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41 pages, 11320 KiB  
Review
Electrochemical Biosensors Driving Model Transformation for Food Testing
by Xinxin Wu, Zhecong Yuan, Shujie Gao, Xinai Zhang, Hany S. El-Mesery, Wenjie Lu, Xiaoli Dai and Rongjin Xu
Foods 2025, 14(15), 2669; https://doi.org/10.3390/foods14152669 - 29 Jul 2025
Viewed by 266
Abstract
Electrochemical biosensors are revolutionizing food testing by addressing critical limitations of conventional strategies that suffer from cost, complexity, and field-deployment challenges. Emerging fluorescence and Raman techniques, while promising, face intrinsic drawbacks like photobleaching and matrix interference in opaque or heterogeneous samples. In contrast, [...] Read more.
Electrochemical biosensors are revolutionizing food testing by addressing critical limitations of conventional strategies that suffer from cost, complexity, and field-deployment challenges. Emerging fluorescence and Raman techniques, while promising, face intrinsic drawbacks like photobleaching and matrix interference in opaque or heterogeneous samples. In contrast, electrochemical biosensors leverage electrical signals to bypass optical constraints, enabling rapid, cost-effective, and pretreatment-free analysis of turbid food matrices. This review highlights their operational mechanisms, emphasizing nano-enhanced signal amplification (e.g., Au nanoparticles and graphene) and biorecognition elements (antibodies, aptamers, and molecularly imprinted polymers) for ultrasensitive assay of contaminants, additives, and adulterants. By integrating portability, scalability, and real-time capabilities, electrochemical biosensors align with global food safety regulations and sustainability goals. Challenges in standardization, multiplexed analysis, and long-term stability are discussed, alongside future directions toward AI-driven analytics, biodegradable sensors, and blockchain-enabled traceability, ultimately fostering precision-driven, next-generation food safety and quality testing. Full article
(This article belongs to the Section Food Analytical Methods)
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12 pages, 4156 KiB  
Article
Harnessing Nanoporous Hexagonal Structures to Control the Coffee Ring Effect and Enhance Particle Patterning
by Yu Ju Han, Myung Seo Kim, Seong Min Yoon, Seo Na Yoon, Woo Young Kim, Seok Kim and Young Tae Cho
Molecules 2025, 30(15), 3146; https://doi.org/10.3390/molecules30153146 - 27 Jul 2025
Viewed by 263
Abstract
The coffee-ring effect, while harnessed in diverse fields such as biosensing and printing, poses challenges for achieving uniform particle deposition. Controlling this phenomenon is thus essential for precision patterning. This study proposes a novel method to regulate coffee-ring formation by tuning surface wettability [...] Read more.
The coffee-ring effect, while harnessed in diverse fields such as biosensing and printing, poses challenges for achieving uniform particle deposition. Controlling this phenomenon is thus essential for precision patterning. This study proposes a novel method to regulate coffee-ring formation by tuning surface wettability via integrated nanoporous and hexagonal microstructures. Four distinct surface types were fabricated using UV nanoimprint lithography: planar, porous planar, hexagonal wall, and porous hexagonal wall. The evaporation behavior of colloidal droplets and subsequent particle aggregation were analyzed through contact angle measurements and confocal microscopy. Results demonstrated that nanoscale porosity significantly increased surface wettability and accelerated evaporation, while the hexagonal pattern enhanced droplet stability and suppressed contact line movement. The porous hexagonal surface, in particular, enabled the formation of connected dual-ring patterns with higher particle accumulation near the contact edge. This synergistic design facilitated both stable evaporation and improved localization of particles. The findings provide a quantitative basis for applying patterned porous surfaces in evaporation-driven platforms, with implications for enhanced sensitivity and reproducibility in surface-enhanced Raman scattering (SERS) and other biosensing applications. Full article
(This article belongs to the Special Issue Novel Porous Materials for Environmental Applications)
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26 pages, 3625 KiB  
Article
Deep-CNN-Based Layout-to-SEM Image Reconstruction with Conformal Uncertainty Calibration for Nanoimprint Lithography in Semiconductor Manufacturing
by Jean Chien and Eric Lee
Electronics 2025, 14(15), 2973; https://doi.org/10.3390/electronics14152973 - 25 Jul 2025
Viewed by 252
Abstract
Nanoimprint lithography (NIL) has emerged as a promising sub-10 nm patterning at low cost; yet, robust process control remains difficult because of time-consuming physics-based simulators and labeled SEM data scarcity. We propose a data-efficient, two-stage deep-learning framework here that directly reconstructs post-imprint SEM [...] Read more.
