Fabrication and Characterization of Epitaxial, Heterostructures and Amorphous Thin Films
A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Thin Films and Interfaces".
Deadline for manuscript submissions: closed (20 August 2022) | Viewed by 277
Special Issue Editors
Interests: wide bandgap semiconductors; ion implantation; point defects; ion beam analysis; power devices; dielectrics; semiconductor processing
Special Issues, Collections and Topics in MDPI journals
Interests: optoelectronics; photonic devices; photonics integration; semiconductor materials and nanotechnology
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
The formation and characterization of thin films are today indispensable technologies for the development of materials’ functionality and the discovery of new applications. Our ability to fabricate high-quality films, ranging from single atomic layer thicknesses up to several micrometers, has opened up a whole new industrial sector that is instrumental for building our future society with its ever-increasing demand on advanced services, energy efficiency and sustainability. This Special Issue, “Fabrication and Characterization of Epitaxial Heterostructures and Amorphous Thin Films”, will gather frontline research in this cross-disciplinary field, where a basic knowledge and control of physical and chemical deposition mechanisms, paired with advanced measurement methods, are used for a broad spectrum of applications.
Prof. Dr. Anders Hallén
Prof. Dr. Mattias Hammar
Guest Editors
Manuscript Submission Information
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Keywords
- thin films
- heterostructures
- epitaxy
- physical vapor deposition
- chemical vapor deposition
- thins film characterization
- surface analysis
- deposition techniques
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