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Processes
Special Issues
Plasmochemical Processes and Their Technological Applications
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Plasmochemical Processes and Their Technological Applications

A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Materials Processes".

Deadline for manuscript submissions: closed (15 July 2021) | Viewed by 7229

Special Issue Editors

Dr. Nina Recek

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Guest Editor
Jozef Stefan Institute, Department of Surface Engineering, Jamova cesta 39, 1000 Ljubljana, Slovenia
Interests: plasma surface treatments; plasma chemical synthesis; plasma processing of materials for biomedical applications; plasmochemical processes in agriculture
Dr. Gregor Primc

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Guest Editor
Jozef Stefan Institute, Department of Surface Engineering, Jamova cesta 39, 1000 Ljubljana, Slovenia
Interests: plasma technologies and diagnostics; plasma characterization; application of plasma technologies in material treatment for functionalization, etching, cleaning, changing morphology and hydrophilic/hydrophobic surface character (metal, polymers, dust, agricultural products, nanostructures…); researching disinfection/sterilization of water, agricultural products and biological surfaces; development of application plasma devices and systems; programming in LabView™, Matlab™, C#

Special Issue Information

Dear Colleagues,

We introduce you to the Processes Special Issue entitled “Plasmochemical Processes and their Technological Applications”. Today, plasma processing technologies slowly but fundamentally replace conventional production procedures in many important large manufacturing industries, such as the electronic industry, as well as create applications in the hygiene sector and in medical technology. Plasma processing of materials is of fundamental importance for aerospace, automotive, steel, biomedical, and toxic waste management industries. With the rapidly growing field of new emerging technologies, plasmochemical processes gain new applications in diamond and superconducting film growth and also in lighting technology (neon tubes, glass lasers, plasma displays).

This Special Issue invites you to contribute novel research of recent advances and innovations in the field of plasmochemical processing technologies. The Special Issue will provide a broad overview and cover different topics from plasma-chemical treatment of materials, plasma chemical synthesis, plasma etching, deposition and surface modification, to new methods for control of plasmas in surface treatments, plasma processes used in fabrication of microelectronic circuits, plasma technologies used in medical sector and biotechnology, etc.

Dr. Nina Recek
Dr. Gregor Primc
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • plasma etching
  • plasma deposition
  • plasma surface modification
  • plasma and microelectronics
  • plasma chemical synthesis
  • plasma in medical technology
  • plasma processing of materials
  • plasma in industry
  • diamond film growth
  • superconducting film growth

Published Papers (3 papers)

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Research

18 pages, 2077 KiB  
Article
Chitosan Plasma Chemical Processing in Beam-Plasma Reactors as a Way of Environmentally Friendly Phytostimulants Production
by Tatiana Vasilieva, Oscar Goñi, Patrick Quille, Shane O’Connell, Dmitry Kosyakov, Semen Shestakov, Nikolay Ul’yanovskii and Michael Vasiliev
Processes 2021, 9(1), 103; https://doi.org/10.3390/pr9010103 - 06 Jan 2021
Cited by 8 | Viewed by 2278
Abstract
A novel technique of phytoactive water-soluble chitooligosaccharide (COS) production in low-temperature plasma is described. Design, operation, and control of plasma chemical reactors used to produce COS from the powder of high molecular weight chitosan are presented. The electron beam plasma is strongly non-equilibrium [...] Read more.
A novel technique of phytoactive water-soluble chitooligosaccharide (COS) production in low-temperature plasma is described. Design, operation, and control of plasma chemical reactors used to produce COS from the powder of high molecular weight chitosan are presented. The electron beam plasma is strongly non-equilibrium and chemically active; plasma was excited by injecting the scanning electron beam into reaction volume filled with aerosol, containing oxygen and chitosan powder. Plasma chemical processes, responsible for the raw chitosan destruction and techniques of these processes to obtain control of products of optimal molecular weight, are considered. COS, in amounts sufficient for laboratory tests with some plants, were produced. Tests showed that the addition of COS into the liquid growing medium at 0.25 and 1 mg/mL stimulates root growth in Arabidopsis thaliana seedlings (Col-0) by up to 40%, with respect to control plants. Foliar application of these COS formulations at 0.25 mg/mL on tomato plants (cv. Micro-Tom) also resulted in increases between 11.9% and 36% in two important plant productivity indicators (flower and fruit numbers) compared to the control plants. Being environmentally friendly (and resource saving) the electron beam plasma technology of renewable natural biopolymer processing can be considered as a competitive way to produce biostimulants for commercial agriculture. Full article
(This article belongs to the Special Issue Plasmochemical Processes and Their Technological Applications)
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12 pages, 5374 KiB  
Article
Cold Plasma Deposition of Polymeric Nanoprotrusion, Nanoparticles, and Nanofilm Structures on a Slide Glass Surface
by Sun-Woo Yi, In-Keun Yu, Woon-Jung Kim and Seong-Ho Choi
Processes 2021, 9(1), 99; https://doi.org/10.3390/pr9010099 - 05 Jan 2021
Viewed by 1467
Abstract
In this study, we coated the surface of glass slides with nanoprotrusion, nanoparticles, and nanofilm structures by one-step plasma deposition of three vinyl monomers. Three functional vinyl monomers with symmetrical polarity sites were used: methyl methacrylate (MMA), trifluoro methylmethacrylate (TFMA), and trimethylsilyl methyl [...] Read more.
In this study, we coated the surface of glass slides with nanoprotrusion, nanoparticles, and nanofilm structures by one-step plasma deposition of three vinyl monomers. Three functional vinyl monomers with symmetrical polarity sites were used: methyl methacrylate (MMA), trifluoro methylmethacrylate (TFMA), and trimethylsilyl methyl methacrylate (TSMA). The TSMA/MMA (80/20, mol-%) nanoprotrusion-coated surface of slide glass was superhydrophobic, with a 153° contact angle. We also evaluated the transmittance (%) of the slide glass with nanoprotrusions in the infrared (IR) (940 nm), ultraviolet (365 nm) and visible light (380–700 nm) regions. The obtained nanoprotrusion structure surface of slide glass created by plasma deposition transmits more than 90% of visible light. Full article
(This article belongs to the Special Issue Plasmochemical Processes and Their Technological Applications)
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12 pages, 11236 KiB  
Article
Direct Growth of Carbon Nanotubes on Aluminum Foil by Atmospheric Pressure Microwave Plasma Chemical Vapor Deposition
by Dashuai Li and Ling Tong
Processes 2021, 9(1), 36; https://doi.org/10.3390/pr9010036 - 25 Dec 2020
Cited by 4 | Viewed by 2979
Abstract
This paper is about the research that carbon nanotubes (CNTs) grow on aluminum foils without additional catalysts by atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD) with the precursor of argon-hydrogen-ethanol. At different temperatures, a series of experiments that CNTs grow on aluminum [...] Read more.
This paper is about the research that carbon nanotubes (CNTs) grow on aluminum foils without additional catalysts by atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD) with the precursor of argon-hydrogen-ethanol. At different temperatures, a series of experiments that CNTs grow on aluminum foils were done with and without the alumina layer. The EDS results showed that iron impurities in aluminum foils catalyze the growth of CNTs. By measurements of SEM and HRTEM, tens of microns long and multi-walled CNTs are grown. The CNTs’ content in the sample changes more with the increase in temperature. The Raman measuring shows that CNTs have fewer defects with higher temperature. Finally, by measurements of EDS mapping and XRD on aluminum foil, the growth mechanism of CNTs was discussed. Full article
(This article belongs to the Special Issue Plasmochemical Processes and Their Technological Applications)
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