Functional Thin Films in Semiconductor Devices and Various Sensing Technologies
A special issue of Micromachines (ISSN 2072-666X). This special issue belongs to the section "D：Materials and Processing".
Deadline for manuscript submissions: closed (30 October 2025) | Viewed by 837
Special Issue Editor
Special Issue Information
Dear Colleagues,
Chemical Vapor Deposition (CVD) has emerged as a pivotal technique in the development of thin films, offering precise control over composition, thickness, and uniformity. Recent advancements in the technology highlight its significant role in enhancing the performance of semiconductor devices and various sensing technologies. In particular, with the expansion of CVD-compatible materials to encompass polymers, two-dimensional materials, perovskites, and metal–organic frameworks, its applications have extended beyond traditional semiconductor devices to a diverse range of advanced electronic devices. This Special Issue focuses on functional thin films fabricated through CVD and their integration into sensor devices, including optical sensors, gas sensors, and biosensors, as well as semiconductor devices and other electronic components utilizing CVD technology. The objective is to present a comprehensive overview of research on CVD-based functional materials and their applications in electronic devices. Furthermore, this issue seeks to highlight novel devices incorporating unprecedented functionalities, providing valuable insights into emerging advancements in the field.
Dr. Hyeonghun Kim
Guest Editor
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Keywords
- CVD (chemical vapor deposition)
- ALD (atomic layer deposition)
- sensors
- photodetectors
- gas sensors
- biosensors
- pressure sensors
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