate of SiNx thin films was saturated in the range of 200–500 °C, yielding approximately 0.38 Å...
The formation of atomically flat Si(111)–H surfaces was critical for molecular electronics, nanoscale device fabrication, and surface chemistry studies. We systematically investigated how initial oxide composition and dissolved oxygen affected...
Since black silicon was discovered by coincidence, the special material was explored for many amazing material characteristics in optical, surface topography, and so on. Because of the material property, black silicon is applied in many spheres of a...
This research work deals with the comparative study of C6F12O + Ar and CF4 + Ar gas chemistries in respect to Si and SiO2 reactive-ion etching processes in a low power regime. Despite uncertain applicability of C6F12O as the fluorine-containing etcha...
Plasma treatment of wood surfaces has shown significant effects, but different excitation methods used for different species of wood generally result in varied characteristics of wood surfaces. Secondly, plasma modification greatly enhances the absor...
As a new trend in plasma surface engineering, plasma conditions that allow more-defined chemical reactions at the surface are being increasingly investigated. This is achieved by avoiding high energy deposition via ion bombardment during direct plasm...
The aim of the research was to find a zirconia treatment method that would reduce or minimize the transformation from the tetragonal phase to the monoclinic phase. Background: Yttria-stabilized zirconia is increasingly chosen for the base of permanen...
The micro- and nanostructures, chemical composition, and wettability of titanium surfaces are essential for dental implants’ osseointegration. Combining hydrophilicity and nanostructure has been shown to improve the cell response and to shorten...
This study developed a human-friendly energy-efficient superhydrophobic polypropylene (PP) fabric by oxygen plasma etching and short-term thermal aging without additional chemicals. The effect of the microroughness on the superhydrophobicity was exam...
In this article, we focus on the development of a multiscale modeling and recurrent neural network (RNN) based optimization framework of a plasma etch process on a three-dimensional substrate with uniform thickness using the inductive coupled plasma...
Lithium niobate is an excellent optoelectronic and nonlinear material, which plays an important role in integrated optics. However, lithium niobate is difficult to etch due to its very stable chemical nature, and the microstructure of lithium niobate...
A duplex coating system, consisting of a laser-cladded Fe-Cr-based interlayer and a silicon-doped diamond-like carbon (Si-DLC) top layer, was deposited on medium carbon steel substrate using laser cladding (LC) followed by plasma-enhanced chemical va...
The objective of this study is the investigation of dielectric barrier discharges (DBDs) with the solid plates and the flexible polymer films. A high capacitance with a high dielectric constant and a small thickness is responsible for the discharge o...
The formation of gallium nitride (GaN) semi-polar and non-polar nanostructures is of importance for improving light extraction/absorption of optoelectronic devices, creating optical resonant cavities or reducing the defect density. However, very limi...
Yttrium oxyfluoride (YOF) protective materials were fabricated on sputter-deposited yttrium oxide (Y2O3) by high-density (sulfur fluoride) SF6 plasma irradiation. The structures, compositions, and fluorocarbon-plasma etching behaviors of these films...
Boron as thin film material is of relevance for use in modern micro- and nano-fabrication technology. In this research boron thin films are realized by a number of physical and chemical deposition methods, including magnetron sputtering, electron-bea...
Chemical removal of materials from the surface is a fundamental step in micro- and nano-fabrication processes. In conventional plasma etching, etchant molecules are non-directional and perform a uniform etching over the surface. However, using a high...
This article discusses a method for forming black silicon using plasma etching at a sample temperature range from −20 °C to +20 °C in a mixture of oxygen and sulfur hexafluoride. The surface morphology of the resulting structures, the a...
The application of a carbon nanowall (CNW) via transfer is very demanding due to the unusual structure of vertically grown wall-shaped that easily collapses. In addition, direct growth on a device cannot obtain a precision-patterned shape because of...
The intricate nanostructured surface of black silicon (BSi) has advanced photodetector technology by enhancing light absorption. Herein, we delve into the latest advancements in BSi surface modification techniques, specifically focusing on their prof...
Disinfectant-impregnated wipes are broadly used in hospitals, as an important approach for infection prevention and control. But their ageing performance has rarely been studied. Untreated and Dielectric Barrier Discharge (DBD) plasma pre-treated wip...
of 4