Special Issue "Latest Developments in Pulsed Low-Temperature Plasmas"
A special issue of Plasma (ISSN 2571-6182).
Deadline for manuscript submissions: closed (20 December 2018)
Many low temperature plasmas can be considered to be in non-equilibrium, that is to say, the temperature of the plasma electrons is significantly greater than that of the ions and neutral gas species. Such plasmas, whether created at reduced or atmospheric pressure, are a rich source of active species (e.g., positive and negative ions, radicals, neutrals, electrons and photons) that can in many cases be used in a prescribed way to either create or modify (whether physically or chemically) a material surface in contact with it. Importantly, this can be done while maintaining the temperature of the work piece close to room temperature. The unique properties of low temperature plasmas have allowed them to be tailored for a multitude of industrial and manufacturing applications, ranging from functional thin film deposition to plasma decontamination.
In recent years, the pulsed modulation of low temperature plasmas (low-pressure and atmospheric pressure) has led to enhancements in the plasma characteristics and the processing outcomes. This Special Issue of the journal will concentrate on the reporting of the latest developments in pulsed-plasma technology, with consideration given to a wide range of pulse time-scales from milliseconds to nanoseconds, across a wide range of discharge types and sizes (macro to micro-plasmas) and at both reduced and at atmospheric pressures. Topical areas can include, but should not be limited to, thin-film deposition, plasma polymerization, surface modification and decontamination, etching, plasma chemistry, lighting, plasma ignition and combustion and space thrusters etc. Contributions highlighting the current state-of-the art in either or both diagnostic development and modelling/simulation aspects of pulsed-low temperature plasmas are welcome.
Prof. Dr. James Bradley
Dr. Mohammad Hasan
Dr. Paul Bryant
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All papers will be peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Plasma is an international peer-reviewed open access quarterly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) is waived for well-prepared manuscripts submitted to this issue. Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
- Low temperature plasmas
- Surface modification
- Processing applications