Synthesis, Self-Assembly, and Applications of Block Copolymers
A special issue of Polymers (ISSN 2073-4360). This special issue belongs to the section "Polymer Chemistry".
Deadline for manuscript submissions: closed (31 July 2023) | Viewed by 2071
Special Issue Editor
Special Issue Information
Dear Colleagues,
Nanomanufacturing with high efficiency and low cost is a key technology for next-generation electronic/photonic/energy devices. Block copolymers (BCPs) have been extensively studied for decades due to their ability to generate ordered nanoscale patterns induced by microphase separation.
Recent progress in block copolymer synthesis, templating, and processing has enabled sub-7nm patterns with a high degree of controllability bringing BCPs closer to practical applications in nanolithography. Moreover, the delicate design of block copolymer molecules/morphology, and the development of various block copolymer-based nanocomposites are expanding their application fields to organic photovoltaics/semiconductor, display, catalysis, filtration, sensor, energy device, and biomedical applications.
This Special Issue will cover a wide range of recent developments in block copolymer research, including, but not limited to, the design of block copolymer molecules, modeling, directed self-assembly, block copolymer particles, multiblock copolymers, and their potential applications.
Dr. Hong Kyoon Choi
Guest Editor
Manuscript Submission Information
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Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2700 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- block copolymers
- self-assembly
- directed self-assembly
- block copolymer nanolithography
- long rage ordering of block copolymers
- 3D structures of block copolymers
- applications of block copolymer
- synthesis of block copolymer
- simulation of block copolymer
- block copolymer nanocomposite
- multi-block copolymers
- block copolymer particles
- sub-10nm block copolymer lithography
- hierarchical pattering of block copolymer
- pattern transfer
- block copolymer defect analysis
- characterization of block coplymers
