- Article
Comparative Study of Charge Trapping Type SOI-FinFET Flash Memories with Different Blocking Layer Materials
- Yongxun Liu,
- Toshihide Nabatame,
- Takashi Matsukawa,
- Kazuhiko Endo,
- Shinichi O'uchi,
- Junichi Tsukada,
- Hiromi Yamauchi,
- Yuki Ishikawa,
- Wataru Mizubayashi and
- Yukinori Morita
- + 4 authors
The scaled charge trapping (CT) type silicon on insulator (SOI) FinFET flash memories with different blocking layer materials of Al2O3 and SiO2 have successfully been fabricated, and their electrical characteristics including short-channel effect (SC...