Nanoimprint lithography (NIL) has emerged as a promising sub-10 nm patterning at low cost; yet, robust process control remains difficult because of time-consuming physics-based simulators and labeled SEM data scarcity. We propose a data-efficient, two-stage deep-learning framework here that directly reconstructs post-imprint SEM images from binary design layouts and delivers calibrated pixel-by-pixel uncertainty simultaneously. First, a shallow U-Net is trained on conformalized quantile regression (CQR) to output 90% prediction intervals with statistically guaranteed coverage. Moreover, per-level errors on a small calibration dataset are designed to drive an outlier-weighted and encoder-frozen transfer fine-tuning phase that refines only the decoder, with its capacity explicitly focused on regions of spatial uncertainty. On independent test layouts, our proposed fine-tuned model significantly reduces the mean absolute error (MAE) from 0.0365 to 0.0255 and raises the coverage from 0.904 to 0.926, while cutting the labeled data and GPU time by 80% and 72%, respectively. The resultant uncertainty maps highlight spatial regions associated with error hotspots and support defect-aware optical proximity correction (OPC) with fewer guard-band iterations. Extending the current perspective beyond OPC, the innovatively model-agnostic and modular design of the pipeline here allows flexible integration into other critical stages of the semiconductor manufacturing workflow, such as imprinting, etching, and inspection. In these stages, such predictions are critical for achieving higher precision, efficiency, and overall process robustness in semiconductor manufacturing, which is the ultimate motivation of this study. Full article
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63 pages, 4971 KiB  
Review
Electrochemical Nanosensors Applied to the Assay of Some Food Components—A Review
by Aurelia Magdalena Pisoschi, Florin Iordache, Loredana Stanca, Petronela Mihaela Rosu, Nicoleta Ciocirlie, Ovidiu Ionut Geicu, Liviu Bilteanu and Andreea Iren Serban
Chemosensors 2025, 13(8), 272; https://doi.org/10.3390/chemosensors13080272 - 23 Jul 2025
Viewed by 531
Abstract
Nanomaterials’ special features enable their extensive application in chemical and biochemical nanosensors for food assays; food packaging; environmental, medicinal, and pharmaceutical applications; and photoelectronics. The analytical strategies based on novel nanomaterials have proved their pivotal role and increasing interest in the assay of [...] Read more.
Nanomaterials’ special features enable their extensive application in chemical and biochemical nanosensors for food assays; food packaging; environmental, medicinal, and pharmaceutical applications; and photoelectronics. The analytical strategies based on novel nanomaterials have proved their pivotal role and increasing interest in the assay of key food components. The choice of transducer is pivotal for promoting the performance of electrochemical sensors. Electrochemical nano-transducers provide a large active surface area, enabling improved sensitivity, specificity, fast assay, precision, accuracy, and reproducibility, over the analytical range of interest, when compared to traditional sensors. Synthetic routes encompass physical techniques in general based on top–down approaches, chemical methods mainly relying on bottom–up approaches, or green technologies. Hybrid techniques such as electrochemical pathways or photochemical reduction are also applied. Electrochemical nanocomposite sensors relying on conducting polymers are amenable to performance improvement, achieved by integrating redox mediators, conductive hydrogels, and molecular imprinting polymers. Carbon-based or metal-based nanoparticles are used in combination with ionic liquids, enhancing conductivity and electron transfer. The composites may be prepared using a plethora of combinations of carbon-based, metal-based, or organic-based nanomaterials, promoting a high electrocatalytic response, and can accommodate biorecognition elements for increased specificity. Nanomaterials can function as pivotal components in electrochemical (bio)sensors applied to food assays, aiming at the analysis of bioactives, nutrients, food additives, and contaminants. Given the broad range of transducer types, detection modes, and targeted analytes, it is important to discuss the analytical performance and applicability of such nanosensors. Full article
(This article belongs to the Special Issue Electrochemical Sensor for Food Analysis)
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38 pages, 5046 KiB  
Review
Photonics on a Budget: Low-Cost Polymer Sensors for a Smarter World
by Muhammad A. Butt
Micromachines 2025, 16(7), 813; https://doi.org/10.3390/mi16070813 - 15 Jul 2025
Viewed by 539
Abstract
Polymer-based photonic sensors are emerging as cost-effective, scalable alternatives to conventional silicon and glass photonic platforms, offering unique advantages in flexibility, functionality, and manufacturability. This review provides a comprehensive assessment of recent advances in polymer photonic sensing technologies, focusing on material systems, fabrication [...] Read more.
