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Materials and Devices Grown via Molecular Beam Epitaxy

Special Issue Information

Dear Colleagues,

Molecular beam epitaxy (MBE) is a highly advanced deposition technique renowned for its capacity to produce high-quality thin films. Its unique capability to precisely control deposition processes at the atomic level empowers researchers to push the boundaries of material science, enabling unparalleled exploration of physical properties and phenomena. While MBE has effectively served its purpose for decades, ongoing progress is characterized by the continuous development of innovative materials, novel structures, as well as advanced growth techniques and characterization methods.

The aim of this Special Issue, focused on "Materials and Devices Fabricated via Molecular Beam Epitaxy," is to assemble and showcase the wealth of innovative concepts involving novel structures, pioneering growth techniques, device physics and characterisation methods that have been realized through the application of molecular beam epitaxy. We warmly welcome the submission of both research articles and review articles. All submitted manuscripts will undergo standard journal peer-review procedures, and those accepted for publication will be featured in this Special Issue.

Dr. Daqian Guo
Dr. Wuyang Ren
Prof. Dr. Thorsten Hesjedal
Guest Editors

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Crystals is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2100 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • epitaxy growth
  • lattice-mismatch epitaxy
  • heterostructure
  • superlattice
  • characterization methods
  • semiconductor devices

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Crystals - ISSN 2073-4352Creative Common CC BY license