Fabrication, Characterization and Application of Magnetic Thin Films
A special issue of Magnetochemistry (ISSN 2312-7481).
Deadline for manuscript submissions: 20 May 2025 | Viewed by 1047
Special Issue Editor
Special Issue Information
Dear Colleagues,
The interplay of spin, charge, and the lattice in quantum materials provides a rich playground for researchers in physics to explore and study. Thin films comprising such materials offer the ability to tune these properties through interface engineering, such as providing strain and mixing different properties at interfaces. This has been enabled through the huge increases in technology in fabricating these materials, as well as the development of probes that enable their study. There are many notable examples where this research has enabled step changes in technology, such as the discovery of giant magneto-resistance and perpendicular anisotropy. In addition, groundbreaking research in thin films has led to novel developments in magnetism, such as the topological spin textures known as skyrmions. Other developments include the ability to influence magnetism by injecting currents through spin orbit torque or indeed by using electric fields by artificially combining materials that have ferromagnetic and ferrolelectric properties. There is also a drive to develop functional antiferromagnet films to take advantage of the higher THz frequency dependence and zero-stray field advantages.
This Special Issue aims to bring together the most recent advances in this exciting field, celebrating not just the advanced physics behind these novel materials but also their advanced fabrication methods, highly sensitive characterization, and their potential applications in future devices.
Dr. Paul Steadman
Guest Editor
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Keywords
- thin films
- multilayers
- antiferromagnetism
- ferromagnetism
- spin
- multiferroic
- magnetoelectric
- spin orbit torque
- topological
- skyrmion
- exchange bias
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