Polymer-based photonic sensors are emerging as cost-effective, scalable alternatives to conventional silicon and glass photonic platforms, offering unique advantages in flexibility, functionality, and manufacturability. This review provides a comprehensive assessment of recent advances in polymer photonic sensing technologies, focusing on material systems, fabrication techniques, device architectures, and application domains. Key polymer materials, including PMMA, SU-8, polyimides, COC, and PDMS, are evaluated for their optical properties, processability, and suitability for integration into sensing platforms. High-throughput fabrication methods such as nanoimprint lithography, soft lithography, roll-to-roll processing, and additive manufacturing are examined for their role in enabling large-area, low-cost device production. Various photonic structures, including planar waveguides, Bragg gratings, photonic crystal slabs, microresonators, and interferometric configurations, are discussed concerning their sensing mechanisms and performance metrics. Practical applications are highlighted in environmental monitoring, biomedical diagnostics, and structural health monitoring. Challenges such as environmental stability, integration with electronic systems, and reproducibility in mass production are critically analyzed. This review also explores future opportunities in hybrid material systems, printable photonics, and wearable sensor arrays. Collectively, these developments position polymer photonic sensors as promising platforms for widespread deployment in smart, connected sensing environments. Full article
(This article belongs to the Section A:Physics)
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13 pages, 3561 KiB  
Article
Preparing Surface-Functionalized Polymer Films with Hierarchically Ordered Structure by a Combination of Nanoimprinting and Controlled Graft Polymerization
by Masahiko Minoda, Daichi Shimizu, Tatsuya Nohara and Jin Motoyanagi
Surfaces 2025, 8(3), 48; https://doi.org/10.3390/surfaces8030048 - 11 Jul 2025
Viewed by 274
Abstract
It is widely recognized that fine surface structures found in nature contribute to surface functionality, and studies on the design of functional materials based on biomimetics have been actively conducted. In this study, polymer thin films with hierarchically ordered surface structure were prepared [...] Read more.
