Rana, S.; Kumar, A.; Wang, T.; Dhiman, P.; Sharma, G.; Shi, H.
Incorporating C3N5 and NiCo2S4 to Form a Novel Z-Scheme Heterojunction for Superior Photocatalytic Degradation of Norfloxacin. Chemistry 2024, 6, 962-980.
https://doi.org/10.3390/chemistry6050056
AMA Style
Rana S, Kumar A, Wang T, Dhiman P, Sharma G, Shi H.
Incorporating C3N5 and NiCo2S4 to Form a Novel Z-Scheme Heterojunction for Superior Photocatalytic Degradation of Norfloxacin. Chemistry. 2024; 6(5):962-980.
https://doi.org/10.3390/chemistry6050056
Chicago/Turabian Style
Rana, Sahil, Amit Kumar, Tongtong Wang, Pooja Dhiman, Gaurav Sharma, and Hui Shi.
2024. "Incorporating C3N5 and NiCo2S4 to Form a Novel Z-Scheme Heterojunction for Superior Photocatalytic Degradation of Norfloxacin" Chemistry 6, no. 5: 962-980.
https://doi.org/10.3390/chemistry6050056
APA Style
Rana, S., Kumar, A., Wang, T., Dhiman, P., Sharma, G., & Shi, H.
(2024). Incorporating C3N5 and NiCo2S4 to Form a Novel Z-Scheme Heterojunction for Superior Photocatalytic Degradation of Norfloxacin. Chemistry, 6(5), 962-980.
https://doi.org/10.3390/chemistry6050056