Gärtner, A.; Mureșan, M.-G.; Mühlig, C.; Herffurth, T.; Felde, N.; Wagner, H.; Schulz, U.; Bingel, A.; Schröder, S.; Mocek, T.;
et al. Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm. Coatings 2025, 15, 556.
https://doi.org/10.3390/coatings15050556
AMA Style
Gärtner A, Mureșan M-G, Mühlig C, Herffurth T, Felde N, Wagner H, Schulz U, Bingel A, Schröder S, Mocek T,
et al. Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm. Coatings. 2025; 15(5):556.
https://doi.org/10.3390/coatings15050556
Chicago/Turabian Style
Gärtner, Anne, Mihai-George Mureșan, Christian Mühlig, Tobias Herffurth, Nadja Felde, Hanjörg Wagner, Ulrike Schulz, Astrid Bingel, Sven Schröder, Tomáš Mocek,
and et al. 2025. "Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm" Coatings 15, no. 5: 556.
https://doi.org/10.3390/coatings15050556
APA Style
Gärtner, A., Mureșan, M.-G., Mühlig, C., Herffurth, T., Felde, N., Wagner, H., Schulz, U., Bingel, A., Schröder, S., Mocek, T., & Tünnermann, A.
(2025). Manufacturing Process and Characteristics of Silica Nanostructures for Anti-Reflection at 355 nm. Coatings, 15(5), 556.
https://doi.org/10.3390/coatings15050556