It is widely recognized that fine surface structures found in nature contribute to surface functionality, and studies on the design of functional materials based on biomimetics have been actively conducted. In this study, polymer thin films with hierarchically ordered surface structure were prepared by combining both nanoimprinting using anodically oxidized porous alumina (AAO) as a template and surface-initiated atom transfer radical polymerization (SI-ATRP). To prepare such polymer films, we designed a new copolymer (poly{[2-(4-methyl-2-oxo-2H-chromen-7-yloxy)ethyl methacrylate]-co-[2-(2-bromo-2-methylpropionyloxy)ethyl methacrylate]}; poly(MCMA-co-HEMABr)) with coumarin moieties and α-haloester moieties in the pendants. The MCMA repeating units function to fix the pillar structure by photodimerization, and the HEMABr ones act as the polymerization initiation sites for SI-ATRP on the pillar surfaces. Surface structures consisting of vertically oriented multiple pillars were fabricated on the spin-coated poly(MCMA-co-HEMABr) thin films by nanoimprinting using an AAO template. Then, the coumarin moieties inside each pillar were crosslinked by UV light irradiation to fix the pillar structure. SEM observation confirmed that the internally crosslinked pillar structures were maintained even when immersed in organic solvents such as 1,2-dichloroethane and anisole, which are employed as solvents under SI-ATRP conditions. Finally, poly(2,2,2-trifluoroethyl methacrylate) and poly(N-isopropylacrylamide) chains were grafted onto the thin film by SI-ATRP, respectively, to prepare the hierarchically ordered surface structure. Furthermore, in this study, the surface properties as well as the thermoresponsive hydrophilic/hydrophobic switching of the obtained polymer films were investigated. The surface morphology and chemistry of the films with and without pillar structures were compared, especially the interfacial properties expressed as wettability. Grafting poly(TFEMA) increased the static contact angle for both flat and pillar films, and the con-tact angle of the pillar film surface increased from 104° for the flat film sample to 112°, suggesting the contribution of the pillar structure. Meanwhile, the pillar film surface grafted with poly(NIPAM) brought about a significant change in wettability when changing the temperature between 22 °C and 38 °C. Full article
(This article belongs to the Special Issue Surface Science: Polymer Thin Films, Coatings and Adhesives)
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18 pages, 4103 KiB  
Article
Dual-Emitting Molecularly Imprinted Nanopolymers for the Detection of CA19-9
by Eduarda Rodrigues, Ana Xu, Rafael C. Castro, David S. M. Ribeiro, João L. M. Santos and Ana Margarida L. Piloto
Biomedicines 2025, 13(7), 1629; https://doi.org/10.3390/biomedicines13071629 - 3 Jul 2025
Viewed by 430
Abstract
Background/Objectives: Carbohydrate antigen 19-9 (CA19-9) is a clinically established biomarker primarily used for monitoring disease progression and recurrence in pancreatic and gastrointestinal cancers. Accurate and continuous quantification of CA19-9 in patient samples is critical for effective clinical management. This study aimed to develop [...] Read more.
Background/Objectives: Carbohydrate antigen 19-9 (CA19-9) is a clinically established biomarker primarily used for monitoring disease progression and recurrence in pancreatic and gastrointestinal cancers. Accurate and continuous quantification of CA19-9 in patient samples is critical for effective clinical management. This study aimed to develop dual-emitting molecularly imprinted nanopolymers (dual@nanoMIPs) for ratiometric and reliable detection of CA19-9 in serum. Methods: Dual-emitting nanoMIPs were synthesized via a one-step molecular imprinting process, incorporating both blue-emitting carbon dots (b-CDs) as internal reference fluorophores and yellow-emitting quantum dots (y-QDs) as responsive probes. The CA19-9 template was embedded into the polymer matrix to create specific recognition sites. Fluorescence measurements were carried out under 365 nm excitation in 1% human serum diluted in phosphate-buffered saline (PBS). Results: The dual@nanoMIPs exhibited a ratiometric fluorescence response upon CA19-9 binding, characterized by the emission quenching of the y-QDs at 575 nm, while the b-CDs emission remained stable at 467 nm. The fluorescence shift observed in the RGB coordinates from yellow to green in the concentration range of CA19-9 tested, improved quantification accuracy by compensating for matrix effects in serum. A linear detection range was achieved from 4.98 × 10−3 to 8.39 × 102 U mL−1 in serum samples, with high specificity and reproducibility. Conclusions: The dual@nanoMIPs developed in this work enable a stable, sensitive, and specific detection of CA19-9 in minimally processed serum, offering a promising tool for longitudinal monitoring of cancer patients. Its ratiometric fluorescence design enhances reliability, supporting clinical decision-making in the follow-up of pancreatic cancer. Full article
(This article belongs to the Special Issue Application of Biomedical Materials in Cancer Therapy)
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14 pages, 9430 KiB  
Article
Strain-Driven Dewetting and Interdiffusion in SiGe Thin Films on SOI for CMOS-Compatible Nanostructures
by Sonia Freddi, Michele Gherardi, Andrea Chiappini, Adam Arette-Hourquet, Isabelle Berbezier, Alexey Fedorov, Daniel Chrastina and Monica Bollani
Nanomaterials 2025, 15(13), 965; https://doi.org/10.3390/nano15130965 - 21 Jun 2025
Viewed by 417
Abstract
This study provides new insight into the mechanisms governing solid state dewetting (SSD) in SiGe alloys and underscores the potential of this bottom-up technique for fabricating self-organized defect-free nanostructures for CMOS-compatible photonic and nanoimprint applications. In particular, we investigate the SSD of Si [...] Read more.
