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Crystal Growth and Characterization of Electronic and Optoelectronic Materials

A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Electronic Materials".

Deadline for manuscript submissions: closed (31 July 2021) | Viewed by 3108

Special Issue Editor


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Guest Editor
Korea Institute of Ceramic Engineering and Technology, Jinju, Korea
Interests: wide bandgap semiconductor materials; crystal growth; epitaxy; nanostructures; optoelectronics

Special Issue Information

Dear Colleagues,

The aim of this Special Issue, devoted to the topic "Crystal Growth and Characterization of Electronic and Optoelectronic Materials" is to address current challenges and developments in the field of crystal growth for electronic and optoelectronic applications engaging the inherent technological benefits of growth materials. For this issue, we invite research contributions reporting advances on topics such as bulk crystals and substrate technologies, epitaxy, defect and doping, interface and surface analysis, structural characterization, and study of relevant properties (including morphological, physical, optical, electric, etc.) of growth materials (bulk, thin films, and nanostructure). The applications from the crystals cover various devices, e.g., power device, RF device, light-emitting diodes (LEDs), lasers, photodetectors, photovoltaic cells, transistors or others relevant devices suitable for electronics and optoelectronics.

Considering your outstanding contribution in this fascinating research field, I would like to cordially invite you to submit a paper to this Special Issue.

Dr. Si-Young Bae
Guest Editor

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Keywords

  • crystal growth
  • epitaxy
  • characterization
  • electronics
  • optoelectronics
  • wide bandgap semiconductors

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Published Papers (1 paper)

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Research

8 pages, 3395 KiB  
Article
Growth of Semi-Polar (101¯3) AlN Film on M-Plane Sapphire with High-Temperature Nitridation by HVPE
by Xu Li, Jianyun Zhao, Ting Liu, Yong Lu and Jicai Zhang
Materials 2021, 14(7), 1722; https://doi.org/10.3390/ma14071722 - 31 Mar 2021
Cited by 14 | Viewed by 2490
Abstract
Aluminum nitride (AlN) films were grown on the m-plane sapphire by high-temperature hydride vapor phase epitaxy (HVPE). The effect of high-temperature nitridation on the quality of AlN film was studied. The high-temperature nitridation is favorable for the formation of semi-polar single (10 [...] Read more.
Aluminum nitride (AlN) films were grown on the m-plane sapphire by high-temperature hydride vapor phase epitaxy (HVPE). The effect of high-temperature nitridation on the quality of AlN film was studied. The high-temperature nitridation is favorable for the formation of semi-polar single (101¯3) orientation AlN film, the quality of which shows strong dependence on the nitridation temperature. The full width at half maximum of X-ray diffraction for (101¯3) AlN film was only 0.343° at the optimum nitridation temperature of 1300 °C. It is found that the nano-holes were formed on the surface of substrates by the decomposition of sapphire in the process of high-temperature nitridation, which is closely related to the quality improvement of AlN. At the critical nitridation temperature of 1300 °C, the average size of the nano-holes is about 70 nm, which is in favor of promoting the rapid coalescence of AlN micro-grains in the early stages. However, the size of nano-holes will be enlarged with the further increase of nitridation temperature, which begins to play a negative role in the coalescence of AlN grains. As a result, the grain size will be increased and extended to the epilayer, leading to the deterioration of the AlN film. Full article
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