Navickaitė, K.; Roßmann, K.; Nestler, K.; Böttger-Hiller, F.; Penzel, M.; Grund, T.; Lampke, T.; Zeidler, H.
Plasma Electrolytic Polishing of Porous Nitinol Structures. Plasma 2022, 5, 555-568.
https://doi.org/10.3390/plasma5040039
AMA Style
Navickaitė K, Roßmann K, Nestler K, Böttger-Hiller F, Penzel M, Grund T, Lampke T, Zeidler H.
Plasma Electrolytic Polishing of Porous Nitinol Structures. Plasma. 2022; 5(4):555-568.
https://doi.org/10.3390/plasma5040039
Chicago/Turabian Style
Navickaitė, Kristina, Karl Roßmann, Klaus Nestler, Falko Böttger-Hiller, Michael Penzel, Thomas Grund, Thomas Lampke, and Henning Zeidler.
2022. "Plasma Electrolytic Polishing of Porous Nitinol Structures" Plasma 5, no. 4: 555-568.
https://doi.org/10.3390/plasma5040039
APA Style
Navickaitė, K., Roßmann, K., Nestler, K., Böttger-Hiller, F., Penzel, M., Grund, T., Lampke, T., & Zeidler, H.
(2022). Plasma Electrolytic Polishing of Porous Nitinol Structures. Plasma, 5(4), 555-568.
https://doi.org/10.3390/plasma5040039