This study provides new insight into the mechanisms governing solid state dewetting (SSD) in SiGe alloys and underscores the potential of this bottom-up technique for fabricating self-organized defect-free nanostructures for CMOS-compatible photonic and nanoimprint applications. In particular, we investigate the SSD of Si1−xGex thin films grown by molecular beam epitaxy on silicon-on-insulator (SOI) substrates, focusing on and clarifying the interplay of dewetting dynamics, strain elastic relaxation, and SiGe/SOI interdiffusion. Samples were annealed at 820 °C, and their morphological and compositional evolution was tracked using atomic force microscopy (AFM), scanning electron microscopy (SEM), energy-dispersive X-ray spectroscopy (EDX), X-ray diffraction (XRD), and Raman spectroscopy, considering different annealing time steps. A sequential process typical of the SiGe alloy has been identified, involving void nucleation, short finger formation, and ruptures of the fingers to form nanoislands. XRD and Raman data reveal strain relaxation and significant Si-Ge interdiffusion over time, with the Ge content decreasing from 29% to 20% due to mixing with the underlying SOI layer. EDX mapping confirms a Ge concentration gradient within the islands, with higher Ge content near the top. Full article
(This article belongs to the Special Issue Controlled Growth and Properties of Semiconductor Nanomaterials)
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19 pages, 6401 KiB  
Article
Demonstration of Directly Nanoimprinted Silica–Titania Large-Size Vertical Grating Couplers for Multichannel Photonic Sensor Development
by Andrzej Kaźmierczak, Cuma Tyszkiewicz, Magdalena Zięba, Mateusz Słowikowski, Krystian Pavłov, Maciej Filipiak, Jarosław Suszek, Filip Włodarczyk, Maciej Sypek, Paweł Kielan, Jerzy Kalwas, Ryszard Piramidowicz and Paweł Karasiński
Materials 2025, 18(12), 2771; https://doi.org/10.3390/ma18122771 - 12 Jun 2025
Viewed by 425
Abstract
The article discusses the design, fabrication, and experimental evaluation of a large-area vertical grating coupler (VGC) enabling simultaneous coupling of multiple input optical beams. The presented VCG was fabricated by direct nanoimprinting of a grating pattern in a non-hardened SiOX:TiOY [...] Read more.
The article discusses the design, fabrication, and experimental evaluation of a large-area vertical grating coupler (VGC) enabling simultaneous coupling of multiple input optical beams. The presented VCG was fabricated by direct nanoimprinting of a grating pattern in a non-hardened SiOX:TiOY waveguide (WG) film. The WG film was deposited on a glass substrate using a combination of the sol–gel method and the dip-coating technique. The fabrication process allowed precise control of the waveguide film thickness and refractive index, as well as the VGC geometry. The relevance of the process was proved by a demonstration of optical coupling of multiple quasi-parallel input beams via the VGC to the WG layer. To make this possible, a dedicated optical coupling system was designed, including a polymer microlens array and optical fiber array positioned in a V-groove. This opens promising perspectives on using the proposed structure for the fabrication of low-cost multichannel optical sensor chips, as highlighted in the article’s final section. Full article
(This article belongs to the Section Optical and Photonic Materials)
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11 pages, 2558 KiB  
Article
Highly Efficient Digitized Quasi-3D Photolithography Based on a Modified Golomb Coding via DMD Laser Direct Writing
by Hui Wang, Zhe Huang, Yanting Shen and Shangying Zhou
Photonics 2025, 12(6), 587; https://doi.org/10.3390/photonics12060587 - 9 Jun 2025
Viewed by 376
Abstract
Three-dimensional (3D) photolithography has found wide applications in microelectronics, optoelectronics, biomedicine, etc. Traditionally, it requires repetitive exposure and developing cycles. Meanwhile, a laser direct writing (LDW) system with a digital micromirror device (DMD) enables high-speed maskless lithography with programmable doses. In this paper, [...] Read more.
