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Journal: Electron. Mater., 2025
Volume: 6
Number: 13
13
Article: Development of Water-Developable Negative Photoresist for i-Line Photolithography Using Cellulose Derivatives with Underlayer
Authors: by Hiryu Hayashi, Yuna Hachikubo, Mano Ando, Misaki Oshima, Mayu Morita and Satoshi Takei
Link: https://www.mdpi.com/2673-3978/6/4/13

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