Special Issue "Plasma Thin Films"
A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Plasma Coatings, Surfaces & Interfaces".
Deadline for manuscript submissions: 15 December 2023 | Viewed by 5281
Special Issue Editor

Interests: plasma etching; inductively coupled plasma; chemical vapor deposition; reactive ion etching; graphene; thin films; MEMS and NEMS; thin membranes; magnetism; magnetophoresis; dielectrophoresis
Special Issues, Collections and Topics in MDPI journals
Special Issue Information
Dear Colleagues,
Plasma-assissted deposition processes are some of the most widely used methods for the growth and deposition of various types of thin films for a broad range of applications. From the classical oxides and nitrides used in microelectronics, to the more recent organic polymers and exotic 2D materials, plasma processes have always been relied upon to provide good-quality large-scale thin films in a controlled and reproducible manner. What makes plasma assisted deposition so versatile is the ability to synthesize complex thin films while maintaining a relatively low substrate temperature. Additionally, by adjusting proces parameters, modern plasma-assisted deposition processes allows for film properties to be controlled by modifying electron density, energy, and distribution function, among others. This ability to produce such a wide range of thin films with varying properties has placed plasma-assisted deposition processes at the forefront of novel materials research.
The topics of interest for this Special Issue include papers on the following topics:
- Novel materials deposition;
- Advances in 2D material synthesis;
- Metamaterials and nanocomposites;
- Carbon-based materials;
- Transparent conductive coatings;
- Biocompatible coatings;
- Organic polymer deposition;
- Low-temperature deposition;
- Remote plasma ALD and CVD;
- High-throughput processes.
Dr. Andrei Avram
Guest Editor
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- plasma synthesis
- conductive thin films
- semiconductor thin films
- dielectric thin films
- functional thin films