Three-dimensional (3D) photolithography has found wide applications in microelectronics, optoelectronics, biomedicine, etc. Traditionally, it requires repetitive exposure and developing cycles. Meanwhile, a laser direct writing (LDW) system with a digital micromirror device (DMD) enables high-speed maskless lithography with programmable doses. In this paper, we propose a quasi-3D digitized photolithography via LDW with a DMD to remove multiple developing cycles from the process. This approach quantizes the dose of the 3D geometry and stores it in a grayscale image. And the entire dose distribution can be formed by overlapping the exposures with sliced binary dose maps from the above grayscale dose map. In the image slicing algorithm, a modified Golomb coding is introduced to make full use of the highest available exposure intensity. Both 1D multi-step patterns and diffractive optical devices (DOEs) have been fabricated to verify its feasibility. This type of digitized quasi-3D photolithography can be applied to fabricating DOEs, microlens arrays (MLAs), micro-refractive optical elements (μROEs), etc., and 3D molds for micro-embossing/nano-imprinting. Full article
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19 pages, 1911 KiB  
Review
Review of Directed Self-Assembly Material, Processing, and Application in Advanced Lithography and Patterning
by Xiuyan Cheng, Di Liang, Miao Jiang, Yufei Sha, Xiaonan Liu, Jinlai Liu, Qingchen Cao and Jiangliu Shi
Micromachines 2025, 16(6), 667; https://doi.org/10.3390/mi16060667 - 31 May 2025
Viewed by 1664
Abstract
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years. Combining DSA with established lithography technologies, such as extreme ultraviolet (EUV), deep ultraviolet (DUV), electron beam lithography, and nanoimprint lithography, significantly [...] Read more.
Directed self-assembly (DSA) lithography, a cutting-edge technology based on the self-assembly of block copolymers (BCPs), has received significant attention in recent years. Combining DSA with established lithography technologies, such as extreme ultraviolet (EUV), deep ultraviolet (DUV), electron beam lithography, and nanoimprint lithography, significantly enhances the resolution of target patterns and device density. Currently, there are two commonly used methods in DSA: graphoepitaxy, employing lithographically defined topographic templates to guide BCP assembly, and chemoepitaxy, utilizing chemically patterned surfaces with precisely controlled interfacial energies to direct nanoscale phase segregation. Through novel DSA lithography technology, nanoscale patterns with smaller feature sizes and higher densities can be obtained, realizing the miniaturization of hole and line patterns and pitch multiplication and improving the roughness and local critical dimension uniformity (LCDU). It is gradually becoming one of the most promising and advanced lithography techniques. DSA lithography technology has been applied in logic, memory, and optoelectronic device fabrications. Full article
(This article belongs to the Special Issue Recent Advances in Lithography)
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11 pages, 3209 KiB  
Article
Induced Effects of Nano-Patterned Substrates on the Electrical and Photo-Electrical Properties of PTB7-Th:ICBA (1:1, wt.%) Bulk-Heterojunction Solar Cells
by Tudor Suteu, Vlad-Andrei Antohe, Stefan Antohe, Ionel Stavarache, Maria Cristina Balasin, Gabriel Socol, Marcela Socol, Oana Rasoga and Sorina Iftimie
Surfaces 2025, 8(2), 30; https://doi.org/10.3390/surfaces8020030 - 1 May 2025
Viewed by 673
Abstract
In this study, we detailed the fabrication and characterization of photovoltaic structures based on PTB7:ICBA (1:1, wt.%) bulk-heterojunction on optical glass substrates by spin-coating. Some samples were deposited on a flat substrate, and others were placed on a patterned substrate obtained by nano-imprinting [...] Read more.
