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Journal: ElectronicsVolume: 14Number: 4353
Article: Rapid Thermal Annealing for Reduced Leakage and Enhanced Endurance of Reactive-Sputtered AlScN-Based Ferroelectric Memory Capacitors
  • Authors:
  • Juno Bae1,2,
  • Yoojin Lim2 and
  • Jong Min Park1,2
  • et al.
Link: https://www.mdpi.com/2079-9292/14/21/4353

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