Advancement in Ultrafast Laser Fabrication and Nanoengineering of Materials

Dear Colleagues,

The advancement of ultrafast laser technologies has revolutionized our understanding of light–matter interactions and the resulting photon-induced processes in materials. The unique combination of high peak power and ultrashort temporal duration has transformed laser material processing. In turn, this has enabled high-precision micro- and nanofabrication and direct laser writing with exceptional spatial control. This non-contact technique allows precise surface functionalization—tailoring optical, mechanical, and chemical properties—and is increasingly being adopted for both scientific and industrial applications. In contrast to conventional approaches such as lithography or etching, ultrafast laser processing provides a single-step, scalable, and versatile platform suitable for metals, semiconductors, dielectrics, and composites, while eliminating the need for vacuum systems or post-processing steps.

This Special Issue aims to showcase the latest developments and applications in ultrafast laser–matter interaction and advanced material processing. To that end, we invite original research papers and comprehensive reviews that connect fundamental mechanisms with practical implementations. Topics of interest include ultrafast laser surface processing, laser-induced periodic surface structuring (LIPSS), laser-based surface functionalization, material property modification, direct laser writing, laser-induced forward transfer (LIFT), and pulsed laser deposition (PLD). Particular attention will be given to studies on light trapping, integrated photonic devices, novel structured surfaces, emerging laser–matter interaction phenomena, and modeling or simulations.

We look forward to receiving your valuable contributions to this Special Issue.

Dr. Jijil JJ Nivas
Guest Editor

Manuscript Submission Information

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