In this study, we detailed the fabrication and characterization of photovoltaic structures based on PTB7:ICBA (1:1, wt.%) bulk-heterojunction on optical glass substrates by spin-coating. Some samples were deposited on a flat substrate, and others were placed on a patterned substrate obtained by nano-imprinting lithography; the induced effects were analyzed. We demonstrated that using a patterned substrate enhanced the maximum output power, primarily because the short-circuit current density increased. This can be considered a direct consequence of reduced optical reflection and improved optical absorption. The topological parameters evaluated by atomic force microscopy, namely, the root mean square, Skewness, and Kurtosis, had small values of around 2 nm and 1 nm, respectively. This proves that the mixture of a conductive polymer and a fullerene derivative creates a thin film network with a high flatness degree. The samples discussed in this paper were fabricated and characterized in air; we can admit that the results are encouraging, but further optimization is needed. Full article
(This article belongs to the Collection Featured Articles for Surfaces)
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21 pages, 2081 KiB  
Article
Translation of COVID-19 Serology Test on Foil-Based Lateral Flow Chips: A Journey from Injection Molding to Scalable Roll-to-Roll Nanoimprint Lithography
by Pakapreud Khumwan, Stephan Ruttloff, Johannes Götz, Dieter Nees, Conor O’Sullivan, Alvaro Conde, Mirko Lohse, Christian Wolf, Nastasia Okulova, Janine Brommert, Richard Benauer, Ingo Katzmayr, Nikolaus Ladenhauf, Wilfried Weigel, Maciej Skolimowski, Max Sonnleitner, Martin Smolka, Anja Haase, Barbara Stadlober and Jan Hesse
Biosensors 2025, 15(4), 229; https://doi.org/10.3390/bios15040229 - 4 Apr 2025
Viewed by 781
Abstract
Lateral flow tests (LFTs) had a pivotal role in combating the spread of the SARS-CoV-2 virus throughout the COVID-19 pandemic thanks to their affordability and ease of use. Most of LFT devices were based on nitrocellulose membrane strips whose industrial upscaling to billions [...] Read more.
Lateral flow tests (LFTs) had a pivotal role in combating the spread of the SARS-CoV-2 virus throughout the COVID-19 pandemic thanks to their affordability and ease of use. Most of LFT devices were based on nitrocellulose membrane strips whose industrial upscaling to billions of devices has already been extensively demonstrated. Nevertheless, the assay option in an LFT format is largely restricted to qualitative detection of the target antigens. In this research, we surveyed the potential of UV nanoimprint lithography (UV-NIL) and extrusion coating (EC) for the high-throughput production of disposable capillary-driven, foil-based tests that allow multistep assays to be implemented for quantitative readout to address the inherent lack of on-demand fluid control and sensitivity of paper-based devices. Both manufacturing technologies operate on the principle of imprinting that enables high-volume, continuous structuring of microfluidic patterns in a roll-to-roll (R2R) production scheme. To demonstrate the feasibility of R2R-fabricated foil chips in a point-of-care biosensing application, we adapted a commercial chemiluminescence multiplex test for COVID-19 antibody detection originally developed for a capillary-driven microfluidic chip manufactured with injection molding (IM). In an effort to build a complete ecosystem for the R2R manufacturing of foil chips, we also recruited additional processes to streamline chip production: R2R biofunctionalization and R2R lamination. Compared to conventional fabrication techniques for microfluidic devices, the R2R techniques highlighted in this work offer unparalleled advantages concerning improved scalability, dexterity of seamless handling, and significant cost reduction. Our preliminary evaluation indicated that the foil chips exhibited comparable performance characteristics to the original IM-fabricated devices. This early success in assay translation highlights the promise of implementing biochemical assays on R2R-manufactured foil chips. Most importantly, it underscores the potential utilization of UV-NIL and EC as an alternative to conventional technologies for the future development in vitro diagnostics (IVD) in response to emerging point-of-care testing demands. Full article
(This article belongs to the Special Issue Biosensing Technologies in Medical Diagnosis)
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17 pages, 5652 KiB  
Article
A Molecularly Imprinted Polymer Nanobodies (nanoMIPs)-Based Electrochemical Sensor for the Detection of Staphylococcus epidermidis
by Witsanu Rapichai, Chularat Hlaoperm, Adriana Feldner, Julia Völkle, Kiattawee Choowongkomon, Jatuporn Rattanasrisomporn and Peter A. Lieberzeit
Sensors 2025, 25(7), 2150; https://doi.org/10.3390/s25072150 - 28 Mar 2025
Viewed by 888
Abstract
Methicillin-resistant Staphylococcus epidermidis (MRSE) contamination is commonly found on human skin and medical devices. Herein, we present a sensor utilizing molecularly imprinted polymer nanobodies (nanoMIP) for recognition and electrochemical impedance spectroscopy (EIS) to detect S. epidermidis. Sensor manufacturing involves synthesizing nanoMIP via solid-phase [...] Read more.
Methicillin-resistant Staphylococcus epidermidis (MRSE) contamination is commonly found on human skin and medical devices. Herein, we present a sensor utilizing molecularly imprinted polymer nanobodies (nanoMIP) for recognition and electrochemical impedance spectroscopy (EIS) to detect S. epidermidis. Sensor manufacturing involves synthesizing nanoMIP via solid-phase synthesis using whole bacteria as templates. Screen-printed gold electrode (AuSPE)-modified 16-mercaptohexadecanoic acid (MHDA) served to immobilize the nanoMIPs on the sensor surface through an amide bond, with the remaining functional groups blocked by ethanolamine (ETA). Scanning electron microscope (SEM) analysis of the modified AuSPE surface reveals immobilized spherical nanoMIP particles of 114–120 nm diameter, while atomic force microscope (AFM) analysis showed increased roughness and height compared to bare AuSPE. The sensor is selective for S. epidermidis, with a remarkable detection limit of 1 CFU/mL. This research demonstrates that the developed nanoMIP-based sensor effectively detects S. epidermidis. Further research will focus on developing protocols to integrate the nanoMIP-based EIS sensor into medical and industrial applications, ultimately contributing to improved safety for both humans and animals in the future. Full article
(This article belongs to the Section Nanosensors)
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60 pages, 13122 KiB  
Review
Advancements in Lithography Techniques and Emerging Molecular Strategies for Nanostructure Fabrication
by Prithvi Basu, Jyoti Verma, Vishnuram Abhinav, Ratneshwar Kumar Ratnesh, Yogesh Kumar Singla and Vibhor Kumar
Int. J. Mol. Sci. 2025, 26(7), 3027; https://doi.org/10.3390/ijms26073027 - 26 Mar 2025
Cited by 4 | Viewed by 5948
Abstract
Lithography is crucial to semiconductor manufacturing, enabling the production of smaller, more powerful electronic devices. This review explores the evolution, principles, and advancements of key lithography techniques, including extreme ultraviolet (EUV) lithography, electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL), [...] Read more.
Lithography is crucial to semiconductor manufacturing, enabling the production of smaller, more powerful electronic devices. This review explores the evolution, principles, and advancements of key lithography techniques, including extreme ultraviolet (EUV) lithography, electron beam lithography (EBL), X-ray lithography (XRL), ion beam lithography (IBL), and nanoimprint lithography (NIL). Each method is analyzed based on its working principles, resolution, resist materials, and applications. EUV lithography, with sub-10 nm resolution, is vital for extending Moore’s Law, leveraging high-NA optics and chemically amplified resists. EBL and IBL enable high-precision maskless patterning for prototyping but suffer from low throughput. XRL, using synchrotron radiation, achieves deep, high-resolution features, while NIL provides a cost-effective, high-throughput method for replicating nanostructures. Alignment marks play a key role in precise layer-to-layer registration, with innovations enhancing accuracy in advanced systems. The mask fabrication process is also examined, highlighting materials like molybdenum silicide for EUV and defect mitigation strategies such as automated inspection and repair. Despite challenges in resolution, defect control, and material innovation, lithography remains indispensable in semiconductor scaling, supporting applications in integrated circuits, photonics, and MEMS/NEMS devices. Various molecular strategies, mechanisms, and molecular dynamic simulations to overcome the fundamental lithographic limits are also highlighted in detail. This review offers insights into lithography’s present and future, aiding researchers in nanoscale manufacturing advancements. Full article
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